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公开(公告)号：KR1020100003049A
公开(公告)日：2010-01-07
申请号：KR1020080063147
申请日：2008-06-30
IPC: H01L31/0445 , H01L31/0224
CPC classification number: Y02E10/50 , H01L31/0445 , H01L31/0224
Abstract: PURPOSE: An integrated thin film solar cell and manufacturing method thereof arranges trenches to the electrode layer and solar battery layer and embody the high integration. CONSTITUTION: The integrated thin film solar cell comprises the first electrode layer(110), the solar battery layer(120), and the second electrode layer(130). The first electrode layer, the solar battery layer, and the second electrode layer are successively laminated on the substrate(100). The first electrode layer, and the solar battery layer and the second electrode layer have the first and second trench. In the first and second trenches is the first electrode layer, and the solar battery layer and the second electrode layer, a plurality of unit thin film solar cells is defined. The integrated thin film solar cell more includes the insulator(140) and conductor(150). The conductor is arranged on insulator.
Abstract translation: 目的：一种集成薄膜太阳能电池及其制造方法，将电极层和太阳能电池层的沟槽配置成高集成度。 构成：集成薄膜太阳能电池包括第一电极层（110），太阳能电池层（120）和第二电极层（130）。 第一电极层，太阳能电池层和第二电极层依次层叠在基板（100）上。 第一电极层和太阳能电池层和第二电极层具有第一和第二沟槽。 在第一和第二沟槽中是第一电极层，并且限定太阳能电池层和第二电极层，多个单位薄膜太阳能电池。 集成薄膜太阳能电池更包括绝缘体（140）和导体（150）。 导体布置在绝缘体上。
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公开(公告)号：KR100756286B1
公开(公告)日：2007-09-06
申请号：KR1020050021895
申请日：2005-03-16
Applicant: 한국과학기술원
IPC: H01L31/0224
Abstract: 본 발명은 집적형 태양전지의 제조 공정시 발생되는 면적손실을 최소화하고 저가의 공정으로도 가능한 집적형 박막 실리콘 태양전지 제조 방법에 관한 것이다.
이러한 본 발명에 따른 집적형 박막 태양전지의 제조방법은 (a) 투명기판 상에 인접하고 있는 상호간 소정의 간격으로 이격되도록 패터닝된 투명전극을 형성하는 단계와, (b) 상기 (a)단계에 의한 기판 위에 태양전지(반도체)층을 형성하는 단계와, (c) 상기 태양전지(반도체)층 위에 금속을 비스듬히 증착하여 1차 금속이면전극을 형성하는 단계와, (d) 상기 1차 금속이면전극을 마스크로 사용하여 상기 태양전지(반도체)층을 식각하는 단계 및 (e) 상기 (d)단계에 의한 기판 위에 금속을 비스듬히 증착하여 상기 투명전극과 상기 1차 금속이면전극이 전기적으로 연결되도록 2차 금속이면전극을 형성하는 단계를 포함한다.
이러한 본 발명에 따르면, 집적형 박막 태양전지의 단위 소자간 절연 간격을 기존에 비해 수십 배 내지 수백 배 이상 줄일 수 있어 태양전지의 유효 면적을 극대화할 수 있으며, 자기 정렬이 가능하여 정확한 위치제어장치가 불필요하고, 투명전극 형성 후의 모든 공정이 진공 중에서 수행되기 때문에 대기 상태에 노출됨에 따른 태양전지 모듈의 성능 저하를 방지할 수 있는 효과가 있다.
