公开(公告)号：US20220372056A1

公开(公告)日：2022-11-24

申请号：US17620934

申请日：2020-06-10

Applicant: ADEKA CORPORATION

Inventor： Masaki ENZU ,  Masako HATASE ,  Keisuke TAKEDA

IPC: C07F15/00 ,  C23C16/18

Abstract: The present invention provides a ruthenium compound represented by the following general formula (1) or (2), a thin-film forming raw material containing the ruthenium compound, and a method of producing a thin-film including using the thin-film forming raw material: where R1 to R12 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing group, and “n” represents an integer from 0 to 2, provided that at least one of R1 to R12 represents the fluorine atom-containing group; where R13 to R17 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and a total number of the carbon atoms of R11 to R17 is 3 or more.