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公开(公告)号：KR100993441B1
公开(公告)日：2010-11-09
申请号：KR1020090045538
申请日：2009-05-25
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/677 , H01L21/683 , B65G49/06 , G02F1/13
Abstract: 본 발명은 피처리 기판이 대형이어도, 승강 핀에 의해 피처리 기판을 확실하게 지지하면서 피처리 기판의 변형을 효과적으로 억지하는 것이 가능한 기판 탑재 기구에 관한 것이다. 기판 탑재 기구는, 가요성을 갖는 기판(G)을 탑재하는 탑재대로서의 서셉터(4)와, 서셉터(4)의 탑재면에 대하여 돌몰 가능하게 마련되고, 기판(G)의 주연부 및 중앙부를 각각 지지해서 서셉터(4)의 상방의 주고받음을 실행하는 주고받음 위치와 서셉터(4)상의 탑재 위치 사이에서 승강시키는 리프터 핀(8a, 8b)과, 리프터 핀(8a, 8b)을 구동시키는 구동 기구로서의 구동부(9a, 9b)를 구비하고, 구동부(9a, 9b)는, 기판(G)을 승강시킬 때에, 리프터 핀(8a)을 리프터 핀(8b)보다도 높게 돌출시켜서, 기판(G)이 아래로 볼록형상으로 휜 상태에서 리프터 핀(8a, 8b)에 의해 안정적으로 지지되도록 한다.
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公开(公告)号：KR1020080020555A
公开(公告)日：2008-03-05
申请号：KR1020070087506
申请日：2007-08-30
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/683 , H01L21/677
CPC classification number: H01L21/6723 , G05B19/41815 , G05B2219/45031 , H01L21/68714 , H01L21/68742
Abstract: A substrate mounting unit is provided to restrain generation of process nonuniformity by controlling lifting of a substrate to be processed with respect to a mounting unit. A flexible substrate(G) to be processed is mounted on a mounting unit. A plurality of lifter pins(8a,8b) are prepared in a manner that appears and disappears with respect to a mounting surface of the mounting unit, supporting the substrate while moving up/down the substrate between a loading/unloading position of the substrate on the mounting unit and a mounting position on the mounting unit. A driving unit(9a,9b) drives the lifter pins. The plurality of lifter pins include a first lifter pin for supporting the main circumference of the substrate and a second lifter pin for supporting the center part of the substrate. When the substrate is elevated, the driving unit protrudes the first lifter pin higher than the second lifter pin so that the substrate is stably supported while the substrate is bent as a downward convex shape. The driving unit can independently drive the first and second lifter pins.
Abstract translation: 提供了一种衬底安装单元，用于通过控制相对于安装单元的待处理衬底的提升来抑制工艺不均匀的产生。 待加工的柔性基板（G）安装在安装单元上。 多个升降器销（8a，8b）以相对于安装单元的安装表面出现和消失的方式被准备，在基板的加载/卸载位置之间向上/向下移动基板的同时支撑基板 安装单元和安装单元上的安装位置。 驱动单元（9a，9b）驱动提升销。 多个提升销包括用于支撑基板的主圆周的第一升降销和用于支撑基板的中心部分的第二升降销。 当基板升高时，驱动单元使第一升降器销突出于高于第二升降销的第一升降器销，使得基板稳定地被支撑，同时基板被弯曲成向下凸出的形状。 驱动单元可以独立地驱动第一和第二升降器销。
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公开(公告)号：KR1020170086410A
公开(公告)日：2017-07-26
申请号：KR1020170007848
申请日：2017-01-17
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01J37/32
Abstract: (과제) 기판에대한플라즈마처리의균일성을향상시킨플라즈마처리장치를제공한다. (해결수단) 플라즈마처리장치(11)는, 기판 G가탑재되는탑재대(21)를내부에수용하는챔버(20)와, 챔버(20)의내부에배치된격벽부(22)와, 격벽부(22)의상면에배치된고주파안테나(50)와, 격벽부(22)의하면에배치된가스도입유닛을갖고, 고주파안테나(50)에의해형성된전계에의해처리가스를플라즈마화하여기판 G를플라즈마처리한다. 가스도입유닛은, 길고기판탑재면과대략직교하는방향으로처리가스를분출하는복수의가스분출구멍(25b)을갖는제 1 샤워플레이트(24a~24d)와, 길고기판탑재면과대략평행한방향으로처리가스를분출하는복수의가스분출구멍(55b)을갖는제 2 샤워플레이트(54a~54d)가, 긴방향이방사상으로연장되는방향이되도록배치된구성을갖는다.
