公开(公告)号：US11231657B2

公开(公告)日：2022-01-25

申请号：US16625135

申请日：2018-06-07

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Cornelis Adrianus De Meijere ,  Willem Michiel De Rapper ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Groenewold ,  Alain Louis Claude Leroux ,  Maxim Aleksandrovich Nasalevich ,  Andrey Nikipelov ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

公开(公告)号：US11269259B2

公开(公告)日：2022-03-08

申请号：US16952371

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US12235592B2

公开(公告)日：2025-02-25

申请号：US18008283

申请日：2021-06-09

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Koos Van Berkel ,  Marcus Adrianus Van De Kerkhof ,  Roger Franciscus Mattheus Maria Hamelinck ,  Shahab Shervin ,  Marinus Augustinus Christiaan Verschuren ,  Johannes Bernardus Charles Engelen ,  Matthias Kruizinga ,  Tammo Uitterdijk ,  Oleksiy Sergiyovich Galaktionov ,  Kjeld Gertrudus Hendrikus Janssen ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Peter Van Delft

IPC: G03F7/00

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US11086238B2

公开(公告)日：2021-08-10

申请号：US16623898

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Henricus Johannes Stevens ,  Nina Vladimirovna Dziomkina ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis Maria Pijnenburg

IPC: G03F7/20 ,  H01L21/687

Abstract: A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.

公开(公告)号：US12197139B2

公开(公告)日：2025-01-14

申请号：US17802841

申请日：2021-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Bernardus Charles Engelen ,  Arnoud Willem Notenboom ,  Jim Vincent Overkamp ,  Kjeld Gertrudus Hendrikus Janssen ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Jeroen Van Duivenbode ,  Erik Johannes Nieuwenhuis ,  Koos Van Berkel

IPC: G03F7/00

Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

公开(公告)号：US11287752B2

公开(公告)日：2022-03-29

申请号：US16625135

申请日：2018-06-07

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Cornelis Adrianus De Meijere ,  Willem Michiel De Rapper ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Groenewold ,  Alain Louis Claude Leroux ,  Maxim Aleksandrovich Nasalevich ,  Andrey Nikipelov ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

公开(公告)号：US11156924B2

公开(公告)日：2021-10-26

申请号：US17269909

申请日：2019-07-16

Applicant: ASML Netherlands B.V.

Inventor： Johannes Petrus Martinus Bernardus Vermeulen ,  Luc Leonardus Adrianus Martinus Meulendijks ,  Antonius Franciscus Johannes De Groot ,  Johannes Adrianus Cornelis Maria Pijnenburg

IPC: G03F7/20

Abstract: The invention provides a substrate support for supporting a substrate, comprising: a support body, which support body comprises a support surface for supporting the substrate, a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.