公开(公告)号：KR1020080089198A

公开(公告)日：2008-10-06

申请号：KR1020080027396

申请日：2008-03-25

Applicant: 에이에스엠엘 네델란즈 비.브이.

Inventor： 물더,하이네멜레 ,  바젤만스,요한네스야코부스마테우스 ,  엔겔렌,아드리아누스프란시스쿠스페트루스 ,  오이링스,마르쿠스프란시스쿠스안토니우스 ,  반그리벤브로에크,헨드리쿠스로베르투스마리에 ,  틴네만스,파트리시우스알로이시우스야코부스 ,  반데르벤,파울 ,  엔덴디요크,빌프레드에드바르트

IPC: H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70516 ,  G02B26/0833 ,  G03F7/2057

Abstract: A lithographic apparatus and a lithographic method are provided to perform rapidly a switching operation between two or more masks or patterns formed on a controllable patterning device. A radiation beam(PB) is irradiated by an illumination system(IL). A pattern is imparted in a cross-section of the radiation beam by using a patterning device(MA). The patterned radiation beam is projected onto a target part of a substrate(W). The illumination system includes an array of individually controllable elements and related optical components arranged to convert the radiation beam into a desired illumination mode. An allocation scheme is used to allocate differently the individually controllable elements to different parts of the illumination mode. The allocation scheme is selected to provide a desired modification of one or more properties of the illumination mode or of the radiation beam.

Abstract translation: 提供光刻设备和光刻方法以快速执行在可控图案形成装置上形成的两个或多个掩模或图案之间的切换操作。 照射系统（IL）照射辐射束（PB）。 通过使用图案形成装置（MA）在辐射束的横截面中赋予图案。 图案化的辐射束被投影到基板（W）的目标部分上。 照明系统包括独立可控元件阵列和相关的光学部件，其被布置为将辐射束转换成期望的照明模式。 分配方案用于将单独的可控元件分配给照明模式的不同部分。 选择分配方案以提供照明模式或辐射束的一个或多个属性的期望修改。

公开(公告)号：KR1020080022193A

公开(公告)日：2008-03-10

申请号：KR1020087000962

申请日：2006-06-13

Applicant: 에이에스엠엘 네델란즈 비.브이.

Inventor： 반데케르크호프,마르쿠스아드리아누스 ,  데보아이요,빌헬무스페트루스 ,  반그리벤브로에크,헨드리쿠스로베르투스마리에 ,  클라센,미첼프랑소와즈후베르트 ,  콕,하이코빅터 ,  베렌스,마르티옌게라르트도미니크 ,  우이터디예크,탐모 ,  루이야커스,빌헬무스야코부스마리아 ,  쿠이퍼,요한네스마리아 ,  반두렌,레온 ,  존네벨트,야콥 ,  기링,에르빈요한네스마르티누스

IPC: H01L21/027

CPC classification number: G01J4/04 ,  G03F7/70091 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/2006 ,  G03F7/70191 ,  G03F7/70308

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retaxder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens. ® KIPO & WIPO 2008

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转的重放机，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。 ®KIPO＆WIPO 2008

公开(公告)号：KR1020080015146A

公开(公告)日：2008-02-18

申请号：KR1020087000965

申请日：2006-06-13

Applicant: 에이에스엠엘 네델란즈 비.브이.

Inventor： 반데케르크호프,마르쿠스아드리아누스 ,  데보아이요,빌헬무스페트루스 ,  반그리벤브로에크,헨드리쿠스로베르투스마리에 ,  클라센,미첼프랑소와즈후베르트 ,  콕,하이코빅터 ,  베렌스,마르티옌게라르트도미니크 ,  우이터디예크,탐모 ,  루이야커스,빌헬무스야코부스마리아 ,  쿠이퍼,요한네스마리아 ,  반두렌,레온 ,  존네벨트,야콥 ,  기링,에르빈요한네스마르티누스

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G01J4/04 ,  G03F7/70091 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/2006 ,  G03F7/70191 ,  G03F7/70308

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool (40) includes a rotatable retarder (R) configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具（40）包括可旋转延迟器（R），其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。