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公开(公告)号:KR101830782B1
公开(公告)日:2018-04-05
申请号:KR1020110095813
申请日:2011-09-22
Applicant: 삼성전자주식회사
IPC: H01L29/78 , H01L21/336
CPC classification number: H01L29/456 , H01L29/1606 , H01L29/41725 , H01L29/45 , H01L29/452 , H01L29/78
Abstract: 그래핀을포함하는전극구조체및 전계효과트랜지스터를개시한다. 개시된전극구조체는반도체층상의그래핀과, 상기그래핀상의전극메탈을구비한다. 상기그래핀은상기반도체층과직접적으로접촉하며, 상기전극메탈은상기그래핀과직접접촉한다.
Abstract translation: 公开了包括石墨烯和场效应晶体管的电极结构。 所公开的电极结构包括半导体层上的石墨烯和石墨烯上的电极金属。 石墨烯与半导体层直接接触,并且电极金属与石墨烯直接接触。
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公开(公告)号:KR101443223B1
公开(公告)日:2014-09-24
申请号:KR1020080031714
申请日:2008-04-04
Applicant: 삼성전자주식회사
IPC: H01F27/00
CPC classification number: H01F17/0006 , H01F21/005 , H01F21/02 , H01F27/34 , H01F41/045 , H03H2001/0092
Abstract: 인덕터 및 그 동작방법에 관해 개시되어 있다. 개시된 본 발명의 인덕터는 인가되는 전기장에 따라 전기 저항이 달라지는 제1물질을 포함하는 인덕터용 도전선, 및 상기 도전선의 양단에 각각 전기적으로 연결된 제1 및 제2전극을 포함하는 인덕터를 제공한다.
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公开(公告)号:KR101336991B1
公开(公告)日:2013-12-16
申请号:KR1020070047833
申请日:2007-05-16
Applicant: 삼성전자주식회사
IPC: G11C11/00
CPC classification number: H03K3/40 , G11C13/00 , G11C13/0007 , G11C2213/32 , G11C2213/77
Abstract: 본발명은교차점래치및 그의동작방법에관한것이다. 개시된본 발명의교차점래치는신호선, 상기신호선과교차하는두 개의제어선및 상기신호선과상기제어선의교차점에배치된유니폴라스위치를포함하는것을특징으로한다.
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公开(公告)号:KR101303579B1
公开(公告)日:2013-09-09
申请号:KR1020070072485
申请日:2007-07-19
Applicant: 삼성전자주식회사
CPC classification number: H01H1/0094 , Y10T29/49105
Abstract: 전기기계적 스위치 및 그 제조방법을 개시한다. 본 발명의 전기기계적 스위치는 전기장에 의해 움직이는 탄성도전층을 포함하는 전기기계적 스위치에 있어서, 상기 탄성도전층은 적어도 한 층의 그래핀(graphene)을 포함하는 것을 특징으로 한다.
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公开(公告)号:KR1020130042906A
公开(公告)日:2013-04-29
申请号:KR1020110107056
申请日:2011-10-19
Applicant: 삼성전자주식회사
CPC classification number: G02F1/025 , G02F2001/0156 , G02F2202/02
Abstract: PURPOSE: An optical modulator using graphene is provided to increase a modulation depth and reduce the size of the optical modulator by increasing the optical absorption of the graphene through arranging the two graphene connected to an electrode at the center of an optical wave guide. CONSTITUTION: An optical modulator(100) using graphene comprises first and second graphene(141,142) positioned on the upper side of a semiconductor layer(120), a first electrode(161) positioned on the first graphene, and a second electrode(162) positioned on the second graphene. One side of the first graphene and one side of the second graphene are separately positioned. A first ridge part(124) on the semiconductor layer and a second ridge part(150) on the second graphene form an optical wave guide. The first and second graphene are formed at the center of the vertical surface of the optical wave guide.
