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公开(公告)号：WO2010006935A2
公开(公告)日：2010-01-21
申请号：PCT/EP2009058404
申请日：2009-07-03
Applicant: ASML NETHERLANDS BV , MOS EVERHARDUS , MEGENS HENRICUS , VAN DER SCHAAR MAURITS , SIMONS HUBERTUS , MIDDLEBROOKS SCOTT
Inventor： MOS EVERHARDUS , MEGENS HENRICUS , VAN DER SCHAAR MAURITS , SIMONS HUBERTUS , MIDDLEBROOKS SCOTT
IPC: G03F9/00
CPC classification number: G03F9/7003 , G03F7/705 , G03F7/70633
Abstract: A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.
Abstract translation: 一种光刻系统包括光刻设备，该光刻设备包括将图案化的辐射束投影到衬底的目标部分上的投影系统和在衬底上的多个位置处测量图案的特征在衬底上的位置的对准系统。 控制器将测量的位置与值的网格上的点进行比较，并基于网格上的对应中间点的值推断衬底上的中间位置的值，以便提供衬底上的中间位置的指示以及它们相对的位移 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。
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公开(公告)号：NL2004887A
公开(公告)日：2010-12-27
申请号：NL2004887
申请日：2010-06-14
Applicant: ASML NETHERLANDS BV
Inventor： MOS EVERHARDUS , SIMONS HUBERTUS , MIDDLEBROOKS SCOTT
Abstract: A method for selecting sample positions on a substrate from a set of all available sample positions is provided, in which a representation of a model, which may represent the variation of one or more properties across the substrate, is analyzed in order to identify the sample positions having the greatest effect on the model.
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3.发明专利
公开(公告)号：NL2013417A
公开(公告)日：2015-04-07
申请号：NL2013417
申请日：2014-09-05
Applicant: ASML NETHERLANDS BV
Inventor： YPMA ALEXANDER , MENGER JASPER , DECKERS DAVID , HAN DAVID , KOOPMAN ADRIANUS , LYULINA IRINA , MIDDLEBROOKS SCOTT , HAREN RICHARD , WILDENBERG JOCHEM
IPC: G03F7/20
Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
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公开(公告)号：NL2003118A1
公开(公告)日：2010-01-18
申请号：NL2003118
申请日：2009-07-03
Applicant: ASML NETHERLANDS BV
Inventor： MOS EVERHARDUS , MEGENS HENRICUS , SCHAAR MAURITS VAN DER , SIMONS HUBERTUS , MIDDLEBROOKS SCOTT
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公开(公告)号：NL2009723A
公开(公告)日：2013-06-03
申请号：NL2009723
申请日：2012-10-30
Applicant: ASML NETHERLANDS BV
Inventor： MIDDLEBROOKS SCOTT , PLUIJMS RENE , COOGANS MARTYN , NOOT MARC
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Patent Agency Ranking6.发明专利
公开(公告)号：NL2006024A
公开(公告)日：2011-08-18
申请号：NL2006024
申请日：2011-01-18
Applicant: ASML NETHERLANDS BV
Inventor： MIDDLEBROOKS SCOTT
IPC: G03F7/20
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公开(公告)号：NL2005459A
公开(公告)日：2011-06-09
申请号：NL2005459
申请日：2010-10-06
Applicant: ASML NETHERLANDS BV
Inventor： FUCHS ANDREAS , SCHAAR MAURITS , MIDDLEBROOKS SCOTT , BINTEVINOS PATRICK
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公开(公告)号：NL2006923A
公开(公告)日：2012-12-11
申请号：NL2006923
申请日：2011-06-09
Applicant: ASML NETHERLANDS BV
Inventor： PADIY ALEXANDER VIKTOROVYCH , MENCHTCHIKOV BORIS , MIDDLEBROOKS SCOTT
IPC: G03F7/20
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公开(公告)号：NL2003919A
公开(公告)日：2010-06-28
申请号：NL2003919
申请日：2009-12-08
Applicant: ASML NETHERLANDS BV
Inventor： MOS EVERHARDUS , FINDERS JOZEF , MIDDLEBROOKS SCOTT , WANGLI DONGZI , MOL CHRISTIANUS , DUSA MIRCEA
IPC: H01L21/027
Abstract: Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
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公开(公告)号：NL2003497A
公开(公告)日：2010-03-24
申请号：NL2003497
申请日：2009-09-15
Applicant: ASML NETHERLANDS BV
Inventor： MOS EVERHARDUS , SCHAAR MAURITS , MIDDLEBROOKS SCOTT
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