公开(公告)号：WO2021078819A1

公开(公告)日：2021-04-29

申请号：PCT/EP2020/079672

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  WANG, Yixiang ,  FANG, Jie

IPC: H01J37/22 ,  H01J37/28 ,  G01N23/2251

Abstract: An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavelength different from the first wavelength are also arranged to impinge on the portion of the substrate.

公开(公告)号：WO2020052943A1

公开(公告)日：2020-03-19

申请号：PCT/EP2019/072678

申请日：2019-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  HUANG, Danjing ,  CHAN, Bin-Da

IPC: H01J37/22 ,  H01J37/02 ,  G01J1/42

Abstract: A system and a method for monitoring a beam (322) in an inspection system are provided. The system includes an image sensor (360) configured to collect a sequence of images of a beam spot of a beam formed on a surface (340), each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller (380) configured to combine the sequence of images to obtain a beam profile of the beam.

公开(公告)号：WO2022128846A1

公开(公告)日：2022-06-23

申请号：PCT/EP2021/085372

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： YE, Ning ,  JIANG, Jun ,  ZHANG, Jian ,  WANG, Yixiang

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：WO2021037944A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073908

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： JIANG, Jun ,  JEN, Chih-Yu ,  YE, Ning ,  ZHANG, Jian

IPC: H01J37/28 ,  G01R31/307

Abstract: A charged particle beam system may include a primary source (100), a secondary source (200), and a controller. The primary source may be configured to emit a charged particle beam (241) along an optical axis onto a region of a sample (201). The secondary source may be configured to irradiate (242) the region of the sample. The controller may be configured to control the charged particle beam system to change a parameter of an output of the secondary source. A method of imaging may include emitting a charged particle beam (241) onto a region of a sample (201), irradiating (242) the region of the sample with a secondary source (200), and changing a parameter of an output of the secondary source.

公开(公告)号：WO2021023752A1

公开(公告)日：2021-02-11

申请号：PCT/EP2020/071942

申请日：2020-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: H01J37/02 ,  H01J37/28

Abstract: A system and a method for manipulating a beam of an Advanced Charge Controller module (560) in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens (510, 512).

公开(公告)号：EP4264653A1

公开(公告)日：2023-10-25

申请号：EP21836474.3

申请日：2021-12-13

Applicant: ASML Netherlands B.V.

Inventor： YE, Ning ,  JIANG, Jun ,  ZHANG, Jian ,  WANG, Yixiang

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28