Vaporizer, and, film-forming apparatus equipped with the vaporizer
    11.
    发明专利

    公开(公告)号:JP5427344B2

    公开(公告)日:2014-02-26

    申请号:JP2007136872

    申请日:2007-05-23

    CPC classification number: C23C16/407 C23C16/4486

    Abstract: Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.

    Abstract translation: 由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构,所以该装置难以定位喷嘴,并且该装置不能精确地控制 与要发放到蒸发单元中的原料溶液混合的载气的压力和流速,因此难以高精度地控制MOCVD膜的组成。 多个气体通道设置在平坦的盘形板上。 利用这种结构,可以使喷嘴的精确定位变得更容易,并且可以高精度地控制MOCVD膜的组成。

Patent Agency Ranking