公开(公告)号：NL2003414A

公开(公告)日：2010-04-08

申请号：NL2003414

申请日：2009-09-01

Applicant: ASML NETHERLANDS BV

Inventor： CORBEIJ WILHELMUS ,  BOEF ARIE ,  MOS EVERHARDUS

IPC: G01N21/47 ,  G03F7/40

Abstract: A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.

公开(公告)号：NL2003497A

公开(公告)日：2010-03-24

申请号：NL2003497

申请日：2009-09-15

Applicant: ASML NETHERLANDS BV

Inventor： MOS EVERHARDUS ,  SCHAAR MAURITS ,  MIDDLEBROOKS SCOTT

IPC: G01N21/47 ,  G03F7/20