公开(公告)号：US10324384B2

公开(公告)日：2019-06-18

申请号：US15320300

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerben Pieterse ,  Theodorus Wilhelmus Polet ,  Johannes Jacobus Matheus Baselmans ,  Willem Jan Bouman ,  Theodorus Marinus Modderman ,  Cornelius Maria Rops ,  Bart Smeets ,  Koen Steffens ,  Ronald Van Der Ham

IPC: G03F7/20

Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

公开(公告)号：US09645506B2

公开(公告)日：2017-05-09

申请号：US14106403

申请日：2013-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniël Jozef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Franciscus Johannes Joseph Janssen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US10859919B2

公开(公告)日：2020-12-08

申请号：US16778635

申请日：2020-01-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US20140098353A1

公开(公告)日：2014-04-10

申请号：US14106403

申请日：2013-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel RIEPEN ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniël Jozef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Abstract translation: 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。