Abstract translation: （要解决的问题）提供一种等离子体处理装置，其具有改进的等离子体处理在基板上的均匀性。 等离子体处理装置11具备：腔室20，其内部收纳载置基板G的载置台21;配置在腔室20内的分隔壁22; 设置在基板22的上表面上的频率天线50和设置在分隔壁22的表面上的气体引入单元，以通过高频天线50形成的电场使处理气体等离子化。 和等离子体处理。 气体引入单元包括：第一喷淋板24a至24d，其具有用于在基本垂直于基板安装表面的方向上喷射处理气体的多个气体喷射孔25b; 并且，具有用于喷射处理气体的多个气体喷射孔55b的第二喷淋板54a〜54d被配置为沿着长边方向的径向延伸。
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公开(公告)号：KR1020120054004A
公开(公告)日：2012-05-29
申请号：KR1020120049188
申请日：2012-05-09
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/68 , H01L21/683
Abstract: PURPOSE: A substrate loading tool and a control method thereof, and a substrate processing apparatus and a storage media are provided to uniformly process a substrate by not including a lifter of a pin shape on the center part of a susceptor. CONSTITUTION: A first lifter is prepared in the inner side of a loading table which can project and supports external periphery portion of a substrate to be treated. A second lifter(8b1) supports the center part of the substrate to be treated instead of the location in which the first lifter supports the substrate to be treated. A circular arm(8d) circles from the upper side of the outside the loading table to the upper side of a loading surface of the loading table by the rotation of a shaft. A flexible arm(8g) is extended from the outer side of the first lifter to the inner side of the first lifter as a horizontal direction.
Abstract translation: 目的：提供一种基板装载工具及其控制方法以及基板处理装置和存储介质，以通过在基座的中心部分不包括销形状的升降器来均匀地处理基板。 构成：在装载台的内侧准备第一升降机，该装载台可投影和支撑要处理的基板的外围部分。 第二升降器（8b1）支撑要处理的基板的中心部分，而不是第一升降器支撑待处理的基板的位置。 圆形臂（8d）通过轴的旋转从装载台的外侧的上侧到装载台的装载表面的上侧。 柔性臂（8g）从第一升降机的外侧延伸到第一升降机的内侧作为水平方向。
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公开(公告)号：KR1020090084778A
公开(公告)日：2009-08-05
申请号：KR1020090045538
申请日：2009-05-25
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/677 , H01L21/683 , B65G49/06 , G02F1/13
CPC classification number: H01L21/68714 , B65G49/061 , G02F1/1303 , H01L21/68742
Abstract: A substrate loading mechanism, a substrate transfer method, a substrate processing apparatus and a computer readable storage medium are provided to effectively suppress the deformation of the processed substrate by tightly supporting the processed substrate using a lift pin. The processed substrate having the flexibility is mounted on a main chuck(4). A plurality of lift pins support and lift the processed substrate. The substrate mount tool comprises drive machineries(9a,9b) for running the lift pin. A plurality of lift pins comprises the first lift pin(8a) and the second lift pin(8b). The drive machinery steadily supports the processed substrate in the state that the processed substrate bends below with the convex profile. A controller controls the drive of the first and the second lift pins by the drive machinery.
Abstract translation: 提供基板装载机构，基板转印方法，基板处理装置和计算机可读存储介质，以通过使用提升销紧紧地支撑处理的基板来有效地抑制处理的基板的变形。 具有柔性的被处理基板安装在主卡盘（4）上。 多个提升销支撑并提起已处理的基板。 基板安装工具包括用于运行提升销的驱动机构（9a，9b）。 多个提升销包括第一提升销（8a）和第二提升销（8b）。 驱动机构在被处理基板以凸形轮廓弯曲下方的状态下稳定地支撑被处理基板。 控制器通过驱动机构控制第一和第二提升销的驱动。
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Patent Agency Ranking
公开(公告)号：KR102100032B1
公开(公告)日：2020-04-10
申请号：KR1020180050946
申请日：2018-05-03
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: F16K3/314 , F16K27/04 , F16K51/02 , H01L21/3065
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公开(公告)号：KR101902095B1
公开(公告)日：2018-09-27
申请号：KR1020170007848
申请日：2017-01-17
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01J37/32
Abstract: (과제) 기판에대한플라즈마처리의균일성을향상시킨플라즈마처리장치를제공한다. (해결수단) 플라즈마처리장치(11)는, 기판 G가탑재되는탑재대(21)를내부에수용하는챔버(20)와, 챔버(20)의내부에배치된격벽부(22)와, 격벽부(22)의상면에배치된고주파안테나(50)와, 격벽부(22)의하면에배치된가스도입유닛을갖고, 고주파안테나(50)에의해형성된전계에의해처리가스를플라즈마화하여기판 G를플라즈마처리한다. 가스도입유닛은, 길고기판탑재면과대략직교하는방향으로처리가스를분출하는복수의가스분출구멍(25b)을갖는제 1 샤워플레이트(24a~24d)와, 길고기판탑재면과대략평행한방향으로처리가스를분출하는복수의가스분출구멍(55b)을갖는제 2 샤워플레이트(54a~54d)가, 긴방향이방사상으로연장되는방향이되도록배치된구성을갖는다.
