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公开(公告)号:WO2015067467A1
公开(公告)日:2015-05-14
申请号:PCT/EP2014/072588
申请日:2014-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor: AKKERMANS, Johannes, , AMENT, Lucas , BANINE, Vadim , COENEN, Teis, Johan , DE JAGER, Pieter , DE VRIES, Gosse , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , LUITEN, Otger , NIKIPELOV, Andrey
IPC: H01S3/09 , H05H9/00 , H01J25/12 , H01J23/027 , H05H7/12
CPC classification number: H01S3/0903 , G03F7/70208 , H01J23/027 , H01J25/10 , H05H9/00
Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.
Abstract translation: 一种自由电子激光器,包括:电子源(21),线性加速器(22),波动器(26),电子束光学器件和减速单元(28')。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场,并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径,使得它们与波动器中的辐射相互作用,刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器,以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔(33)和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔,以激发其中的一个或多个共振驻波模式。
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公开(公告)号:WO2015044182A2
公开(公告)日:2015-04-02
申请号:PCT/EP2014/070335
申请日:2014-09-24
Applicant: ASML NETHERLANDS B.V.
Inventor: BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
IPC: G03F7/20
CPC classification number: G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B5/1838 , G02B5/1861 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Abstract translation:
在光刻系统内使用的传送系统。 该光束输送系统包括光学元件,该光学元件被布置成接收来自辐射源的辐射束并沿一个或多个方向反射辐射的部分以形成一个或多个分支辐射束以提供给一个或多个工具。 p>
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公开(公告)号:WO2015082295A1
公开(公告)日:2015-06-11
申请号:PCT/EP2014/075784
申请日:2014-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor: NIKIPELOV, Andrey, Alexandrovich , BANINE, Vadim, Yevgenyevich , DE JAGER, Pieter, Willem, Herman , DE VRIES, Gosse, Charles , FRIJNS, Olav, Waldemar, Vladimir , GRIMMINCK, Leonardus, Adrianus, Gerardus , KATALENIC, Andelko , AKKERMANS, Johannes, Antonius, Gerardus , LOOPSTRA, Erik, Roelof , ENGELEN, Wouter, Joep , BARTRAIJ, Petrus Rutgerus , COENEN, Teis, Johan , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
Abstract translation: 一种用于提供电子束的喷射装置。 喷射器装置包括用于提供电子束的第一喷射器和用于提供电子束的第二喷射器。 喷射器装置可以在第一模式中操作,其中电子束包括仅由第一注射器提供的电子束和第二模式,其中电子束包括仅由第二注射器提供的电子束。
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公开(公告)号:EP3049870A2
公开(公告)日:2016-08-03
申请号:EP14777038.2
申请日:2014-09-24
Applicant: ASML Netherlands B.V.
Inventor: BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
IPC: G03F7/20 , G03F1/84 , G02B27/00 , G02B5/18 , G02B27/10 , G02B27/12 , G02B27/14 , G02B27/42 , H01S3/09 , H05H7/04 , G01N21/956 , G02B27/09 , G21K1/06
CPC classification number: G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B5/1838 , G02B5/1861 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
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公开(公告)号:EP3049870B1
公开(公告)日:2019-05-15
申请号:EP14777038.2
申请日:2014-09-24
Applicant: ASML Netherlands B.V.
Inventor: BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
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