公开(公告)号：JP2007129238A

公开(公告)日：2007-05-24

申请号：JP2006300285

申请日：2006-11-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER F ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  DIJKSMAN JOHAN F ,  KRUIJT-STEGEMAN YVONNE W ,  SCHRAM IVAR

IPC: H01L21/027 ,  B29C33/38

CPC classification number: B29C59/022 ,  B29C35/0888 ,  B29C2035/0827 ,  B29C2035/0838 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To solve the problem that manufacturing and duplicating of a quarts template is troublesome, though a template used for UV imprint is often constructed using quarts for transparency and hardness to radiation. SOLUTION: Imprint lithography equipment is provided with an imprint template having a polymeric surface provided with a structure of COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了解决夸克模板的制造和复制是麻烦的问题，尽管用于UV印迹的模板通常使用夸张的透明度和硬度来构造。 解决方案：压印光刻设备设置有具有提供<200nm结构的聚合物表面的印模模板和用于硬化感光材料的辐射源。 辐射源包括激光器或发光二极管。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：SG133553A1

公开(公告)日：2007-07-30

申请号：SG2006088793

申请日：2006-12-20

Applicant: ASML NETHERLANDS BV

Inventor： DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  KNAAPEN RAYMOND JACOBUS ,  KRASTEV KRASSIMIR TODOROV ,  WUISTER SANDER FREDERIK ,  SCHRAM IVAR ,  VAN WINGERDEN JOHANNES

Abstract: A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.

公开(公告)号：NL1036034A1

公开(公告)日：2009-04-15

申请号：NL1036034

申请日：2008-10-08

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  KNAAPEN RAYMOND JACOBUS WILHELMUS ,  DIJKSMAN JOHAN FREDERIK ,  WUISTER SANDER FREDERIK ,  SCHRAM IVAR ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: G03F7/00 ,  H01L21/30

公开(公告)号：NL1035788A1

公开(公告)日：2009-03-09

申请号：NL1035788

申请日：2008-08-05

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR ,  LAMMERS JEROEN HERMAN ,  SCHROEDERS RICHARD JOSEPH MARINUS

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：NL1036193A1

公开(公告)日：2009-06-09

申请号：NL1036193

申请日：2008-11-13

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  WUISTER SANDER FREDERIK ,  SCHRAM IVAR ,  LAMMERS JEROEN HERMAN

IPC: G03F7/00 ,  H01L21/30