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    MAKING OF RADIATION SENSITIVE MIXTURE AND RELIEF PATTERN
    1.
    发明专利
    MAKING OF RADIATION SENSITIVE MIXTURE AND RELIEF PATTERN 失效

    公开(公告)号：JPH0218564A

    公开(公告)日：1990-01-22

    申请号：JP10927689

    申请日：1989-05-01

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA ,  ANDOREASU BETSUCHIYAA

    IPC: G03F7/004 ,  G03F7/039

    Abstract: PURPOSE: To develope a radiation sensitive mixture with an alkali aq. solution and to increase transparency in a short wave ultraviolet range by blending a specific polymer binder with a specific organic compound. CONSTITUTION: The mixture contains the polymer binder (A) soluble in the alkali aq. solution and the organic compound (B) having a group to be increased in the solubility to the water based alkali developer by an acid and to be split by the acid and a group forming a strong acid by radiation. And as the component A, a polymerization (condensation) product containing 5-35mol% monomer (a) having an acid unstable group (e.g. t-butyl carbonate group) or the polymerization product in which the quantity of the acid unstable group is introduced is used. In such a case, as the component (A), a copolymer of a novolak, p- hydroxystyrene or the like and the component (a) is preferably used and as the component (B), a compound expressed by a formula is preferably used. Where in the formula, each of R -R expresses an aliphatic, an aromatic group or the like and X↑O-expresses hexafluoroarsenate or the like.

    PHOTOPOLYMERIZABLE RECORDING MATERIAL FOR PLATE BODY AND RELIEF PLATE IN PARTICULAR
    2.
    发明专利
    PHOTOPOLYMERIZABLE RECORDING MATERIAL FOR PLATE BODY AND RELIEF PLATE IN PARTICULAR 失效

    公开(公告)号：JPH01102455A

    公开(公告)日：1989-04-20

    申请号：JP23914387

    申请日：1987-09-25

    Applicant: BASF AG

    Inventor： ANDOREASU BETSUCHIYAA ,  BERUNTO BURONSHIYUTENTO ,  GEERUHARUTO HOFUMAN

    IPC: C08F2/48 ,  C08F2/50 ,  G03F7/027 ,  G03F7/029 ,  G03F7/032

    Abstract: PURPOSE: To reduce the total exposure time of the entitled plate by using a specified bisacylphosphinoxide as a photopolymerization initiator. CONSTITUTION: This recording medium is made of a composition comprising a low molecular-weight compound having at least one photopolymerizable olefinic unsaturated double bond, such as >=2 or polyfunctional (meth) acrylate, an organic polymer binder (A) and a photopolymerization initiator (B). As the initiator (B), the bisacylsulfinoxide is used and represented by the formula in which R is a 1-4C alkoxy group or a 6-12C aryl group; and each of R and R is, preferably, a prescribed acyl group. The initiator (B) can be embodied by bis(2,6-dichlorobenzoyl)phenylphosphinoxide and the like, and the binder (A) can be embodied by the polymer of the acrylate having a carbonyl group on a side chain, such as a copolymer of ethylene/n-butylacrylate/acrylic acid.

    PHOTOSENSITIVE RECORDING ELEMENT FOR MANUFACTURING RELIEF PRINTING PLATE WITH TACKFREE PRINTING SURFACE AND USE OF THE SAME
    6.
    发明专利
    PHOTOSENSITIVE RECORDING ELEMENT FOR MANUFACTURING RELIEF PRINTING PLATE WITH TACKFREE PRINTING SURFACE AND USE OF THE SAME 失效

    公开(公告)号：JPH02273751A

    公开(公告)日：1990-11-08

    申请号：JP5824890

    申请日：1990-03-12

    Applicant: BASF AG

    Inventor： TOOMASU TERUZAA ,  ANDOREASU BETSUCHIYAA ,  FURIIDORITSUHI ZAITSU

    IPC: G03F7/027 ,  G03F7/031 ,  G03F7/20

    Abstract: PURPOSE: To make it possible to produce a printing plate having a tack-free printing surface by incorporating benzophenone and/or a specific substd. benzophenone as another photosensitive compd. together with a photopolymerizable olefin unsatd. monomer into a photopolymerized relief forming recording layer. CONSTITUTION: This recording element includes a dimensionally stable carrier and the photopolymerizable relief forming recording layer. This photopolymerizable recording layer contains a polymer binder, the photopolymerizable olefin unsatd. monomer, a photopolymn. initiator and another photosensitive compd. Benzophenone and/or a benzophenone having one or plural substituents is used as another photosensitive compd. As a result, the production of the relief printing plate having the tack-free printing surface is made possible.

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