公开(公告)号：WO2022128846A1

公开(公告)日：2022-06-23

申请号：PCT/EP2021/085372

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： YE, Ning ,  JIANG, Jun ,  ZHANG, Jian ,  WANG, Yixiang

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：WO2021037944A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073908

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： JIANG, Jun ,  JEN, Chih-Yu ,  YE, Ning ,  ZHANG, Jian

IPC: H01J37/28 ,  G01R31/307

Abstract: A charged particle beam system may include a primary source (100), a secondary source (200), and a controller. The primary source may be configured to emit a charged particle beam (241) along an optical axis onto a region of a sample (201). The secondary source may be configured to irradiate (242) the region of the sample. The controller may be configured to control the charged particle beam system to change a parameter of an output of the secondary source. A method of imaging may include emitting a charged particle beam (241) onto a region of a sample (201), irradiating (242) the region of the sample with a secondary source (200), and changing a parameter of an output of the secondary source.

公开(公告)号：WO2021023752A1

公开(公告)日：2021-02-11

申请号：PCT/EP2020/071942

申请日：2020-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: H01J37/02 ,  H01J37/28

Abstract: A system and a method for manipulating a beam of an Advanced Charge Controller module (560) in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens (510, 512).

公开(公告)号：WO2023030814A1

公开(公告)日：2023-03-09

申请号：PCT/EP2022/071819

申请日：2022-08-03

Applicant: ASML NETHERLANDS B.V.

Inventor： MENG, Xiaodong ,  KANG, Zhiwen ,  ZHANG, Jian ,  QIU, Kangsheng

IPC: G03F7/20

Abstract: Systems, apparatuses, and methods for detecting a location of a positioned sample may include an electrostatic holder configured to hold a sample and form a gap area between an outside edge of the sample and a structure of the electrostatic holder when the electrostatic holder holds the sample, wherein the gap area is coated with a first coating configured to reflect a first wavelength of light with first brightness and to reflect a second wavelength of the light with second brightness, the first wavelength is within a predetermined range of wavelengths, the second wavelength is outside the predetermined range of wavelengths, and the first brightness is higher than the second brightness; a light source configured to direct the light at the gap area; and an optical detector configured to image the light reflected off the gap area.

公开(公告)号：WO2019063528A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/075926

申请日：2018-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: G02B21/02 ,  H01J37/22

Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.

公开(公告)号：WO2019063433A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/075621

申请日：2018-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/30

Abstract: An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.

公开(公告)号：WO2022023304A1

公开(公告)日：2022-02-03

申请号：PCT/EP2021/070930

申请日：2021-07-27

Applicant: ASML NETHERLANDS B.V.

Inventor： GAURY, Benoit, Herve ,  LA FONTAINE, Bruno ,  JIANG, Jun ,  HASAN, Shakeeb Bin ,  KANAI, Kenichi ,  VAN RENS, Jasper, Frans, Mathijs ,  TABERY, Cyrus, Emil ,  MA, Long ,  PATTERSON, Oliver, Desmond ,  ZHANG, Jian ,  JEN, Chih-Yu ,  WANG, Yixiang

IPC: H01J37/22 ,  H01J37/244

Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged- particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.

公开(公告)号：WO2021078819A1

公开(公告)日：2021-04-29

申请号：PCT/EP2020/079672

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  WANG, Yixiang ,  FANG, Jie

IPC: H01J37/22 ,  H01J37/28 ,  G01N23/2251

Abstract: An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavelength different from the first wavelength are also arranged to impinge on the portion of the substrate.

公开(公告)号：WO2021037695A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073443

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： YANG, Jinmei ,  ZHANG, Jian ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: G01C9/00 ,  G01N23/2251 ,  G03F9/00 ,  H01L21/66 ,  H01L21/68 ,  G01B11/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：WO2022069274A1

公开(公告)日：2022-04-07

申请号：PCT/EP2021/075767

申请日：2021-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yan ,  ZHANG, Jian ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: G03F9/00 ,  H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/29 ,  H01J37/304 ,  H01J37/317 ,  G01B11/06

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.