公开(公告)号：US09395633B2

公开(公告)日：2016-07-19

申请号：US14413394

申请日：2013-06-14

Applicant: ASML Netherlands B.V.

Inventor： Alexander Alexandrovich Danilin ,  Alejandro Xabier Arrizabalaga Uriarte ,  Boris Menchtchikov ,  Alexander Viktorovych Padiy

IPC: G03B27/68 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70516 ,  G03F7/70725

Abstract: A method of calibrating a substrate positioning system of a lithographic apparatus, the method including: exposing a pattern with the lithographic apparatus on an exposed layer on the surface of a substrate having a reference layer, wherein the pattern corresponds to a movement of the substrate by the substrate positioning system; measuring overlay data between the exposed layer and the reference layer on a plurality of positions on the substrate; transforming the overlay data from a spatial domain to a frequency domain by a discrete cosine transformation; modifying the overlay data in the frequency domain by selecting a subset of the overlay data; transforming the modified overlay data from the frequency domain back to the spatial domain by an inverse discrete cosine transformation; calibrating the substrate positioning system by using the modified overlay data in the spatial domain.

Abstract translation: 一种校准光刻设备的衬底定位系统的方法，所述方法包括：将具有光刻设备的图案暴露在具有参考层的衬底的表面上的暴露层上，其中该图案对应于衬底的移动 基板定位系统; 在所述衬底上的多个位置上测量所述暴露层和所述参考层之间的覆盖数据; 通过离散余弦变换将覆盖数据从空间域变换到频域; 通过选择覆盖数据的子集来修改频域中的覆盖数据; 通过反相离散余弦变换将经修改的覆盖数据从频域转换回空间域; 通过使用空间域中的修改的覆盖数据来校准衬底定位系统。

公开(公告)号：US11378893B2

公开(公告)日：2022-07-05

申请号：US17098073

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Maria Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC: G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US10254663B2

公开(公告)日：2019-04-09

申请号：US14882241

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Maria Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC: G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

公开(公告)号：US12044980B2

公开(公告)日：2024-07-23

申请号：US17296316

申请日：2019-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Slachter ,  Wim Tjibbo Tel ,  Daan Maurits Slotboom ,  Vadim Yourievich Timoshkov ,  Koen Wilhelmus Cornelis Adrianus Van Der Straten ,  Boris Menchtchikov ,  Simon Philip Spencer Hastings ,  Cyrus Emil Tabery ,  Maxime Philippe Frederic Genin ,  Youping Zhang ,  Yi Zou ,  Chenxi Lin ,  Yana Cheng

IPC: G05B19/418 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G03F7/70616 ,  G05B19/4188 ,  G03F7/70525

Abstract: A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric of the process; and using the performance function to map the probability density function to a performance probability function having the process parameters as arguments.