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公开(公告)号：NL2011181A
公开(公告)日：2014-02-18
申请号：NL2011181
申请日：2013-07-17
Applicant: ASML NETHERLANDS BV
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公开(公告)号：NL2013457A
公开(公告)日：2015-04-13
申请号：NL2013457
申请日：2014-09-11
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： TINNEMANS PATRICIUS ALOYSIUS JACOBUS , BOEF ARIE JEFFREY , KREUZER JUSTIN LOYD , MATHIJSSEN SIMON GIJSBERT JOSEPHUS
Abstract: Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.
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公开(公告)号：NL2011726A
公开(公告)日：2014-05-08
申请号：NL2011726
申请日：2013-11-04
Applicant: ASML NETHERLANDS BV
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公开(公告)号：NL2011477A
公开(公告)日：2014-04-14
申请号：NL2011477
申请日：2013-09-20
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , BOEF ARIE JEFFREY , DRAZKIEWICZ STANLEY , KREUZER JUSTIN , NIJMEIJER GERRIT JOHANNES
Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
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Patent Agency Ranking
公开(公告)号：NL2011173A
公开(公告)日：2014-02-03
申请号：NL2011173
申请日：2013-07-16
Applicant: ASML NETHERLANDS BV
Inventor： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , BOEF ARIE JEFFREY
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公开(公告)号：NL2013810A
公开(公告)日：2015-06-22
申请号：NL2013810
申请日：2014-11-14
Applicant: ASML NETHERLANDS BV
Inventor： BOEF ARIE JEFFREY
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公开(公告)号：NL2013838A
公开(公告)日：2015-06-18
申请号：NL2013838
申请日：2014-11-20
Applicant: ASML NETHERLANDS BV
Inventor： DOMMELEN YOURI JOHANNES LAURENTIUS MARIA , ENGBLOM PETER DAVID , KESSELS LAMBERTUS GERARDUS MARIA , BOEF ARIE JEFFREY , BHATTACHARYYA KAUSTUVE , HINNEN PAUL CHRISTIAAN , PIETERS MARCO JOHANNES ANNEMARIE
Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
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公开(公告)号：NL2013737A
公开(公告)日：2015-05-27
申请号：NL2013737
申请日：2014-11-04
Applicant: ASML NETHERLANDS BV
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公开(公告)号：NL2011476A
公开(公告)日：2014-04-07
申请号：NL2011476
申请日：2013-09-20
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
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