Abstract:
PURPOSE: A stack structure comprising epitaxial graphene, method of forming the stack structure and electronic device comprising the stack structure are provided to obtain the dual gate structure having the top gate and bottom gate. CONSTITUTION: The underlying layer is formed on the Si substrate(SUB1). At least one epitaxial graphene(GP1) is included on the underlying layer. The underlying layer is an h- BN(hexagonal boron nitride)(0001) layer. The Ni(111) layer is formed between the Si substrate and underlying layer. The Cu(111) layer is formed between the Si substrate and Ni(111) layer. The Si substrate is the Si(111) substrate or the Si(110) substrate.
Abstract:
A cross-point latch and method of operating the same is provided to shorten latch time and be manufacture easily while having excellent reliability of the latch. A cross-point latch includes a signal line(1), a control line(2, 3) crossing the signal line and unipolar switch(4, 5) at the crossing of the signal line and the control line. A bipolar unipolar switch comprises the resistance changing material. The resistance changing material is one of the niO, feO, coO, nbO2, zrO2, hfO2, znO, tbO, YO and WO3. The bipolar unipolar switch is at the crossing of the first and the second control line. Different voltages are supplied to the first and the second control line with supplying the input voltage to the signal line. One of the unipolar switches is closed and the other is opened.