公开(公告)号：EP3049870B1

公开(公告)日：2019-05-15

申请号：EP14777038.2

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： BANINE, Vadim ,  BARTRAIJ, Petrus ,  VAN GORKOM, Ramon ,  AMENT, Lucas ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  DONKER, Rilpho ,  ENGELEN, Wouter ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  NIENHUYS, Han-Kwang ,  NIKIPELOV, Andrey ,  RENKENS, Michael ,  JANSSEN, Franciscus ,  KRUIZINGA, Borgert

IPC: G03F7/20 ,  G03F1/84 ,  G02B27/00 ,  G02B5/18 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  H01S3/09 ,  H05H7/04 ,  G01N21/956 ,  G02B27/09 ,  G21K1/06

公开(公告)号：EP2678743B1

公开(公告)日：2018-07-04

申请号：EP12702451.1

申请日：2012-01-18

Applicant: ASML Netherlands B.V.

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  FRIJNS, Olav

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70058 ,  G21K1/062 ,  G21K2201/061

Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.

公开(公告)号：EP3011645B1

公开(公告)日：2019-03-13

申请号：EP14732153.3

申请日：2014-06-17

Applicant: ASML Netherlands B.V.

Inventor： NIKIPELOV, Andrey ,  FRIJNS, Olav ,  DE VRIES, Gosse ,  LOOPSTRA, Erik ,  BANINE, Vadim ,  DE JAGER, Pieter ,  DONKER, Rilpho ,  NIENHUYS, Han-Kwang ,  KRUIZINGA, Borgert ,  ENGELEN, Wouter ,  LUITEN, Otger ,  AKKERMANS,Johannes ,  GRIMMINCK, Leonardus ,  LITVINENKO, Vladimir

IPC: G03F7/20 ,  G01J1/26 ,  G01J1/42 ,  H01S3/09 ,  H05H7/04 ,  G01J1/04 ,  G02B26/02 ,  G02B1/06 ,  G02B5/20 ,  G21K1/10 ,  H01S3/00

公开(公告)号：EP2678743A1

公开(公告)日：2014-01-01

申请号：EP12702451.1

申请日：2012-01-18

Applicant: ASML Netherlands B.V.

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  FRIJNS, Olav

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70058 ,  G21K1/062 ,  G21K2201/061

Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.