집적형 박막 태양전지, 모듈화, 투명전극, 금속이면전극, 경사에칭-
公开(公告)号：KR1020070004320A
公开(公告)日：2007-01-09
申请号：KR1020050059825
申请日：2005-07-04
Applicant: 한국과학기술원
CPC classification number: H04N5/7458
Abstract: A projection display device is provided to increase light utilizing efficiency and improve the picture quality of a projection screen by using a micro-lens array and a micro-mirror array. A substrate(40) is distanced from a light source at a predetermined interval. A plurality of micro-mirrors(30) is rotatively installed on a surface of the substrate so that each of the micro-mirrors has a predetermined sized incident angle with respect to an incident light. A first micro-lens array(70) is disposed between the light source and the substrate, and has a plurality of first micro-lenses corresponding to the micro-mirrors. A second micro-lens array(80) is disposed on an advancing path of a reflected light, which is reflected from the micro-mirrors. The second micro-lens array has a plurality of second micro-lenses corresponding to the micro-mirrors.
Abstract translation: 提供投影显示装置，以通过使用微透镜阵列和微镜阵列来增加光利用效率并提高投影屏的图像质量。 衬底（40）以预定的间隔与光源隔开。 多个微反射镜（30）被旋转地安装在基板的表面上，使得每个微反射镜相对于入射光具有预定尺寸的入射角。 第一微透镜阵列（70）设置在光源和衬底之间，并且具有对应于微镜的多个第一微透镜。 第二微透镜阵列（80）设置在从微反射镜反射的反射光的前进路径上。 第二微透镜阵列具有对应于微镜的多个第二微透镜。
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公开(公告)号：KR1020030070445A
公开(公告)日：2003-08-30
申请号：KR1020020009989
申请日：2002-02-25
Applicant: 한국과학기술원
IPC: G02B26/08
Abstract: PURPOSE: A micromirror device using a cantilever is provided to obtain two stable states of rotation by forming the micromirror device having a symmetric structure. CONSTITUTION: A micromirror device using a cantilever includes a substrate(21), two electrodes(22,23), a cantilever support portion(24), two cantilevers(31,32), a couple of mirror support portions(26,27), and a mirror(20). An addressing circuit is formed on the substrate. The electrodes are formed on the substrate to be electrically connected to the addressing circuit. The cantilever support portion is formed vertically to a center of the substrate. The cantilever support portion is electrically connected to the addressing circuit. The cantilevers are horizontally supported by the cantilever support portion. The mirror support portions are formed vertically to each end of the cantilevers. The mirror is loaded on the mirror support portions. The cantilevers are modified by the electrostatic force between the electrodes and the cantilevers or the electrodes and the mirror.
Abstract translation: 目的：提供使用悬臂的微镜装置，通过形成具有对称结构的微镜装置来获得两种稳定的旋转状态。 构造：使用悬臂的微镜装置包括基板（21），两个电极（22,23），悬臂支撑部分（24），两个悬臂（31,32），一对反射镜支撑部分（26,27） ，和反射镜（20）。 在基板上形成寻址电路。 电极形成在基板上以电连接到寻址电路。 悬臂支撑部垂直于基板的中心形成。 悬臂支撑部分电连接到寻址电路。 悬臂由悬臂支撑部水平地支撑。 镜支撑部分垂直于悬臂的每一端形成。 镜子装载在镜子支撑部分上。 悬臂通过电极与悬臂或电极和反射镜之间的静电力来改变。
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公开(公告)号：KR1020030022971A
公开(公告)日：2003-03-19
申请号：KR1020010055831
申请日：2001-09-11
Applicant: 한국과학기술원
IPC: H01L21/20
CPC classification number: H01L21/67115 , C23C16/482 , C23C16/488
Abstract: PURPOSE: An apparatus and a method for a photo-induced process are provided to perform easily the photo-induced process by utilizing vacuum ultraviolet rays. CONSTITUTION: A reaction room housing has an opening portion for transmitting the light and a support plate for supporting a sample or a substrate. A light source(340) is used for irradiating the light into a reaction room(350) through the opening portion. A transparent film hangar housing is located between a light emitting side of the light source(340) and the opening portion of the reaction room(350). A lower plate of the transparent film hangar housing is combined with an upper plate of the reaction room(350). A transparent film(330) is horizontally installed in the inside of the transparent film hangar housing. The first flange(306) is formed around an opening portion of an edge of the light source(340). The second flange(308) is welded around an opening portion of a hangar. A flexible portion(370) has the third flange connected with the first and the second flanges(306,308). A driving portion is used for shifting the light source(340) to an upper portion or a lower portion.
