FIELD EMISSION DEVICE
    172.
    发明申请
    FIELD EMISSION DEVICE 审中-公开
    场发射装置

    公开(公告)号:US20100052511A1

    公开(公告)日:2010-03-04

    申请号:US12514765

    申请日:2007-11-15

    Applicant: Till Keesmann

    Inventor: Till Keesmann

    CPC classification number: H01J1/3044 H01J29/04 H01J2201/30446

    Abstract: The invention relates to a field emission device comprising a cathode having an emission region (1) for electrons (2). The field emission device is embodied for generating technically useful electron currents at a voltage which is as low as possible, in such a way that the emission region (1) has an arrangement of a plurality of individually positioned or positionable atoms (4) or molecules.

    Abstract translation: 本发明涉及一种场发射器件,其包括具有用于电子的发射区域(1)的阴极(2)。 该场致发射器件被实施用于以尽可能低的电压产生技术上有用的电子电流,使得发射区域(1)具有多个单独定位的或可定位的原子(4)或分子的排列 。

    Boron Nitride Thin-Film Emitter and Production Method Thereof, and Electron Emitting Method Using Boron Nitride Thin-Film Emitter
    176.
    发明申请
    Boron Nitride Thin-Film Emitter and Production Method Thereof, and Electron Emitting Method Using Boron Nitride Thin-Film Emitter 失效
    氮化硼薄膜发射体及其制造方法以及使用氮化硼薄膜发射体的电子发射方法

    公开(公告)号:US20080030152A1

    公开(公告)日:2008-02-07

    申请号:US11665250

    申请日:2005-12-21

    CPC classification number: H01J9/025 H01J1/304 H01J2201/30446

    Abstract: Based on designs concerning boron nitride thin-films each including boron nitride crystals in acute-ended shapes excellent in field electron emission properties, and designs of emitters adopting such thin-films, it is aimed at appropriately controlling a distribution state of such crystals to thereby provide an emitter having an excellent efficiency and thus requiring only a lower threshold electric field for electron emission. In a design of a boron nitride thin-film emitter comprising crystals that are each represented by a general formula BN, that each include sp3 bonded boron nitride, sp2 bonded boron nitride, or a mixture thereof, and that each exhibit an acute-ended shape excellent in field electron emission property; there is controlled an angle of a substrate relative to a reaction gas flow upon deposition of the emitter from a vapor phase, thereby controlling a distribution state of the crystals over a surface of the thin-film.

    Abstract translation: 基于关于氮化硼薄膜的设计,每个氮化硼薄膜包括场致发射性能优异的急端形状的氮化硼晶体,以及采用这种薄膜的发射体的设计,旨在适当地控制这种晶体的分布状态 提供具有优异效率的发射极,因此仅需要较低的电子发射阈值电场。 在包含各自由通式BN表示的晶体的氮化硼薄膜发射体的设计中,每一个都包括结合氮化硼的sp 3+,sp 2+结合的硼 氮化物或其混合物,并且各自表现出场电子发射性优异的锐端形状; 当从气相沉积发射体时,控制衬底相对于反应气体流的角度,从而控制晶体在薄膜表面上的分布状态。

    Electron field emitter and compositions related thereto
    177.
    发明授权
    Electron field emitter and compositions related thereto 失效
    电子场发射体及其组成

    公开(公告)号:US07317277B2

    公开(公告)日:2008-01-08

    申请号:US10421107

    申请日:2003-04-23

    Abstract: This invention provides compositions of matter that contain an electron emitting substance and an expansion material. The expansion material may, for example, be an intercalation compound. When a film is formed from the composition, expansion of the expansion material typically causes rupturing or fracturing of the film. No further treatment of the surface of the film is typically required after expansion of the expansion material to obtain good emission properties. A surface formed from such a fractured film acts as an efficient electron field emitter and thus is useful in vacuum microelectronic devices.

