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公开(公告)号：WO2015044182A2
公开(公告)日：2015-04-02
申请号：PCT/EP2014/070335
申请日：2014-09-24
Applicant: ASML NETHERLANDS B.V.
Inventor： BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
IPC: G03F7/20
CPC classification number: G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B5/1838 , G02B5/1861 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Abstract translation:
在光刻系统内使用的传送系统。 该光束输送系统包括光学元件，该光学元件被布置成接收来自辐射源的辐射束并沿一个或多个方向反射辐射的部分以形成一个或多个分支辐射束以提供给一个或多个工具。
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Patent Agency Ranking
公开(公告)号：WO2014202585A2
公开(公告)日：2014-12-24
申请号：PCT/EP2014/062691
申请日：2014-06-17
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , FRIJNS, Olav , DE VRIES, Gosse , LOOPSTRA, Erik , BANINE, Vadim , DE JAGER, Pieter , DONKER, Rilpho , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter , LUITEN, Otger , AKKERMANS, Johannes , GRIMMINCK, Leonardus , LITVINENKO, Vladimir
IPC: H01S3/09
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
Abstract translation: 一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备，其中所述方法还包括减少EUV辐射的功率波动 通过使用基于反馈的控制回路来监测自由电子激光器并相应地调整自由电子激光器的操作而被传送到光刻基片。
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公开(公告)号：EP3049870B1
公开(公告)日：2019-05-15
申请号：EP14777038.2
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
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公开(公告)号：EP3049870A2
公开(公告)日：2016-08-03
申请号：EP14777038.2
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
IPC: G03F7/20 , G03F1/84 , G02B27/00 , G02B5/18 , G02B27/10 , G02B27/12 , G02B27/14 , G02B27/42 , H01S3/09 , H05H7/04 , G01N21/956 , G02B27/09 , G21K1/06
CPC classification number: G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B5/1838 , G02B5/1861 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
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公开(公告)号：EP3011645A2
公开(公告)日：2016-04-27
申请号：EP14732153.3
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
Inventor： NIKIPELOV, Andrey , FRIJNS, Olav , DE VRIES, Gosse , LOOPSTRA, Erik , BANINE, Vadim , DE JAGER, Pieter , DONKER, Rilpho , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter , LUITEN, Otger , AKKERMANS,Johannes , GRIMMINCK, Leonardus , LITVINENKO, Vladimir
IPC: H01S3/09 , G03F7/20 , H05H7/04 , G01J1/04 , G02B26/02 , G02B1/06 , G02B5/20 , G21K1/10 , H01S3/00
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
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公开(公告)号：EP3011645B1
公开(公告)日：2019-03-13
申请号：EP14732153.3
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
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