Abstract translation: 目的：提供一种用于光引发工艺的装置和方法，以便通过利用真空紫外线来容易地执行光诱导过程。 构成：反应室壳体具有用于透射光的开口部分和用于支撑样品或基底的支撑板。 光源（340）用于通过开口部分将光照射到反应室（350）中。 透明薄膜机架壳体位于光源（340）的发光侧和反应室（350）的开口部分之间。 透明薄膜机架壳体的下板与反应室（350）的上板组合。 透明薄膜（330）水平地安装在透明薄膜机库壳体的内部。 第一凸缘（306）围绕光源（340）的边缘的开口部分形成。 第二凸缘（308）围绕机库的开口部分焊接。 柔性部分（370）具有与第一和第二凸缘（306,308）连接的第三凸缘。 驱动部分用于将光源（340）移动到上部或下部。
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Patent Agency Ranking
公开(公告)号：KR100346755B1
公开(公告)日：2002-07-31
申请号：KR1019990052512
申请日：1999-11-24
Applicant: 한국과학기술원
Inventor： 임굉수
IPC: C23C16/00
Abstract: 광여기공정에있어서광원표면의흐림이나광학창의흐림문제를해결하는장치와방법에관해개시하고있다. 본발명의광여기장치는, 진공배기가가능한반응실의상판부에밀착설치된광원으로부터방출된빛이반응실내의반응가스를분해하여기판표면에대해광화학기상증착, 산화, 에칭, 어닐링, 표면개질및 세정공정을행하는것으로서, 빛이방출되는광원표면의흐림을방지하기위하여두루말이형태로감긴얇은내열성투명필름(transparent film)을광원과기판사이의반응실내부공간에수평으로펼쳐설치하여박막증착시에는광원과투명필름사이의공간에반응가스가접근하지못하도록광원과투명필름사이의공간을기계적인방법으로밀폐시킴으로써광원표면의흐림을방지하도록고안되어있다. 본발명에따르면, 광원으로부터방출된빛을유효하게활용할수 있을뿐 아니라기존의장치보다가동효율이월등히향상된광여기공정장치를구현할수 있다.
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公开(公告)号：KR101112494B1
公开(公告)日：2012-03-13
申请号：KR1020100023967
申请日：2010-03-17
IPC: H01L31/04
CPC classification number: Y02E10/50
Abstract: 본 발명의 광기전력 장치의 제조 방법은 제1 전극 및 제2 전극 사이에 위치하는 활성층을 챔버 내에서 형성하며, 미리 혼합된 수소 가스와 실리콘 포함 원료 가스가 상기 챔버 내로 유입되며, 상기 혼합된 수소 가스와 실리콘 포함 원료 가스의 수소 희석비는 주기적으로 증감하는 것을 특징으로 한다.
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公开(公告)号：KR1020100127380A
公开(公告)日：2010-12-06
申请号：KR1020090045802
申请日：2009-05-26
CPC classification number: Y02E10/50 , Y02P70/521 , H01L31/18 , H01L31/04
Abstract: PURPOSE: A method for manufacturing a mold and a photovoltaic device by using the same are provided to manufacture the photovolatic device simply and inexpensively. CONSTITUTION: A mold manufacturing substrate(100), including the material that is not removed by a laser having a specific wave, is prepared. A layer(110) for producing a mold, including the material removed by the laser, is formed on the top of the substrate for producing the mold. The laser is irradiated on the layer for the mold production so that a groove(120) for the mold production is formed on the layer for the mold production.
