公开(公告)号：EP1779507A1

公开(公告)日：2007-05-02

申请号：EP04779413.6

申请日：2004-07-28

Applicant: APPLIED SCIENCE AND TECHNOLOGY, INC.

Inventor： DEEM, Jake, O. ,  THURINGER, Dan

IPC: H03F1/32

CPC classification number: H03F1/3247 ,  H03F1/08 ,  H03F2200/105 ,  H03F2200/153

Abstract: The invention generally relates to stabilizing an amplifier. In one aspect, a stabilization module that is in electrical communication with the amplifier is provided. The stabilization module includes both an open loop control system and a closed loop control system. The open loop control system is used to modify at least one characteristic of an input signal received by the stabilization module and to pass control to the closed loop control system. The closed loop control system is then used to modify the at least one characteristic of the input signal. The modified input signal is provided to the amplifier.

公开(公告)号：EP1618588A2

公开(公告)日：2006-01-25

申请号：EP04759827.1

申请日：2004-04-12

Applicant: APPLIED SCIENCE AND TECHNOLOGY, INC.

Inventor： HOLBER, William, M. ,  CHEN, Xing ,  COWE, Andrew, B. ,  BESEN, Matthew, M. ,  COLLINS, Jr, Ronald, W. ,  TRULLI, Susan, C. ,  SHAO, Shouqian

IPC: H01J37/32

CPC classification number: H01J37/32357 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32522

Abstract: Plasma ignition and cooling methods are described. A method can include providing a dielectric toroidal vessel (1510), at least one ignition electrode (1530) adjacent to the vessel, and a heat sink having multiple segments (1530) urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. Another method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel (1541-1542). The gas is ignited in the channel while the remaining portion of the flow rate is directed away (1571;1552) from the channel (1541-1542).

公开(公告)号：EP1499934A1

公开(公告)日：2005-01-26

申请号：EP03733897.7

申请日：2003-04-25

Applicant: APPLIED SCIENCE AND TECHNOLOGY, INC.

Inventor： FITTKAU, Jens ,  SEIWERT, Johannes ,  GOTTSCHALK, Christine

IPC: G05D21/02

CPC classification number: G05D11/132 ,  B01F3/04496 ,  B01F5/0603 ,  B01F5/0606 ,  B01F2003/04886 ,  C01B13/10 ,  C01B13/11 ,  C01B2201/60 ,  C01B2201/64 ,  C02F1/78 ,  C02F2201/782 ,  C02F2209/40 ,  G05D11/139 ,  Y10S134/902 ,  Y10S261/42

Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a frst process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.

公开(公告)号：EP1506562A1

公开(公告)日：2005-02-16

申请号：EP03728897.4

申请日：2003-05-14

Applicant: Applied Science and Technology, Inc.

Inventor： GOODMAN, Daniel

IPC: H01J37/32

CPC classification number: H01J37/32935 ,  H01J37/32082 ,  H01J37/3299

Abstract: A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.

公开(公告)号：EP0737256B1

公开(公告)日：2000-12-20

申请号：EP94919170.4

申请日：1994-05-19

Applicant: APPLIED SCIENCE AND TECHNOLOGY, INC.

Inventor： BESEN, Mathew M. ,  SEVILLANO, Evelio ,  SMITH, Donald K.

IPC: C23C16/50 ,  H01J37/32

CPC classification number: H01J37/32211 ,  C23C16/511 ,  H01J37/32192

Abstract: A microwave plasma reactor (50) including a chamber (52) for containing a gas to be energized into a plasma with microwave energy, an electrode (62) having two surfaces (61, 63) in the chamber for radiating microwave energy from one of the surfaces into the chamber to form the plasma proximate the radiating surface (63), and a waveguide or coaxial conductor (54) for introducing microwave energy onto the other of the two electrode surfaces (61) for providing the energy to form the plasma.