고종횡비 미세 구조물 및 그 제조방법과 고종횡비 미세구조물 어레이 및 그 제조방법
    11.
    发明公开
    고종횡비 미세 구조물 및 그 제조방법과 고종횡비 미세구조물 어레이 및 그 제조방법 有权
    高比例微结构及其制备方法和高比例微结构阵列及其制备方法

    公开(公告)号:KR1020100002597A

    公开(公告)日:2010-01-07

    申请号:KR1020080062547

    申请日:2008-06-30

    Abstract: PURPOSE: A method for producing high aspect ratio micro structure is provided to concentrate light intensity to the center of pattern groove formed at a photomask. CONSTITUTION: A method for producing high aspect ratio micro structure comprises: a step of attaching the photomask having a pattern groove(11a) on the surface of transparent substrate(10); a step of attaching negative photoresist on the surface of the photomask; a step of irradiating light at an opposite side of photomask-attached site to solidifying partial negative photoresist; and a step of removing a site where the negative photomask is not exprosed.

    Abstract translation: 目的:提供一种制造高纵横比微结构的方法,用于将光强度集中在形成在光掩模上的图形凹槽的中心。 构成:用于制造高纵横比微结构的方法包括:在透明基板(10)的表面上附着具有图案槽(11a)的光掩模的步骤; 在光掩模的表面上附着负性光致抗蚀剂的步骤; 在光掩模附着部位的相对侧照射光以固化部分负性光致抗蚀剂的步骤; 以及去除负光掩模未被展开的部位的步骤。

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