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    MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    12.
    发明专利
    MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2011477A

    公开(公告)日：2014-04-14

    申请号：NL2011477

    申请日：2013-09-20

    Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

    Inventor： MATHIJSSEN SIMON GIJSBERT JOSEPHUS ,  BOEF ARIE JEFFREY ,  DRAZKIEWICZ STANLEY ,  KREUZER JUSTIN ,  NIJMEIJER GERRIT JOHANNES

    IPC: G03F7/20 ,  G03F9/00

    Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.

    INSPECTION APPARATUS AND METHODS, SUBSTRATES HAVING METROLOGY TARGETS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD.
    14.
    发明专利
    INSPECTION APPARATUS AND METHODS, SUBSTRATES HAVING METROLOGY TARGETS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2013625A

    公开(公告)日：2015-05-04

    申请号：NL2013625

    申请日：2014-10-13

    Applicant: ASML NETHERLANDS BV

    Inventor： MATHIJSSEN SIMON GIJSBERT JOSEPHUS ,  HUNSCHE STEFAN ,  KRAAIJ MARKUS GERARDUS MARTINUS MARIA

    IPC: G01N21/47 ,  G03F7/20 ,  H01L23/544

    Abstract: Disclosed is an inspection apparatus for use in lithography. It comprises a support for a substrate carrying a plurality of metrology targets; an optical system for illuminating the targets under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the targets under the illumination conditions; a processor arranged to calculate from said detected portions of diffracted radiation a measurement of asymmetry for a specific target; and a controller for causing the optical system and processor to measure asymmetry in at least two of said targets which have different known components of positional offset between structures and smaller sub-structures within a layer on the substrate and calculate from the results of said asymmetry measurements a measurement of a performance parameter of the lithographic process for structures of said smaller size. Also disclosed are substrates provided with a plurality of novel metrology targets formed by a lithographic process.

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