公开(公告)号：KR1020070056993A

公开(公告)日：2007-06-04

申请号：KR1020060118280

申请日：2006-11-28

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 요시하라고오스께 ,  나까무라쥰지 ,  다께구찌히로후미 ,  야마모또다로오

IPC: H01L21/027

CPC classification number: H01L21/67051 ,  H01L21/67253 ,  B08B3/02 ,  G03F7/40 ,  H01L21/02057

Abstract: A rinse processing method, a developing processing apparatus, and a recording medium for recording a control program read by computer are provided to reduce defects in a developing process by determining rapidly optimum rinsing conditions. A rinse processing method is used for developing an exposure pattern and rinsing a substrate. The rinse processing method includes a process for setting rinse processing conditions according to a surface state of the substrate, a process for measuring the surface state of the substrate, a process for selecting the corresponding rinse processing conditions according to the surface state of the measured substrate, and a process for performing a rinsing process under the rinse processing conditions.

Abstract translation: 提供一种用于记录由计算机读取的控制程序的冲洗处理方法，显影处理装置和记录介质，以通过确定快速最佳漂洗条件来减少显影过程中的缺陷。 冲洗处理方法用于显影曝光图案和漂洗基板。 冲洗处理方法包括根据基板的表面状态设定漂洗处理条件的处理，基板的表面状态的测定处理，根据测定的基板的表面状态选择相应的冲洗处理条件的处理 以及在漂洗处理条件下进行漂洗处理的工序。