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    Silica glass containing TiO2 and process for its production
    181.
    发明授权
    Silica glass containing TiO2 and process for its production 有权
    含二氧化硅的硅玻璃及其生产工艺

    公开(公告)号：US07538052B2

    公开(公告)日：2009-05-26

    申请号：US11957855

    申请日：2007-12-17

    Applicant: Yasutomi Iwahashi ,  Akio Koike

    Inventor： Yasutomi Iwahashi ,  Akio Koike

    IPC: C03C3/06 ,  C03B20/00 ,  C03B19/06 ,  C03B37/018

    CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

    Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

    Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

    Silica glass containing TiO2 and process for its production
    184.
    发明授权
    Silica glass containing TiO2 and process for its production 有权
    含二氧化硅的硅玻璃及其生产工艺

    公开(公告)号：US07419924B2

    公开(公告)日：2008-09-02

    申请号：US11589875

    申请日：2006-10-31

    Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

    Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

    IPC: C03C3/06 ,  C03C3/076 ,  C03C3/112 ,  C03B20/00

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

    Abstract: It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero.A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

    Abstract translation: 提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。 含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于具有至多1200℃的假想温度，0〜100℃的热膨胀系数为0±150ppb /℃。 并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。 一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

    Fabrication process of a gradient index type of optical element
    190.
    发明授权
    Fabrication process of a gradient index type of optical element 失效
    梯度折射率型光学元件的制作工艺

    公开(公告)号：US6032487A

    公开(公告)日：2000-03-07

    申请号：US324110

    申请日：1999-06-02

    Applicant: Hiroaki Kinoshita

    Inventor： Hiroaki Kinoshita

    IPC: G02B1/00 ,  C03B8/02 ,  C03B19/12 ,  C03B20/00 ,  C03C1/00 ,  C03C3/06 ,  C03C21/00 ,  G02B3/00 ,  C03B8/00 ,  C03C15/00 ,  C03C17/00

    CPC classification number: C03B19/12 ,  C03C1/006 ,  C03C1/008 ,  C03C3/06 ,  C03B2201/30 ,  C03B2201/34 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/54 ,  C03C2201/30 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/54 ,  C03C2203/36 ,  C03C2203/50

    Abstract: The invention provides a process of obtaining a gradient index type of optical element with profiles of first and second metal component concentrations by the sol-gel method. The process of fabricating a gradient index type of optical element comprises steps of dipping a silicon component-containing wet gel prepared by the sol-gel method in a solution containing an alkoxide of at least one metal component selected from a first group consisting of Ti, Nb, Ta, and Zr or a derivative thereof to thereby impart to the wet gel a concentration gradient with a concentration of the first metal component decreasing from a periphery to a center of the wet gel, allowing at least one metal component selected from a second group consisting of Ba, La, Y, Gd, Sr, Ca, and Zn to be dissolved out of the wet gel to thereby impart to the wet gel a concentration gradient with a concentration of the second metal component increasing from the periphery to the center of the wet gel, and drying, and firing the wet gel.

    Abstract translation: 本发明提供一种通过溶胶 - 凝胶法获得具有第一和第二金属成分浓度分布的光学元件的梯度折射率类型的方法。 制造梯度折射率型光学元件的方法包括以下步骤：将通过溶胶 - 凝胶法制备的含硅成分的湿凝胶浸入含有至少一种金属成分的醇盐的溶液中，所述金属成分选自由Ti， Nb，Ta和Zr或其衍生物，从而赋予湿凝胶浓度梯度，其中第一金属组分的浓度从湿凝胶的周边到中心减小，允许至少一种选自第二 由Ba，La，Y，Gd，Sr，Ca和Zn组成的组，从湿凝胶中溶出，从而赋予湿凝胶浓度梯度，其中第二金属组分的浓度从周边增加到中心 的湿凝胶，并干燥，并焙烧湿凝胶。

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