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公开(公告)号：KR1020070025535A
公开(公告)日：2007-03-08
申请号：KR1020050081815
申请日：2005-09-02
Abstract: An overload controlling method of a load distributing system and a device thereof are provided to generate a hash table where plural hash values are matched with lower node indexes, and to control an overload for delivering a message by using the hash table, thereby considering the overload as distributing loads through hashing. A hash table storage(210) stores a hash table which stepwise expresses overloaded states of each of plural lower nodes(310,320,330). A load distribution controller(230) updates the hash table based on inputted lower node load state information, and determines a lower node to which a message will be delivered on the basis of the hash table. A lower node interface unit(240) delivers the message to the determined lower node, and receives the corresponding lower node load state information from the plural lower nodes(310,320,330) to deliver the received information to the load distribution controller(230).
Abstract translation: 提供了一种负载分配系统及其装置的过载控制方法，用于生成散列表，其中多个散列值与较低节点索引匹配，并且通过使用散列表来控制用于传递消息的过载，从而考虑过载 通过散列来分配负载。 散列表存储器（210）存储逐步表示多个下级节点（310,320,330）中的每一个的过载状态的散列表。 负载分配控制器（230）基于输入的下层节点负载状态信息来更新散列表，并且基于散列表确定要传送消息的下层节点。 下层节点接口单元（240）将消息传递到确定的下层节点，并且从多个下层节点（310,320,330）接收相应的较低节点负载状态信息，以将接收的信息传送到负载分布控制器（230）。
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公开(公告)号：KR102251999B1
公开(公告)日：2021-05-17
申请号：KR1020150003112
申请日：2015-01-09
Applicant: 삼성전자주식회사 , 성균관대학교산학협력단
IPC: G03F1/64
Abstract: 펠리클의제조방법에있어서, 기판의일 면상에, 상기기판을촉매로사용하는화학반응을이용하여막을형성한다. 상기기판의다른일 면상에, 보호막패턴을형성한다. 상기기판을식각액에침지시켜, 상기보호막패턴으로부터노출된기판부분을제거하여프레임을형성한다. 상기식각액을제1 용매로교환한다.
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公开(公告)号：KR102251374B1
公开(公告)日：2021-05-12
申请号：KR1020140107059
申请日：2014-08-18
Applicant: 삼성전자주식회사
Abstract: 사용자입력을센싱하는이미지센싱장치및 그장치의동작방법이개시된다. 일실시예에따른이미지센싱장치는, 턴온사이클(turn-on cycle)과턴오프사이클(turn-off cycle)을포함하는버스트모드(burst mode)에따라동작하는광원부와, 픽셀어레이를이용하여반사광을수광하고, 반사광에기초하여목표영역내의객체의위치에대한센싱데이터를출력하는이미지센서를포함한다.
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Patent Agency Ranking
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公开(公告)号：KR1020170073949A
公开(公告)日：2017-06-29
申请号：KR1020150182793
申请日：2015-12-21
Applicant: 삼성전자주식회사
CPC classification number: H04N13/254 , G01S7/4863 , G01S7/4876 , G01S7/497 , G01S17/89 , H04N13/25 , H04N13/296
Abstract: 본개시에따른뎁스센서및 3차원카메라는광이수광되었을때 출력신호를제공하는매크로픽셀과매크로픽셀에서제공되는전기신호와기준수치 Nc를비교하여매크로픽셀의출력신호의제공여부를결정하는 PCD 회로및 매크로픽셀의다크카운트를측정하고, 다크카운트를기준으로매크로픽셀의기준수치 Nc를가변하여상기매크로픽셀의노이즈를제어하는제어부를포함할수 있다. 또한본 개시에따른뎁스센서및 3차원카메라는외광에의한노이즈신호인외광카운트를기준으로매크로픽셀의노이즈를제어할수 있다.
