公开(公告)号：NL2008041A

公开(公告)日：2012-07-31

申请号：NL2008041

申请日：2011-12-23

Applicant: ASML NETHERLANDS BV

Inventor： FINDERS JOZEF ,  KASTRUP BERNARDO ,  PUTTER SANDER

IPC: G03F7/20

公开(公告)号：NL2007477A

公开(公告)日：2012-04-24

申请号：NL2007477

申请日：2011-09-27

Applicant: ASML NETHERLANDS BV

Inventor： FINDERS JOZEF

IPC: G03F7/20

公开(公告)号：NL2004545A

公开(公告)日：2010-12-13

申请号：NL2004545

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： NIKOLSKY PETER ,  FINDERS JOZEF ,  GROENENDIJK REMCO

IPC: G03F7/20

Abstract: A lithographic method includes exposing a first layer of material to a radiation beam to form a first pattern feature in the first layer, the first pattern feature having sidewalls, and a focal property of the radiation beam being controlled to control a sidewall angle of the sidewalls; providing a second layer of material over the first pattern feature to provide a coating on sidewalls of the first pattern; removing a portion of the second layer, leaving a coating of the second layer of material on sidewalls of the first pattern; removing the first pattern formed from the first layer, leaving on the substrate at least a part of the second layer that formed a coating on sidewalls of that first pattern, the part of the second layer left forming second pattern features in locations adjacent to the locations of sidewalls of the removed first pattern feature.

公开(公告)号：NL2003111A1

公开(公告)日：2010-01-26

申请号：NL2003111

申请日：2009-07-01

Applicant: ASML NETHERLANDS BV

Inventor： PUTTER SANDER DE ,  FINDERS JOZEF ,  VLEEMING BERTUS

IPC: G03F7/20

公开(公告)号：NL2002999A1

公开(公告)日：2009-12-29

申请号：NL2002999

申请日：2009-06-11

Applicant: ASML NETHERLANDS BV

Inventor： FINDERS JOZEF

IPC: G03F7/20