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11.
公开(公告)号:JP5427344B2
公开(公告)日:2014-02-26
申请号:JP2007136872
申请日:2007-05-23
IPC: H01L21/205 , C23C16/448
CPC classification number: C23C16/407 , C23C16/4486
Abstract: Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.
Abstract translation: 由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构,所以该装置难以定位喷嘴,并且该装置不能精确地控制 与要发放到蒸发单元中的原料溶液混合的载气的压力和流速,因此难以高精度地控制MOCVD膜的组成。 多个气体通道设置在平坦的盘形板上。 利用这种结构,可以使喷嘴的精确定位变得更容易,并且可以高精度地控制MOCVD膜的组成。
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公开(公告)号:JP4406178B2
公开(公告)日:2010-01-27
申请号:JP2001203688
申请日:2001-07-04
IPC: C23C16/38 , H01L21/318 , C23C16/36 , C23C16/452 , C23C16/509 , H01L21/31 , H01L21/314 , H01L21/768 , H01L23/522
CPC classification number: H01L21/318 , C23C16/36 , C23C16/452 , C23C16/509
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15.
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公开(公告)号:JP3529062B2
公开(公告)日:2004-05-24
申请号:JP3990095
申请日:1995-02-28
Applicant: 株式会社渡辺商行
Inventor: 昌樹 楠原
IPC: G03F1/54 , H01L21/027 , G03F1/08
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