公开(公告)号：US20250109296A1

公开(公告)日：2025-04-03

申请号：US18978671

申请日：2024-12-12

Applicant: ADEKA CORPORATION

Inventor： Keisuke TAKEDA ,  Masaki ENZU

IPC: C09D1/00 ,  C07F5/00 ,  C23C16/40 ,  C23C16/455

Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following formula (1): where R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, L represents a group represented by the following formula (L-1) or (L-2), and M represents an indium atom or a gallium atom; where R11 and R12 each independently represent a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms, and * represents a bonding position with M in the formula (1); where R21 to R23 each independently represent a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 5 carbon atoms, and * represents a bonding position with M in the formula (1), provided that R21 and R22 represent different groups.

公开(公告)号：US20240060177A1

公开(公告)日：2024-02-22

申请号：US18039411

申请日：2021-11-30

Applicant: ADEKA CORPORATION

Inventor： Keisuke TAKEDA ,  Masaki ENZU

IPC: C23C16/40 ,  C01G15/00 ,  C07F5/00 ,  C23C16/455

CPC classification number: C23C16/407 ,  C01G15/00 ,  C07F5/00 ,  C23C16/45525

Abstract: Provided is an indium compound, which is represented by the following general formula (1):




where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2):




where R11, R12, R13, R14, R21 and R22 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and represents a bonding position with C in the general formula (1).

公开(公告)号：US20240167154A1

公开(公告)日：2024-05-23

申请号：US18280559

申请日：2022-02-24

Applicant: ADEKA CORPORATION

Inventor： Atsushi SAKURAI ,  Yoshiki OOE ,  Keisuke TAKEDA ,  Chiaki MITSUI ,  Atsushi YAMASHITA

IPC: C23C16/455

CPC classification number: C23C16/45553 ,  C23C16/45527

Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1):


M(R1)x1[A1-N(R2)(R3)]y1   (1)

in the formula (1), R1, R2, and R3 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms, A1 represents a linear or branched alkylene group having 1 to 5 carbon atoms, x1 represents an integer of from 0 to 2, y1 represents an integer of from 1 to 3, and M represents an indium atom or a zinc atom, provided that when M represents an indium atom, a compound in which x1 represents 2, y1 represents 1, and R1, R2, and R3 each represent a methyl group is excluded.

公开(公告)号：US20220389570A1

公开(公告)日：2022-12-08

申请号：US17771181

申请日：2020-10-19

Applicant: ADEKA CORPORATION

Inventor： Atsushi SAKURAI ,  Masako HATASE ,  Masaki ENZU ,  Keisuke TAKEDA ,  Ryota FUKUSHIMA ,  Atsushi YAMASHITA

IPC: C23C16/18 ,  C23C16/455

Abstract: Provided is a thin-film forming raw material containing a compound represented by the following formula (1): in the formula (1), R1 to R5 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group containing a fluorine atom, M represents a metal atom, and “n” represents a valence of the metal atom represented by M, provided that at least one of R2, R3, and R4 represents the group containing a fluorine atom.

公开(公告)号：US20240425975A1

公开(公告)日：2024-12-26

申请号：US18695108

申请日：2022-09-20

Applicant: ADEKA CORPORATION

Inventor： Masako HATASE ,  Keisuke TAKEDA ,  Chiaki MITSUI

IPC: C23C16/18 ,  C07F11/00 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455

Abstract: A thin-film forming raw material contains a molybdenum compound represented by the following general formula (1), a method of forming a thin-film through use of the thin-film forming raw material, and a molybdenum compound having a specific structure: where R1 represents an alkyl group having 1 to 5 carbon atoms or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, L1 represents a group represented by the following general formula (L-1) or (L-2), and “n” represents an integer of from 1 to 4, provided that when “n” represents 4, R1 represents a fluorine atom-containing alkyl group having 1 to 5 carbon atoms; where R2 to R12 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, and * represents a bonding site.

