公开(公告)号：WO2021180473A1

公开(公告)日：2021-09-16

申请号：PCT/EP2021/054623

申请日：2021-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  WANG, Yan ,  TANG, Ljiang ,  WANG, Yixiang

IPC: H01J37/20 ,  G01B11/06 ,  H01J37/21 ,  H01J37/22 ,  H01J37/26 ,  H01J37/28 ,  H01J37/29

Abstract: An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.

公开(公告)号：WO2020074238A1

公开(公告)日：2020-04-16

申请号：PCT/EP2019/075313

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  WANG, Yixiang ,  KANG, Zhiwen

IPC: G03F7/20

Abstract: An illumination unit comprising a first electromagnetic wave source including circuitry for outputting a first electromagnetic wave in a first direction to illuminate a first region of a sample; a second electromagnetic wave source including circuitry for outputting a second electromagnetic wave in a second direction substantially opposite to the first direction; and a reflector configured to reflect the second electromagnetic wave substantially in the first direction to illuminate a second region of the sample.

公开(公告)号：WO2020052943A1

公开(公告)日：2020-03-19

申请号：PCT/EP2019/072678

申请日：2019-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  HUANG, Danjing ,  CHAN, Bin-Da

IPC: H01J37/22 ,  H01J37/02 ,  G01J1/42

Abstract: A system and a method for monitoring a beam (322) in an inspection system are provided. The system includes an image sensor (360) configured to collect a sequence of images of a beam spot of a beam formed on a surface (340), each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller (380) configured to combine the sequence of images to obtain a beam profile of the beam.

公开(公告)号：EP4222560A1

公开(公告)日：2023-08-09

申请号：EP21782472.1

申请日：2021-09-20

Applicant: ASML Netherlands B.V.

Inventor： WANG, Yan ,  ZHANG, Jian ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: G03F9/00 ,  H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/29 ,  H01J37/304 ,  H01J37/317 ,  G01B11/06

公开(公告)号：EP4264653A1

公开(公告)日：2023-10-25

申请号：EP21836474.3

申请日：2021-12-13

Applicant: ASML Netherlands B.V.

Inventor： YE, Ning ,  JIANG, Jun ,  ZHANG, Jian ,  WANG, Yixiang

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28