Abstract translation: 目的：提供一种用于制造模具和使用该模具的光伏器件的方法，以简单且廉价地制造光电装置。 构成：制备包括不被具有特定波的激光去除的材料的模具制造衬底（100）。 在用于制造模具的基板的顶部上形成用于制造包括通过激光去除的材料的模具的层（110）。 将激光照射在用于模具生产的层上，使得用于模具生产的层上形成用于模具生产的槽（120）。
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公开(公告)号：KR1020100003048A
公开(公告)日：2010-01-07
申请号：KR1020080063146
申请日：2008-06-30
IPC: H01L31/0445 , H01L31/0224
CPC classification number: Y02E10/50 , H01L31/0445 , H01L31/0224
Abstract: PURPOSE: An integrated thin film solar cell and manufacturing method thereof are provided to controls the etching of the solar battery layer. CONSTITUTION: The integrated thin film solar cell comprises insulation bank patterns(110a, 110b) first electrode layers(120a, 120b) and solar battery layers(135a, 135b). The insulation bank pattern is arranged on the substrate(100). The first electrode layer is arranged between insulation bank patterns. The solar battery layer is arranged on insulation bank patterns. The solar battery layer partly exposes the first electrode layer. The integrated thin film solar cell more includes second electrode layers(140a, 140b, 140c) and conductive layers(150a, 150a, 150b). The second electrode layer is arranged on the solar battery layer. The conductive layer (conductive film) is arranged on the solar battery layer, and the first and second electrode layer. The conductive layer electrically connects the first and neighboring second electrode layers.
Abstract translation: 目的：提供一种集成薄膜太阳能电池及其制造方法，以控制太阳能电池层的蚀刻。 构成：集成薄膜太阳能电池包括绝缘堤图案（110a，110b），第一电极层（120a，120b）和太阳能电池层（135a，135b）。 绝缘堤图案布置在基板（100）上。 第一电极层布置在隔离堤图形之间。 太阳能电池层设置在绝缘堤图案上。 太阳能电池层部分地暴露第一电极层。 集成薄膜太阳能电池还包括第二电极层（140a，140b，140c）和导电层（150a，150a，150b）。 第二电极层设置在太阳能电池层上。 导电层（导电膜）布置在太阳能电池层，以及第一和第二电极层上。 导电层电连接第一和相邻的第二电极层。
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20.发明授权
公开(公告)号：KR100817101B1
公开(公告)日：2008-03-26
申请号：KR1020070033378
申请日：2007-04-04
Applicant: 한국과학기술원
IPC: H01L21/027
CPC classification number: C09K19/544 , Y10T428/24802 , H01L21/0274 , B29C33/3842 , G03F7/2006 , H01L21/0275
Abstract: A method for forming a polymer or resist pattern is provided to form a polymer or resist pattern of a three-dimensional asymmetrical structure having various slopes and shapes by adjusting the diffusion degree and diffusion intensity together with the progression direction of incident light in a photolithography process while using conventional lithography equipment. Photosensitive polymer or resist is deposited on a substrate(400) to form a polymer or resist layer(410). An exposure portion is determined on the polymer or resist layer wherein a photomask(420), an embedded mask or a metal pattern can be formed on the polymer or resist layer. A light refraction layer(440) or a light diffusion layer(430) is disposed on the path of the light exposed to the polymer or resist layer. Light transmitting the light refraction layer and the light diffusion layer is irradiated to the exposure portion of the polymer or resist layer to form a polymer or resist pattern.
Abstract translation: 提供形成聚合物或抗蚀剂图案的方法，以通过在光刻工艺中调整扩散度和扩散强度以及入射光的进行方向来形成具有各种斜率和形状的三维不对称结构的聚合物或抗蚀剂图案 同时使用传统的光刻设备。 光敏聚合物或抗蚀剂沉积在基底（400）上以形成聚合物或抗蚀剂层（410）。 在聚合物或抗蚀剂层上确定曝光部分，其中可以在聚合物或抗蚀剂层上形成光掩模（420），嵌入掩模或金属图案。 在暴露于聚合物或抗蚀剂层的光的路径上设置光折射层（440）或光扩散层（430）。 将透射光折射层和光扩散层的光照射到聚合物或抗蚀剂层的曝光部分以形成聚合物或抗蚀剂图案。
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