    Abstract translation: 本发明提供了含有电子发射物质和膨胀材料的物质组合物。 膨胀材料可以是例如插层化合物。 当由组合物形成膜时,膨胀材料的膨胀通常导致膜的破裂或破裂。 在膨胀材料膨胀之后,通常不需要进一步处理膜的表面以获得良好的发射性能。 由这种断裂薄膜形成的表面起着有效的电子场发射体的作用,因此可用于真空微电子器件。

    Electron field emitter and compositions related thereto
    179.
    发明申请
    Electron field emitter and compositions related thereto 失效
    电子场发射体及其组成

    公开(公告)号:US20070170832A1

    公开(公告)日:2007-07-26

    申请号:US11728935

    申请日:2007-03-27

    Abstract: This invention provides compositions of matter that contain an electron emitting substance and an expansion material. The expansion material may, for example, be an intercalation compound. When a film is formed from the composition, expansion of the expansion material typically causes rupturing or fracturing of the film. No further treatment of the surface of the film is typically required after expansion of the expansion material to obtain good emission properties. A surface formed from such a fractured film acts as an efficient electron field emitter and thus is useful in vacuum microelectronic devices.

    Abstract translation: 本发明提供了含有电子发射物质和膨胀材料的物质组合物。 膨胀材料可以是例如插层化合物。 当由组合物形成膜时,膨胀材料的膨胀通常导致膜的破裂或破裂。 在膨胀材料膨胀之后,通常不需要进一步处理膜的表面以获得良好的发射性能。 由这种断裂薄膜形成的表面起着有效的电子场发射体的作用,因此可用于真空微电子器件。

    Zinc oxide nanotip and fabricating method thereof
    180.
    发明申请
    Zinc oxide nanotip and fabricating method thereof 审中-公开
    氧化锌纳米尖端及其制造方法

    公开(公告)号:US20070151508A1

    公开(公告)日:2007-07-05

    申请号:US11311092

    申请日:2005-12-19

    Abstract: In the present invention, there are provided self-assembled ZnO nanotips grown on relatively low temperatures on various substrates by metalorganic chemical vapor deposition (MOCVD). The ZnO nanotips are made at relatively low temperatures, giving ZnO a unique advantage over other wide bandgap semiconductors such as GaN and SiC. The nanotips have controlled uniform size, distribution and orientation. These ZnO nanotips are of single crystal quality, show n-type conductivity and have good optical properties. Selective growth of ZnO nanotips also has been realized on patterned (100) silicon on r-sapphire (SOS), and amorphous SiO2 on r-sapphire substrates. Self-assembled ZnO nanotips can also be selectively grown on patterned layers or islands made of a semiconductor, an insulator or a metal deposited on R-plane (01 12) Al2O3 substrates as long as the ZnO grows in a columnar structure along the c-axis [0001] of ZnO on these materials. Such self-assembled ZnO nanotips and nanotip arrays are promising for applications in field emission displays and electron emission sources, photonic bandgap devices, near-field microscopy, UV optoelectronics, and bio-chemical sensors.

    Abstract translation: 在本发明中,提供了通过金属有机化学气相沉积(MOCVD)在各种基底上在较低温度下生长的自组装的ZnO纳米二极管。 ZnO纳米芯片在相对低的温度下制成,使ZnO比其他宽带隙半导体(如GaN和SiC)具有独特的优势。 纳米片具有均匀的尺寸,分布和取向。 这些ZnO纳米芯片具有单晶质量,显示n型导电性,并具有良好的光学性能。 ZnO纳米片的选择性生长也已经在r-蓝宝石(SOS)上的图案化(100)硅和r-蓝宝石衬底上的无定形SiO 2上实现。 自组装ZnO纳米技术也可以选择性地生长在由半导体,绝缘体或沉积在R平面上的金属(01 12)Al 2 / 只要ZnO沿着这些材料上的ZnO的c轴[0001]以柱状结构生长,就可以进行。 这种自组装的ZnO纳米片和纳米尖端阵列对于场发射显示器和电子发射源,光子带隙器件,近场显微镜,UV光电子学和生物化学传感器的应用是有希望的。

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