Abstract translation: 根据本公开的深度传感器和三维照相机包括PCD电路，用于通过比较当接收光时提供输出信号的宏像素和从宏像素提供的电信号来确定是否提供宏像素的输出信号， 以及控制单元，用于测量宏像素的暗计数并通过基于暗计数改变宏像素的参考值Nc来控制宏像素的噪声。 另外，根据本公开的深度传感器和三维照相机可以基于外部光计数来控制宏像素的噪声，该外部光计数是由于外部光导致的噪声信号。
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公开(公告)号：KR101642832B1
公开(公告)日：2016-07-27
申请号：KR1020090086670
申请日：2009-09-14
Applicant: 삼성전자주식회사 , 주식회사 에프에스티
IPC: G03F1/64 , H01L21/027
CPC classification number: G03F1/142 , C25D11/024 , C25D11/026 , C25D11/04 , C25D11/06 , C25D11/18 , G03F1/64 , Y10T428/13 , Y10T428/1317
Abstract: 이물질발생을억제하고아웃개싱의양이저감된펠리클프레임, 펠리클, 리소그래피장치및 펠리클프레임의제조방법이제공된다. 펠리클프레임은제1 물질층및 상기제1 물질층상에형성된제2 물질층을포함하며, 상기제1 물질층은상기알루미늄을포함하여구성되며, 상기제2 물질층은상기산화알루미늄및 상기전이금속을포함하여구성된다. 펠리클또는리소그래피장치는상기펠리클프레임을포함한다. 상기제 2물질층은습식산화플라즈마또는건식산화플라즈마를사용하여형성한다.
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公开(公告)号：KR1020150016056A
公开(公告)日：2015-02-11
申请号：KR1020130121501
申请日：2013-10-11
Applicant: 삼성전자주식회사
IPC: G03F1/24 , H01L21/027
CPC classification number: G03F1/24 , G03F1/68 , G03F1/78 , H01L21/0274
Abstract: The present invention aims to provide a reflective photomask blank which can be used for providing a photomask having a structure by which a life span of the photomask can be extended by minimizing damage on a film constituting the EUV photomask. The reflective photomask includes: a multi-reflection film; a capping layer which is formed on the multi-reflection film and includes transition metals; a passivation film which contacts at least a portion of the capping layer on a side opposite to the multi-reflection layer in the capping layer and includes transition metals and nitrogen atoms; and a light absorption pattern covering a portion of the capping layer.
Abstract translation: 本发明的目的在于提供一种反射式光掩模坯料，其可用于提供具有通过使对构成EUV光掩模的膜的损伤最小化而使光掩模的寿命延长的结构的光掩模。 反射光掩模包括：多反射膜; 覆盖层，其形成在多反射膜上并且包含过渡金属; 钝化膜，其在所述覆盖层中与所述多反射层相反的一侧接触所述覆盖层的至少一部分，并且包括过渡金属和氮原子; 以及覆盖覆盖层的一部分的光吸收图案。
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公开(公告)号：KR1020130001869A
公开(公告)日：2013-01-07
申请号：KR1020110062771
申请日：2011-06-28
Applicant: 삼성전자주식회사
IPC: G06T15/00
CPC classification number: G06T5/005 , G06T15/205 , G06T2207/10016 , H04N13/261
Abstract: PURPOSE: An image processing apparatus and an image processing method corrects the loss and expansion of an object in a rendering. CONSTITUTION: An image receiving unit(10) receives two-dimensional image signal including a background and at least one object. Based on depth information about the object, an image processing unit grasps a hole area shown by the shift of the object. Based on the layer information of the background and the object, the image processing unit performs the inpainting of the hole area. [Reference numerals] (10) Image receiving unit; (20) Image processing unit; (AA) Depth information; (BB) Layer information
Abstract translation: 目的：图像处理装置和图像处理方法校正渲染中对象的损失和扩展。 构成：图像接收单元（10）接收包括背景和至少一个对象的二维图像信号。 基于关于对象的深度信息，图像处理单元抓住由对象的移动所示的孔区。 基于背景和对象的层信息，图像处理单元执行孔区域的修复。 （附图标记）（10）图像接收单元; （20）图像处理单元; （AA）深度信息; （BB）层信息
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