Abstract translation: 目的:提供一种使用石墨烯的光调制器,以通过将连接到光波导中心的电极的两个石墨烯布置在一起来增加石墨烯的光吸收,从而增加调制深度并减小光调制器的尺寸。 构成:使用石墨烯的光学调制器(100)包括位于半导体层(120)的上侧的第一和第二石墨烯(141,142),位于第一石墨烯上的第一电极(161)和第二电极(162) 位于第二石墨烯上。 第一石墨烯的一侧和第二石墨烯的一侧分开定位。 半导体层上的第一脊部(124)和第二石墨烯上的第二脊部(150)形成光波导。 第一和第二石墨烯形成在光波导的垂直表面的中心。
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公开(公告)号:KR1020130032105A
公开(公告)日:2013-04-01
申请号:KR1020110095813
申请日:2011-09-22
Applicant: 삼성전자주식회사
IPC: H01L29/78 , H01L21/336
CPC classification number: H01L29/456 , H01L29/1606 , H01L29/41725 , H01L29/45 , H01L29/452 , H01L29/78 , H01L29/66712
Abstract: PURPOSE: An electrode structure including graphene and a field effect transistor are provided to reduce the energy barrier by putting graphene between a semiconductor layer and metal. CONSTITUTION: Graphene(120) is formed on a semiconductor layer(110). A graphene layer includes an electrode metal(130). The graphene has a single layer or a double layer. The electrode metal has a size of 30nm or less. The graphene is in direct contact with the semiconductor layer.
Abstract translation: 目的:提供包括石墨烯和场效应晶体管的电极结构,以通过将石墨烯放在半导体层和金属之间来减少能量势垒。 构成:在半导体层(110)上形成石墨烯(120)。 石墨烯层包括电极金属(130)。 石墨烯具有单层或双层。 电极金属的尺寸为30nm以下。 石墨烯与半导体层直接接触。
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公开(公告)号:KR1020120034419A
公开(公告)日:2012-04-12
申请号:KR1020100095971
申请日:2010-10-01
Applicant: 삼성전자주식회사
IPC: H01L29/78 , H01L21/336
CPC classification number: H01L29/66477 , B82Y10/00 , B82Y40/00 , H01L29/1079 , H01L29/1606 , H01L29/66045 , H01L29/66742 , H01L29/78 , H01L29/78603 , H01L29/78606 , H01L29/78684 , Y10S977/734 , Y10S977/838 , Y10S977/842 , H01L21/324
Abstract: PURPOSE: A graphene electronic device and a fabricating method thereof are provided to prevent the inherent characteristic of a graphene channel layer from being damaged by forming a passivation layer or a gate oxide on the graphene channel layer after a thermal process. CONSTITUTION: A gate oxide(112) is formed on a silicon substrate(110). A hydrophobic polymer layer(120) is formed on the gate oxide. A graphene channel layer(130) is formed on the hydrophobic polymer layer. A source electrode(142) and a drain electrode(144) are respectively formed on both ends of the graphene channel layer. A passivation layer(150) covering the graphene channel layer is formed between the source electrode and the drain electrode.
Abstract translation: 目的:提供石墨烯电子器件及其制造方法,以防止在热处理之后在石墨烯通道层上形成钝化层或栅极氧化物来损害石墨烯通道层的固有特性。 构成:在硅衬底(110)上形成栅氧化层(112)。 在栅极氧化物上形成疏水性聚合物层(120)。 在疏水聚合物层上形成石墨烯通道层(130)。 源极电极(142)和漏电极(144)分别形成在石墨烯通道层的两端。 在源电极和漏电极之间形成覆盖石墨烯沟道层的钝化层(150)。
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公开(公告)号:KR1020110051584A
公开(公告)日:2011-05-18
申请号:KR1020090108231
申请日:2009-11-10
Applicant: 삼성전자주식회사
CPC classification number: C01B31/0453 , B01J23/755 , B01J37/347 , B82Y30/00 , B82Y40/00 , C01B32/186 , C01B2204/04 , C23C16/0281 , C23C16/26
Abstract: PURPOSE: A method for manufacturing graphene using catalytic alloy is provided to control the amount of carbon dissolved in a catalytic alloy layer using catalytic metal reducing the dissolving property of nickel with respect to the carbon as a catalytic layer. CONSTITUTION: A method for manufacturing grapheme using catalytic alloy includes the following: An alloy catalytic layer is formed on a substrate(100). A graphene layer(120) is formed on the alloy catalytic layer by supplying hydrocarbon gas. The alloy catalytic layer is composed of at least two metal selected from transition metal or selected from a group including nickel, copper, platinum, iron, and gold.
