-
公开(公告)号：US10712675B2
公开(公告)日：2020-07-14
申请号：US15707703
申请日：2017-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay , Franciscus Johannes Joseph Janssen , Anthonie Kuijper
IPC: G03F7/20
Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
-
公开(公告)号：US10416574B2
公开(公告)日：2019-09-17
申请号：US15568122
申请日：2016-04-04
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Sander Catharina Reinier Derks , Franciscus Johannes Joseph Janssen , Jim Vincent Overkamp , Jacobus Cornelis Gerardus Van Der Sanden
IPC: G03B27/52 , G03F7/20 , H01L21/67 , H01L21/683
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
-
公开(公告)号：US10268128B2
公开(公告)日：2019-04-23
申请号：US15742168
申请日：2016-06-14
Applicant: ASML Netherlands B.V.
Inventor： Franciscus Johannes Joseph Janssen , Johannes Paul Marie De La Rosette , Edwin Cornelis Kadijk , Nicolas Alban Lallemant , Jan Liefooghe , Markus Rolf Werner Matthes , Marcel Johannus Elisabeth Hubertus Muitjens , Hubert Matthieu Richard Steijns , André Gillis Van De Velde , Marinus Aart Van Den Brink
IPC: G03F7/20 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/23 , H05G2/00 , F28C1/08 , H01S3/038 , H01S3/223
Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.
-
公开(公告)号：US20180004100A1
公开(公告)日：2018-01-04
申请号：US15707703
申请日：2017-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay , Franciscus Johannes Joseph Janssen , Anthonie Kuijper
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/2041 , G03F7/70341
Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
-
公开(公告)号：US09823590B2
公开(公告)日：2017-11-21
申请号：US15451358
申请日：2017-03-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Manish Ranjan , Carlo Cornelis Maria Luijten , Franciscus Johannes Joseph Janssen , Maksym Chernyshov
CPC classification number: G03F7/70875 , G03F7/70633 , G03F7/70716 , G03F7/70933
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.
-
Patent Agency Ranking
公开(公告)号：US09645506B2
公开(公告)日：2017-05-09
申请号：US14106403
申请日：2013-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
-
公开(公告)号：US10580545B2
公开(公告)日：2020-03-03
申请号：US14917623
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
-
公开(公告)号：US10088755B2
公开(公告)日：2018-10-02
申请号：US15627054
申请日：2017-06-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Siebe Landheer , Marcel Beckers , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Franciscus Johannes Joseph Janssen
Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.
-
公开(公告)号：US09164391B2
公开(公告)日：2015-10-20
申请号：US14504130
申请日：2014-10-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay , Franciscus Johannes Joseph Janssen , Anthonie Kuijper
CPC classification number: G03F7/70858 , G03F7/2041 , G03F7/70341
Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，其具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。
-
公开(公告)号：US20150015856A1
公开(公告)日：2015-01-15
申请号：US14356358
申请日：2012-10-12
Applicant: ASML Netherlands B.V.
Inventor： Manish Ranjan , Carlo Cornelis Maria Luijten , Franciscus Johannes Joseph Janssen , Maksym Chernyshov
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70633 , G03F7/70716 , G03F7/70933
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.
Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备包括设置在投影系统和基板台之间的空间中的温度控制装置。 温度控制装置被配置为在气体通过开口之后控制空间中的气体的温度。
-
-
-
-
-
-
-
-
-
Search Results
20
records
(took 0.034 seconds)
