公开(公告)号：KR1020110126887A

公开(公告)日：2011-11-24

申请号：KR1020100046392

申请日：2010-05-18

Applicant: 한국과학기술원

Inventor： 이효철 ,  김장배 ,  왕기영 ,  윤제문 ,  김진백

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/201 ,  G03F7/0085 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0337

Abstract: PURPOSE: A method for forming a fluorescence pattern is provided to maintain fluorescence characteristic for a long period of time by blocking a fluorescent substance in a cross-linking net based on a cross-linking reaction. CONSTITUTION: A chemically amplified photo-resist composition composed of a cross-linking polymer, a photo acid generator, a fluorescent substance, and an organic solvent is coated on a substrate. A patterned photo-mask is arranged on the coated material. An exposing process is implemented. A post baking process is implemented to form a fluorescence pattern(3). The post baking process is implemented at a temperature between 90 and 120 degrees Celsius for 2 to 8 minutes. The photo acid generator is selected from triphenylsulfonium hexafluoroantimonite and triphenylsulfonium triflate. The cross-linking polymer includes one or more functional groups selected from a group including a vinyl group, an oxetane group, an epoxy group, a tetrahydrofuran group, an alkoxysilane group, a carboxyl group and a hydroxyl group, and a aldehyde group and a hydroxyl group.

Abstract translation: 目的：提供形成荧光图案的方法，通过在交联网中基于交联反应阻断荧光物质来长时间保持荧光特性。 构成：将由交联聚合物，光酸产生剂，荧光物质和有机溶剂组成的化学放大型光致抗蚀剂组合物涂布在基材上。 在涂层材料上布置图案化的光罩。 实施曝光过程。 实施后烘烤处理以形成荧光图案（3）。 后烘烤过程在90至120摄氏度的温度下实施2至8分钟。 光酸产生剂选自三苯基锍六氟锑酸盐和三苯基锍三氟甲磺酸盐。 交联聚合物包括选自乙烯基，氧杂环丁烷基，环氧基，四氢呋喃基，烷氧基硅烷基，羧基和羟基的基团中的一个或多个官能团，醛基和 羟基。