公开(公告)号：US20230142848A1

公开(公告)日：2023-05-11

申请号：US17915300

申请日：2021-03-18

Applicant: ADEKA CORPORATION

Inventor： Ryota FUKUSHIMA ,  Keisuke TAKEDA ,  Masaki ENZU

IPC: C07F3/06 ,  C23C16/40 ,  C23C16/455

CPC classification number: C07F3/06 ,  C23C16/407 ,  C23C16/45553

Abstract: Provided is a zinc compound represented by the following general formula (1) or (2):




in the formula (1), R1 represents an unsubstituted alkyl group having 1 to 5 carbon atoms, etc., R2 and R5 each independently represent a hydrogen atom, a fluorine atom, an unsubstituted alkyl group having 1 to 5 carbon atoms, etc., and R3 and R4 each independently represent a hydrogen atom, a fluorine atom, an unsubstituted alkyl group having 1 to 5 carbon atoms, etc.;




in the formula (2), R10, R11, R14, and R15 each independently represent a hydrogen atom, a fluorine atom, an unsubstituted alkyl group having 1 to 5 carbon atoms, etc., and R9, R12, R13, and R16 each independently represent a hydrogen atom, a fluorine atom, an unsubstituted alkyl group having 1 to 5 carbon atoms, etc.

公开(公告)号：US20210155638A1

公开(公告)日：2021-05-27

申请号：US17048360

申请日：2019-04-08

Applicant: ADEKA CORPORATION

Inventor： Masaki ENZU ,  Keisuke TAKEDA ,  Akihiro NISHIDA

IPC: C07F3/02 ,  C09D1/00 ,  C23C16/40 ,  C23C16/455

Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a magnesium compound represented by the following general formula (1): where R1 represents an isopropyl group, a sec-butyl group, or a tert-butyl group. A thin-film containing a magnesium atom is produced on a surface of a substrate with high productivity through use of the raw material.

公开(公告)号：US20240337014A1

公开(公告)日：2024-10-10

申请号：US18575963

申请日：2022-06-28

Applicant: ADEKA CORPORATION

Inventor： Tomoharu YOSHINO ,  Keisuke TAKEDA ,  Atsushi YAMASHITA

IPC: C23C16/18 ,  C07F15/06 ,  C23C16/448 ,  C23C16/455

CPC classification number: C23C16/18 ,  C07F15/065 ,  C23C16/4485 ,  C23C16/45553

Abstract: Provided is a cobalt compound represented by the following general formula (1):




where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2);




where R8 to R10 each independently represent an alkyl group having 1 to 5 carbon atoms, A1 and A2 each independently represent an alkanediyl group having 1 to 5 carbon atoms, and * represents a bonding site.

公开(公告)号：US20230151220A1

公开(公告)日：2023-05-18

申请号：US17915270

申请日：2021-03-18

Applicant: ADEKA CORPORATION

Inventor： Keisuke TAKEDA ,  Masaki ENZU

IPC: C09D1/00 ,  C07F5/00 ,  C23C16/455 ,  C23C16/40

CPC classification number: C09D1/00 ,  C07F5/00 ,  C23C16/40 ,  C23C16/407 ,  C23C16/45525

Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented, by the following formula (1) :





where R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, L represents a group represented by the following formula (L-1) or (L-2), and M represents an indium atom or a gallium atom;





where R11 and R12 each independently represent a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms, and * represents a bonding position with M in the formula (1);





where R21 to R23 each independently represent a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 5 carbon atoms, and * represents a bonding position with M in the formula (1), provided that R21 and R22 represent different groups.

公开(公告)号：US20230151041A1

公开(公告)日：2023-05-18

申请号：US17917671

申请日：2021-03-31

Applicant: ADEKA CORPORATION

Inventor： Tomoharu YOSHINO ,  Yoshiki OOE ,  Keisuke TAKEDA ,  Ryota FUKUSHIMA ,  Chiaki MITSUI ,  Atsushi YAMASHITA

IPC: C07F15/06 ,  C01B33/027 ,  C07F7/22 ,  C23C16/18 ,  C23C16/40 ,  C23C16/455

CPC classification number: C07F15/065 ,  C01B33/027 ,  C07F7/2284 ,  C23C16/18 ,  C23C16/407 ,  C23C16/45553

Abstract: The present invention provides an amidinate compound represented by the following general formula (1) or a dimer compound thereof, and a method of producing a thin-film including using the compound as a raw material:




where R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and “n” represents the valence of the atom represented by M, provided that at least one hydrogen atom of R1 to R3 is substituted with a fluorine atom.