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    리소그래피 장치 및 방법을 위한 일루미네이터
    5.
    发明公开
    리소그래피 장치 및 방법을 위한 일루미네이터 有权
    用于光刻设备和方法的照明器

    公开(公告)号：KR1020080084744A

    公开(公告)日：2008-09-19

    申请号：KR1020080023973

    申请日：2008-03-14

    Applicant: 에이에스엠엘 네델란즈 비.브이. ,  칼 짜이스 에스엠테 게엠베하

    Inventor： 클라센,미첼프랑소와즈후베르트 ,  반그리벤브로에크,헨드리쿠스로베르투스마리에 ,  게,베른트페터 ,  슈미트-베버,에밀피터

    IPC: H01L21/027

    CPC classification number: G03F7/701 ,  G03F7/70566

    Abstract: An illuminator for a lithographic apparatus and method are provided to modify polarization of radiation beams by employing a plurality of polarization modifiers which are moveable into or out of partial intersection with the radiation beam having an angular and spatial distribution as governed by an illumination mode defining element. An illuminator for a lithographic apparatus comprises an illumination mode defining element(2) and a plurality of polarization modifiers(10a,10b). The polarization modifiers are moveable into or out of partial intersection with a radiation beam(PB) having an angular and spatial distribution as governed by the illumination mode defining element. The polarization modifiers are aligned between the illumination mode defining element and a pupil plane(16) of the illuminator.

    Abstract translation: 提供了一种用于光刻设备和方法的照明器，用于通过采用多个偏振修正器来修改辐射束的偏振，多个偏振修正器可移动到具有角度和空间分布的辐射束的部分交叉中，该辐射束具有由照明模式限定元件 。 用于光刻设备的照明器包括照明模式限定元件（2）和多个偏振调节器（10a，10b）。 偏振修正器可以与具有由照明模式限定元件所支配的角度和空间分布的辐射束（PB）可移动进入或离开部分交叉。 偏振调节剂在照明模式限定元件和照明器的光瞳平面（16）之间对准。

    조명 균일성 보정 및 균일성 드리프트 보상을 위한 리소그래피 장치 및 방법
    6.
    发明公开
    조명 균일성 보정 및 균일성 드리프트 보상을 위한 리소그래피 장치 및 방법 有权
    照相装置和照明均匀校正和均匀性补偿的方法

    公开(公告)号：KR1020130032888A

    公开(公告)日：2013-04-02

    申请号：KR1020130018911

    申请日：2013-02-21

    Applicant: 에이에스엠엘 네델란즈 비.브이. ,  에이에스엠엘 홀딩 엔.브이.

    Inventor： 짐머만,리차드칼 ,  반그리벤브로에크,헨드리쿠스로베르투스마리에 ,  코처스퍼거,피터씨. ,  다우니,토드알. ,  스톤,엘리자베스 ,  시스자르,질라드이스트반 ,  쿠빅,프레데릭 ,  블라디미르스키,올가

    IPC: G03F7/20 ,  G03F7/207 ,  G03F7/26

    CPC classification number: G03F7/70191 ,  G03F7/70058 ,  G03F7/70133

    Abstract: PURPOSE: A lithography apparatus, a manufacturing method of the device, and a uniformity correction system are provided to be able to compensate the uniformity drift caused by the illumination beam movement, the optical column uniformity, the uniformity compensator drift etc. CONSTITUTION: A lithography apparatus comprises an illumination system conditioning the radiation beams; a support structure maintaining a patterning device configured to pattern the conditioned radiation beams; a projection system reflecting the patterned radiation beams onto the target portion of a substrate; and a substrate table. A lighting system comprises a uniformity correction system located in the plane configured to accommodate a certain pupil in the case the radiation beams illuminate. A uniformity correction system comprises fingers(708) and actuating devices moving each finger. The fingers are able to move into and out of the intersection with a radiation beam in order to correct the intensity of each part of the incident radiation beams on fingers. Each actuating device is coupled with a corresponding finger among the fingers containing a single tip with the same width to each actuating device width, or coupled with a corresponding finger among the fingers containing a single tip with a smaller width than each actuating device width based on the position of the uniformity correction system to the field plane of the illumination system.

    Abstract translation: 目的：提供光刻设备，器件的制造方法和均匀性校正系统，以便能够补偿由照明光束移动，光学柱均匀性，均匀性补偿器漂移等引起的均匀性漂移。构成：光刻 装置包括对辐射束进行调节的照明系统; 保持图案形成装置的支撑结构，其被配置成对经调节的辐射束进行图案化; 将图案化的辐射束反射到基板的目标部分上的投影系统; 和基片台。 照明系统包括均匀性校正系统，该系统被配置为在辐射束照射的情况下容纳特定光瞳。 均匀性校正系统包括手指（708）和致动装置移动每个手指。 手指能够进入和离开与辐射束的交叉点，以便校正手指上的入射辐射束的每个部分的强度。 每个致动装置与指状物中的相应手指相结合，所述指状物包含与每个致动装置宽度相同宽度的单个末端，或者与包含相对于每个致动装置宽度的单个尖端宽度小的手指中的相应手指耦合 均匀性校正系统对照明系统的场平面的位置。

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