公开(公告)号：US11454892B2

公开(公告)日：2022-09-27

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11372336B2

公开(公告)日：2022-06-28

申请号：US16464361

申请日：2017-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US11086239B2

公开(公告)日：2021-08-10

申请号：US16981813

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Miao Yu ,  Petrus Martinus Gerardus Johannes Arts ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Maarten Holtrust ,  Han Henricus Aldegonda Lempens ,  Ferdy Migchelbrink ,  Theodorus Wilhelmus Polet ,  Gheorghe Tanasa

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

公开(公告)号：US11029607B2

公开(公告)日：2021-06-08

申请号：US16330544

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US10324384B2

公开(公告)日：2019-06-18

申请号：US15320300

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerben Pieterse ,  Theodorus Wilhelmus Polet ,  Johannes Jacobus Matheus Baselmans ,  Willem Jan Bouman ,  Theodorus Marinus Modderman ,  Cornelius Maria Rops ,  Bart Smeets ,  Koen Steffens ,  Ronald Van Der Ham

IPC: G03F7/20

Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

公开(公告)号：US11143969B2

公开(公告)日：2021-10-12

申请号：US16604324

申请日：2018-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanni Luca Gattobigio ,  Nirupam Banerjee ,  Johan Franciscus Maria Beckers ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Frank Kox ,  Theodorus Wilhelmus Polet ,  Cornelius Maria Rops ,  Mike Paulus Johannes Van Gils ,  Wouterus Jozephus Johannes Van Sluisveld ,  Rik Vangheluwe

IPC: G03F7/20

Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

公开(公告)号：US10571810B2

公开(公告)日：2020-02-25

申请号：US16407878

申请日：2019-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius Van Sommeren ,  Coen Hubertus Matheus Baltis ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Johannes Cornelius Paulus Melman ,  Günes Nakiboglu ,  Theodorus Wilhelmus Polet ,  Walter Theodorus Matheus Stals ,  Yuri Johannes Gabriël Van De Vijver ,  Josephus Peter Van Lieshout ,  Jorge Alberto Vieyra Salas ,  Aleksandar Nikolov Zdravkov

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US10481502B2

公开(公告)日：2019-11-19

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Wilhelmus Franciscus Johannes Simons ,  Martijn Houben ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Rogier Hendrikus Magdalena Cortie ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Siegfried Alexander Tromp ,  Theodorus Wilhelmus Polet ,  Jim Vincent Overkamp ,  Van Vuong Vy

IPC: G03F7/20 ,  H01L21/68

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20150131064A1

公开(公告)日：2015-05-14

申请号：US14399137

申请日：2013-05-07

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Wilhelmus Franciscus Johannes Simons ,  Martijn Houben ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Rogier Hendrikus Magdalena Cortie ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Siegfried Alexander Tromp ,  Theodorus Wilhelmus Polet ,  Jim Vincent Overkamp ,  Van Vuong Vy

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Abstract translation: 一种用于支撑物体的物体表，具有支撑体的物体表，用于保持物体的物体保持器，邻近物体保持器的边缘的开口以及经由通道与开口流体连通的通道，其中通道 由与限定通道的第二材料不同的第一材料限定。

公开(公告)号：US12242200B2

公开(公告)日：2025-03-04

申请号：US18463667

申请日：2023-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/00

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.