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公开(公告)号：US10451973B2
公开(公告)日：2019-10-22
申请号：US14871795
申请日：2015-09-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
IPC: G02B27/52 , G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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公开(公告)号：US20170023870A1
公开(公告)日：2017-01-26
申请号：US15287524
申请日：2016-10-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70866
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。
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公开(公告)号：US10649341B2
公开(公告)日：2020-05-12
申请号：US15287524
申请日：2016-10-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus Van Den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
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公开(公告)号：US10209624B2
公开(公告)日：2019-02-19
申请号：US15838634
申请日：2017-12-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Rogier Hendrikus Magdalena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
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公开(公告)号：US09846372B2
公开(公告)日：2017-12-19
申请号：US15016041
申请日：2016-02-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Rogier Hendrikus Magdalena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
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Patent Agency Ranking
公开(公告)号：US09645506B2
公开(公告)日：2017-05-09
申请号：US14106403
申请日：2013-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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公开(公告)号：US20190285990A1
公开(公告)日：2019-09-19
申请号：US16277120
申请日：2019-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Rogier Hendrikus Magdelena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
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公开(公告)号：US09477153B2
公开(公告)日：2016-10-25
申请号：US14484076
申请日：2014-09-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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公开(公告)号：US20140098353A1
公开(公告)日：2014-04-10
申请号：US14106403
申请日：2013-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel RIEPEN , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
Abstract translation: 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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公开(公告)号：US10268127B2
公开(公告)日：2019-04-23
申请号：US15589705
申请日：2017-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
IPC: G03F7/20
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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