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公开(公告)号：KR101778334B1
公开(公告)日：2017-09-13
申请号：KR1020130122149
申请日：2013-10-14
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01J37/32 , H01L21/02 , H01L21/3065
Abstract: 본발명은처리장치에이용되는세라믹스제부품의열에의한불편의발생을극히회피할수 있는장착구조를제공한다. 가스도입어댑터(10A)는중공형상의어댑터본체(121)와, 이어댑터본체(121)를제 1 부분벽(6A)에고정하는고정기구(122)를갖고있다. 고정기구(122)는어댑터본체(121)의상부플랜지(121a)를보지하는홀더(123)와, 제 1 체결부재로서의링형상수나사(124)와, 제 2 체결부재로서의너트(125)와, 제 1 부분벽(6A)의상면에있어서어댑터본체(121)의주위에고정된스페이서(126)를갖고있다. 홀더(123)는가열시에너트(125) 및스페이서(126)와는역방향으로열팽창하며, 어댑터본체(121)의응력을완화하기위한응력완화수단으로서기능한다.
Abstract translation: 本发明提供一种安装结构，其能够避免由于在处理设备中使用的陶瓷部件的热而引起的不便。 气体导入适配器10A具有中空的适配器主体121和用于将适配器主体121固定到第一部分壁6A的固定机构122。 和固定机构122适配器主体121开口的服装的凸缘（121A），保持器（123），第一和作为紧固部件的环状的外螺纹124和第二螺母125作为用于保持所述的紧固构件， 并且在第一部分壁6A的上表面上固定在适配器主体121的上表面上的垫片126。 当保持器123被加热时，保持器123在与螺母125和隔离器126相反的方向上热膨胀并且用作用于减轻适配器主体121的应力的应力释放装置。
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公开(公告)号：KR1020140048054A
公开(公告)日：2014-04-23
申请号：KR1020130122149
申请日：2013-10-14
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01J37/32 , H01L21/02 , H01L21/3065
CPC classification number: H01J37/321 , H01J37/3244 , H01L21/02 , H01L21/02104 , H01L21/02274 , H01L21/02315 , H01L21/0234 , H01L21/0273 , H01L21/205 , H01L21/302 , H01L21/30621 , H01L21/3065 , H01L21/31116 , H01L21/76825 , H01L21/76826 , H05H1/46
Abstract: The present invention provides installation structure which can effectively prevent problems of ceramic parts caused by heat when used for a processing apparatus. A gas inflow adaptor (10A) comprises: an adaptor main body (121) with a hollow shape; and a fixing part (122) for fixing the adaptor main body (121) to a first part wall (6A). The fixing part (122) includes: a holder (123) for holding an upper flange (121a) of the adaptor main body (121); a ring shape male screw (124) which is a first fastening member; a nut (125) which is a second fastening member; and a spacer (126) fixed to the top of the first part wall (6A) around the adaptor main body (121). While heated, the holder (123) thermally expands in the reverse direction to the nut (125) and the spacer (126), and functions as a stress relaxation means to relieve the stress of the adaptor main body (121).
Abstract translation: 本发明提供了当用于处理装置时可以有效地防止由热引起的陶瓷部件的问题的安装结构。 气体流入适配器（10A）包括：具有中空形状的适配器主体（121）; 以及用于将适配器主体（121）固定到第一部分壁（6A）的固定部分（122）。 固定部分（122）包括：保持器（123），用于保持适配器主体（121）的上凸缘（121a）; 环形外螺纹（124），其是第一紧固构件; 作为第二紧固构件的螺母（125）; 以及在所述适配器主体（121）周围固定到所述第一部分壁（6A）的顶部的间隔件（126）。 在加热的同时，保持器（123）沿与螺母（125）和间隔件（126）相反的方向热膨胀，并且用作减轻适配器主体（121）的应力的应力松弛装置。
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公开(公告)号：KR1020100029042A
公开(公告)日：2010-03-15
申请号：KR1020090082972
申请日：2009-09-03
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/68 , H01L21/677 , B25J13/00
CPC classification number: H01L21/68714 , B65G49/061 , B65G49/063 , H01L21/68735 , H01L21/68742
Abstract: PURPOSE: A substrate table mechanism apparatus, a substrate processing apparatus, and a control method and storage media of a substrate table mechanism apparatus are provided so that a substrate processing apparatus equipped with the substrate table mechanism apparatus, and this substrate table mechanism apparatus, and the control method and the computer-readable storage medium executing this control method in computer of the substrate table mechanism apparatus can be offered. CONSTITUTION: A substrate table mechanism apparatus, a substrate processing apparatus, and a control method and storage media of a substrate table mechanism apparatus comprises a main chuck(4), a first lifter(8a), and a second lifter(8b). The main chuck is equipped with a substrate. The external periphery portion of the processed substrate is supported. A second lifter supports a center area of a processed substrate than a location in which a first lifter supports the processed substrate.
Abstract translation: 目的：提供一种基板台机构装置，基板处理装置以及基板台机构装置的控制方法和存储介质，使得具有基板台机构装置的基板处理装置和该基板台机构装置 可以提供在基板台机构装置的计算机中执行该控制方法的控制方法和计算机可读存储介质。 构成：基板台机构装置，基板处理装置以及基板台机构装置的控制方法和存储介质，包括主卡盘（4），第一升降器（8a）和第二升降器（8b）。 主卡盘配有基板。 处理后的基板的外周部被支承。 第二升降器支撑处理的基板的中心区域，其比第一升降器支撑经处理的基板的位置。
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