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    METHOD OF BLOOMING TENDENCY OF MINERAL BASE BODY
    13.
    发明专利
    METHOD OF BLOOMING TENDENCY OF MINERAL BASE BODY 失效

    公开(公告)号：JPH02135183A

    公开(公告)日：1990-05-24

    申请号：JP20803089

    申请日：1989-08-14

    Applicant: BASF AG

    Inventor： GERUTO REEMAA ,  MANFUREETO SHIYUBUARUTSU ,  BERUNHARUTO DOTSUTSUAUERU

    IPC: B05D3/06 ,  B05D7/00 ,  B05D7/24 ,  C04B41/48 ,  C04B41/63 ,  C08L33/04 ,  C08L33/14

    Abstract: PURPOSE: To prevent efflorescence phenomenon of a mineral substrate such as a concrete roof material for a long period of time by applying a specified polyacrylate dispersion liquid and n aromatic ketone on the surface of a mineral substrate and irradiating with UV rays. CONSTITUTION: As for the polyacrylate dispersion liquid, the copolymer described below is used by 20 to 65 wt.%. The copolymer consists of (a) 20 to 70 wt.% of a (meth)acrylate of 3-20C alkanol having a tertiary CH group, (b) 30 to 60 wt.% of styrene, α-methylstyrene or the like, and (c) 3-5C mono or dicarboxyic acid, and has -30 to +30 deg.C min. film forming temp. Further, an aromatic ketone is mixed by 0.1 to 5 wt.%. The mixture is applied to form a layer on the surface of a mineral substrate and irradiated with UV rays. Thus, efflorescence phenomenon can be prevented.

    SYNTHETIC RESIN
    16.
    发明专利
    SYNTHETIC RESIN 失效

    公开(公告)号：JPH04227909A

    公开(公告)日：1992-08-18

    申请号：JP11143091

    申请日：1991-05-16

    Applicant: BASF AG

    Inventor： GERUTO REEMAA ,  GERUHARUTO AUFUTAA ,  HERUMUUTO IEEGAA

    IPC: C08F20/12 ,  C08F2/50 ,  C08F8/00 ,  C08F8/14 ,  C08F8/30 ,  C08F8/32 ,  C08F20/34 ,  C08F20/36 ,  C08F20/52 ,  C08F20/58 ,  C08F220/10 ,  C08F220/12 ,  C09J4/00 ,  C09J4/02

    Abstract: Synthetic resins are obtainable by chemically bonding one or more compounds of the general formula I (* CHEMICAL STRUCTURE *) (I) where R1 is -OH, -NH2, (* CHEMICAL STRUCTURE *) -NHR3 or (* CHEMICAL STRUCTURE *) R2 is -H, -CH3 or -C2H5, R3 is -CmH2m+1, where m is from 1 to 6, R4 is -H or -CH3 and n is from 1 to 12, via the oxygen or nitrogen atom of R1 to one or more polymers A which consist of a) from 50 to 100% by weight of one or more esters of acrylic or methacrylic acid with monohydric alcohols of 1 to 18 carbon atoms or a mixture of these esters (monomers a) and b) from 0 to 50% by weight of other copolymerizable monomers (monomers b) in polymerized form, in amounts such that the synthetic resin contains from 0.01 to 1 mole of double bonds per kg of polymer A. After exposure to ultraviolet light or to electrons, these synthetic resins are suitable as contact adhesives.

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