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公开(公告)号：US09939737B2
公开(公告)日：2018-04-10
申请号：US14761957
申请日：2013-12-05
Applicant: ASML Netherlands B.V.
IPC: G03F7/20 , H01L21/683 , H01L21/687 , H02N13/00
CPC classification number: G03F7/70708 , H01L21/6831 , H01L21/6833 , H01L21/6875 , H02N13/00
Abstract: An electrostatic clamp (12) comprising an electrode (2), a layer of resistive material (6) located on the electrode, and a layer of dielectric (8) located on the resistive material, wherein the electrostatic clamp further comprises burls (10) which project from the layer of dielectric.
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公开(公告)号：US12197139B2
公开(公告)日：2025-01-14
申请号：US17802841
申请日：2021-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Bernardus Charles Engelen , Arnoud Willem Notenboom , Jim Vincent Overkamp , Kjeld Gertrudus Hendrikus Janssen , Johannes Adrianus Cornelis Maria Pijnenburg , Jeroen Van Duivenbode , Erik Johannes Nieuwenhuis , Koos Van Berkel
IPC: G03F7/00
Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.
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公开(公告)号：US12117726B2
公开(公告)日：2024-10-15
申请号：US18220799
申请日：2023-07-11
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand Vles , Chaitanya Krishna Ande , Antonius Franciscus Johannes De Groot , Adrianus Johannes Maria Giesbers , Johannes Joseph Janssen , Paul Janssen , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Marcel Peter Meijer , Wouter Rogier Meijerink , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Raymond Olsman , Hrishikesh Patel , Mária Péter , Gerrit van den Bosch , Wilhelmus Theodorus Anthonius Johannes van den Einden , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
IPC: G03F1/64
CPC classification number: G03F1/64
Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：US12072620B2
公开(公告)日：2024-08-27
申请号：US17278356
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan Van Zwol , Sander Baltussen , Dennis De Graaf , Johannes Christiaan Leonardus Franken , Adrianus Johannes Maria Giesbers , Alexander Ludwig Klein , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Alexey Sergeevich Kuznetsov , Arnoud Willem Notenboom , Mahdiar Valefi , Marcus Adrianus Van de Kerkhof , Wilhelmus Theodorus Anthonius Johannes Van den Einden , Ties Wouter Van der Woord , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
CPC classification number: G03F1/64 , G03F7/7015
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.
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公开(公告)号：US12066758B2
公开(公告)日：2024-08-20
申请号：US17728608
申请日：2022-04-25
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand Vles , Erik Achilles Abegg , Aage Bendiksen , Derk Servatius Gertruda Brouns , Pradeep K. Govil , Paul Janssen , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , James Norman Wiley
CPC classification number: G03F1/64 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70916 , G03F7/70983
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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Patent Agency Ranking
公开(公告)号：US11754918B2
公开(公告)日：2023-09-12
申请号：US17548944
申请日：2021-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand Vles , Chaitanya Krishna Ande , Antonius Franciscus Johannes De Groot , Adrianus Johannes Maria Giesbers , Johannes Joseph Janssen , Paul Janssen , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Marcel Peter Meijer , Wouter Rogier Meijerink , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Raymond Olsman , Hrishikesh Patel , Mária Péter , Gerrit Van Den Bosch , Wilhelmus Theodorus Anthonius Johannes Van Den Einden , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
IPC: G03F1/64
CPC classification number: G03F1/64
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：US20150103325A1
公开(公告)日：2015-04-16
申请号：US14395979
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Ronald Van Der Wilk , Roger Schmitz , Arnoud Willem Notenboom , Manon Elise Will
IPC: G03F7/20
CPC classification number: G03F7/70708 , G03F7/70875 , H01L21/6831
Abstract: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.
Abstract translation: 一种构造成保持物体的静电夹具（21），所述静电夹具包括电极（24），由位于所述电极上的电阻材料形成的电阻部分（23）和由电介质材料形成的电介质部分 位于电阻部分上。
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公开(公告)号：US11686997B2
公开(公告)日：2023-06-27
申请号：US17685988
申请日：2022-03-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan Van Zwol , Adrianus Johannes Maria Giesbers , Johan Hendrik Klootwijk , Evgenia Kurganova , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Leonid Aizikovitsj Sjmaenok , Ties Wouter Van Der Woord , David Ferdinand Vles
IPC: G03F1/62
CPC classification number: G03F1/62
Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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公开(公告)号：US11467486B2
公开(公告)日：2022-10-11
申请号：US16969211
申请日：2019-02-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Evgenia Kurganova , Adrianus Johannes Maria Giesbers , Alexander Ludwig Klein , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Pieter-Jan Van Zwol , David Ferdinand Vles , Sten Vollebregt , Willem-Pieter Voorthuijzen
Abstract: A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.
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公开(公告)号：US20220187701A1
公开(公告)日：2022-06-16
申请号：US17685988
申请日：2022-03-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan VAN ZWOL , Adrianus Johannes Maria Giesbers , Johan Hendrik Klootwijk , Evgenia Kurganova , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Leonid Aizikovitsj Sjmaenok , Ties Wouter Van Der Woord , David Ferdinand Vles
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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