Abstract translation: 目的:提供使用催化合金制造石墨烯的方法,以使用催化金属来控制溶解在催化合金层中的碳的量,从而降低镍相对于作为催化剂层的碳的溶解性。 构成:使用催化合金制造字形的方法包括以下:在基板(100)上形成合金催化层。 通过供给碳氢化合物气体,在合金催化剂层上形成石墨烯层(120)。 合金催化剂层由选自过渡金属中的至少两种金属或选自镍,铜,铂,铁和金的组成。
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公开(公告)号:KR1020110042952A
公开(公告)日:2011-04-27
申请号:KR1020090099833
申请日:2009-10-20
Applicant: 삼성전자주식회사
IPC: H01L29/786 , H01L21/268
CPC classification number: H01L29/1606 , H01L21/268 , H01L29/66742 , H01L29/778 , H01L29/78684 , H01L29/7781 , H01L29/78696
Abstract: PURPOSE: A graphene healing method using the laser beam and an electronic device manufacturing method thereof are provided to detect the defect of the graphene nano ribbon with the in-situ from the Raman spectroscope and remove the defect using the laser. CONSTITUTION: Whether the graphene nano ribbon is defective or not is determined(501). The laser light is irradiated on the graphene nano ribbon to heal the defect of the graphene nano ribbon(502). A laser light having the wavelength of 514 nm is used during the healing stage. A laser light having the power of 2 mW to 10 mW is used during the healing stage. A laser light is irradiated for 10 to 15 minutes during the healing stage.
Abstract translation: 目的:提供使用激光束的石墨烯愈合方法及其电子器件制造方法,以从拉曼光谱仪原位检测石墨烯纳米带的缺陷,并使用激光去除缺陷。 规定:是否确定石墨烯纳米带是否有缺陷(501)。 激光照射在石墨烯纳米带上以愈合石墨烯纳米带的缺陷(502)。 在愈合阶段使用波长为514nm的激光。 在愈合阶段使用功率为2mW至10mW的激光。 激光在愈合阶段照射10〜15分钟。
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公开(公告)号:KR1020110041791A
公开(公告)日:2011-04-22
申请号:KR1020090098778
申请日:2009-10-16
Applicant: 삼성전자주식회사
IPC: H01L21/336 , H01L29/78 , B82B3/00
CPC classification number: H01L29/1606 , H01L29/42384 , H01L29/66742 , H01L29/7781 , H01L29/78645 , H01L29/78684 , H01L21/2255
Abstract: PURPOSE: A graphene device and a manufacturing method thereof are provided to simplify the process by firstly forming a gate electrode in embedded shape before forming the graphene. CONSTITUTION: An embedded gate is formed in the top of the substrate. The top oxide-nitride-oxide(28) is formed on the embedded gate. The graphene channel(30) and electrodes are included on the top oxide-nitride-oxide. A plurality of embedded gates is included in the top of the substrate with the interval. It is successively laminated or the graphene channel and electrodes are on the contrary laminated. The insulating layer is included on the graphene channel between electrode.
Abstract translation: 目的:提供石墨烯器件及其制造方法,以在形成石墨烯之前首先形成嵌入形状的栅电极来简化工艺。 构成:在基板的顶部形成嵌入式栅极。 顶部氧化物 - 氮化物(28)形成在嵌入式栅极上。 石墨烯通道(30)和电极包括在顶部氧化物 - 氮化物氧化物上。 多个嵌入式门以间隔包含在衬底的顶部。 相继层压或石墨烯通道和电极相反层压。 绝缘层包含在电极之间的石墨烯通道上。
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