公开(公告)号：KR1020100029042A

公开(公告)日：2010-03-15

申请号：KR1020090082972

申请日：2009-09-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사에구사나오야 ,  시무라아키히코

IPC: H01L21/68 ,  H01L21/677 ,  B25J13/00

CPC classification number: H01L21/68714 ,  B65G49/061 ,  B65G49/063 ,  H01L21/68735 ,  H01L21/68742

Abstract: PURPOSE: A substrate table mechanism apparatus, a substrate processing apparatus, and a control method and storage media of a substrate table mechanism apparatus are provided so that a substrate processing apparatus equipped with the substrate table mechanism apparatus, and this substrate table mechanism apparatus, and the control method and the computer-readable storage medium executing this control method in computer of the substrate table mechanism apparatus can be offered. CONSTITUTION: A substrate table mechanism apparatus, a substrate processing apparatus, and a control method and storage media of a substrate table mechanism apparatus comprises a main chuck(4), a first lifter(8a), and a second lifter(8b). The main chuck is equipped with a substrate. The external periphery portion of the processed substrate is supported. A second lifter supports a center area of a processed substrate than a location in which a first lifter supports the processed substrate.

Abstract translation: 目的：提供一种基板台机构装置，基板处理装置以及基板台机构装置的控制方法和存储介质，使得具有基板台机构装置的基板处理装置和该基板台机构装置 可以提供在基板台机构装置的计算机中执行该控制方法的控制方法和计算机可读存储介质。 构成：基板台机构装置，基板处理装置以及基板台机构装置的控制方法和存储介质，包括主卡盘（4），第一升降器（8a）和第二升降器（8b）。 主卡盘配有基板。 处理后的基板的外周部被支承。 第二升降器支撑处理的基板的中心区域，其比第一升降器支撑经处理的基板的位置。

公开(公告)号：KR100809125B1

公开(公告)日：2008-03-03

申请号：KR1020060044442

申请日：2006-05-17

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 시무라아키히코

IPC: H01L21/68

Abstract: 본 발명의 목적은 복수의 처리실을 갖는 경우에도, 처리실내에서의 기판 위치를 정확하게 제어할 수 있도록 위치설정하는 것이다. 로드록실(30)내에는, 버퍼(31, 32)에 탑재된 기판(S)의 위치설정을 실행하는 포지셔너(33a, 33b, 33c, 33d)가 배치되어 있다. 장방형을 한 기판(S)은, 로드록실(30)내에서, 포지셔너(33a, 33b, 33c, 33d)의 접촉 블록(36)에 의해 4점에서 가압되어, XY 방향의 위치설정이 실행된다. 이러한 포지션은 각 프로세스 챔버내에서의 처리 위치에 대응하고, 각 프로세스 챔버별로 설정된다.

公开(公告)号：KR1020060119815A

公开(公告)日：2006-11-24

申请号：KR1020060044442

申请日：2006-05-17

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 시무라아키히코

IPC: H01L21/68

Abstract: A processing apparatus, a position setting method and a computer memory medium are provided to control exactly a processing position in spite of the existence of a plurality of process chambers by using a memory unit and a control unit. A processing apparatus includes a plurality of process chambers(10a,10b,10c) for performing predetermined processes on an object, a transfer unit for transferring the object into the process chambers, a position setting unit for positioning the object, a memory unit for storing position information on each process chamber, and a control unit(60) for controlling the position setting unit on the basis of the position information of the memory unit.

Abstract translation: 提供处理装置，位置设定方法和计算机存储介质，以便通过使用存储单元和控制单元来精确地控制处理位置，尽管存在多个处理室。 一种处理装置包括用于对物体进行预定处理的多个处理室（10a，10b，10c），用于将物体传送到处理室中的传送单元，用于定位物体的位置设定单元，存储单元 每个处理室的位置信息，以及用于基于存储器单元的位置信息来控制位置设定单元的控制单元（60）。