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公开(公告)号:SI0821660T1
公开(公告)日:2005-04-30
申请号:SI9630702
申请日:1996-04-04
Applicant: BASF AG
Inventor: RECK BERND , FRANZMANN GERNOT , BECHERT BERTOLD , BACHER REINHARD , REHMER GERD
IPC: C04B41/48 , C04B41/63 , C08F20/38 , C08F20/58 , C08F220/06 , C08F220/38 , C08F220/54 , C08F246/00 , C08F265/04 , C08F265/10 , C08L33/14 , C08L33/26 , C08L51/00 , C09D133/06 , C09D133/14 , C09D133/26 , C09D151/00
Abstract: In a process for preserving a mineral molding by coating the surface of the mineral molding with an aqueous composition comprising an aqueous polymer dispersion, the dispersed polymer P comprises an ethylenically unsaturated acid of the 2-acrylamido-2-methylpropanesulfonic acid type polymerized into it in free-radically polymerized form.
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公开(公告)号:AU716940B2
公开(公告)日:2000-03-09
申请号:AU3941697
申请日:1997-07-29
Applicant: BASF AG
Inventor: SCHULER BERNHARD , AUCHTER GERHARD , TURK JOHANNES , NOORDIJK RIK , DOBBELAAR JOHANNES , BACHER REINHARD , HUMMER WOLFGANG
IPC: C08F220/12 , C09J7/04 , C09J133/06
Abstract: A polymer which containsfrom 50 to 99.98% by weight of a C1-C12 alkyl (meth)acrylate a),from 0.02 to 10% by weight of a vinylaromatic compound b),from 0 to 10% by weight of an ethylenically unsaturated acid or of an ethylenically unsaturated acid anhydride c), andfrom 0 to 40% by weight of further monomers d), the percentages by weight being based on the polymer and the polymer being obtainable by polymerizing the monomers a) to d) in at least two stages which differ in their content of vinylaromatic compounds in such a way that the content of vinylaromatic compounds in the vinylaromatics-rich stage is at least 5 times as great as in the low-vinylaromatics stage.
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公开(公告)号:AU716834B2
公开(公告)日:2000-03-09
申请号:AU3849997
申请日:1997-07-29
Applicant: BASF AG
Inventor: SCHULER BERNHARD , AUCHTER GERHARD , TURK JOHANNES , NOORDIJK RIK , DOBBELAAR JOHANNES , BACHER REINHARD , HUMMER WOLFGANG
IPC: C08L33/06 , C08F212/00 , C08F220/00 , C08F220/12 , C08F220/18 , C09J7/02 , C09J7/04 , C09J133/06 , G09F3/10
Abstract: A polymer which is composed offrom 50 to 99.98% by weight of a C1-C12 alkyl (meth)acrylate a),from 0.02 to 1.8% by weight of a vinyl-aromatic compound b),from 0 to 10% by weight of an ethylenically unsaturated acid or an ethylenically unsaturated acid anhydride c), andfrom 0 to 40% by weight of other monomers d), the percentages by weight being based on the polymer.
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14.
公开(公告)号:AU9626398A
公开(公告)日:1999-04-05
申请号:AU9626398
申请日:1998-09-17
Applicant: BASF AG
Inventor: RUPANER ROBERT , LAWRENZ SVEN , DOBBELAAR JOHANNES , BAUER GERHARD , MUESELER FRANZ-JOSEF , KIRCHNER WERNER , MORRISON BRADLEY RONALD , NAHSTOLL JURGEN , MEISTER MARTIN , BACHER REINHARD , HUBINGER WOLFGANG , SCHUMACHER GERHARD
IPC: C08F6/00
Abstract: A process is described for reducing the residual monomer content in a liquid solution, mixture, melt, suspension or dispersion of a polymer by postpolymerization with addition of a redox initiator system at a reaction temperature appropriate to it and with an extremely short mixing time of the liquid system in the production reactor by metering-gradually, in portions or continuously-at least one of the redox initiator components required to initiate polymerization of the residual monomers over a period (metering time) which is from about 10 to 250 times the mixing time of the liquid system in said reactor.
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公开(公告)号:AU5399396A
公开(公告)日:1996-11-07
申请号:AU5399396
申请日:1996-04-04
Applicant: BASF AG
Inventor: RECK BERND , FRANZMANN GERNOT , BECHERT BERTOLD , BACHER REINHARD , REHMER GERD
IPC: C04B41/48 , C04B41/63 , C08F20/38 , C08F20/58 , C08F220/06 , C08F220/38 , C08F220/54 , C08F246/00 , C08F265/04 , C08F265/10 , C08L33/14 , C08L33/26 , C08L51/00 , C09D133/06 , C09D133/14 , C09D133/26 , C09D151/00
Abstract: In a process for preserving a mineral molding by coating the surface of the mineral molding with an aqueous composition comprising an aqueous polymer dispersion, the dispersed polymer P comprises an ethylenically unsaturated acid of the 2-acrylamido-2-methylpropanesulfonic acid type polymerized into it in free-radically polymerized form.
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