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    11.
    发明专利
    未知

    公开(公告)号：ID16006A

    公开(公告)日：1997-08-28

    申请号：ID963350

    申请日：1996-11-15

    Applicant: BASF AG

    Inventor： HIBST HARTMUT ,  TENTEN ANDREAS ,  MAROSI LASZLO

    IPC: C01G1/00 ,  B01J23/00 ,  B01J23/20 ,  B01J23/28 ,  B01J23/30 ,  B01J23/88 ,  B01J23/887 ,  B01J23/888 ,  B01J35/00 ,  C01G31/00 ,  C01G39/00 ,  C01G41/00 ,  C07B61/00 ,  C07C45/33 ,  C07C45/34 ,  C07C45/35 ,  C07C45/38 ,  C07C51/235 ,  C07C51/25 ,  C07C57/05 ,  C07C57/055 ,  B01J27/00

    Abstract: A multimetal oxide of formula (I) Mo12-a-b-cVaM bM cOx is new, where: M = tungsten (W) and/or niobium (Nb); M = titanium (Ti), zirconium (Zr), hafnium (Hf), tantalum (Ta), chromium (Cr), silicon (Si) and/or germanium (Ge); a = 0.1-6; b = 0-6; c = 0-6; a+b+c = 0.1-6; and x = number determined by the valency and frequency of the element in (I) except oxygen. Its atomic space arrangement is determined by powder X-ray diffraction (the intensity A of the diffracted X-ray beam as a function of two-fold diffraction angle (2&thetas; )) using Cu-K alpha -radiation ( lambda = 1.54178 Angstrom ), so that in the 2&thetas; region of 5-50 degrees the following diffraction lines are produced: Al(X-ray diffraction line) = 8.3 plus or minus 0.7 (2&thetas; degrees ); A2=14.4 plus or minus 0.7; A3=22.3 plus or minus 0.2; A4=23.5 plus or minus 0.7; A5=27.2 plus or minus 0.4; A6=32.0 plus or minus 0.8; A7=34.8 plus or minus 0.6; A8=38.7 plus or minus 0.5; A9=45.4 plus or minus 0.4; and A10=48.8 plus or minus 0.4. Also claimed are: (i) a process for catalytic gas phase oxidation of organic compounds using the above multimetal oxide; and (ii) a finely divided mixture containing the above multimetal oxide (I) and a multimetal oxide (II) of formula: M 12CudHeOy, where: M = molybdenum (Mo), W, vanadium (V), Nb and/or Ta; d = 4-30; e = 0-20; and y = a number determined by the valency and frequency of the elements in (II) except oxygen.

    PREPARATION OF SILICON NITRIDE POWDER
    12.
    发明专利
    PREPARATION OF SILICON NITRIDE POWDER 未知

    公开(公告)号：GB2204863A

    公开(公告)日：1988-11-23

    申请号：GB8811945

    申请日：1988-05-20

    Applicant: BASF AG

    Inventor： MAROSI LASZLO

    IPC: C01B21/068

    Abstract: Silicon nitride powder is prepared in a gas-phase reaction by reacting silicon tetrachloride with ammonia at above 500 DEG C. in a fluidized bed of silicon nitride particles. An amorphous silicon nitride having a BET specific surface area of greater than 50 m2/g is used at the beginning of the reaction. The resulting silicon nitride is then separated from the ammonium chloride simultaneously formed.

    Multimetal oxides
    13.
    发明专利
    Multimetal oxides 未知

    公开(公告)号：SG69990A1

    公开(公告)日：2000-01-25

    申请号：SG1996011112

    申请日：1996-11-14

    Applicant: BASF AG

    Inventor： TENTEN ANDREAS ,  MAROSI LASZLO ,  HIBST HARTMUT

    IPC: C01G1/00 ,  B01J23/00 ,  B01J23/20 ,  B01J23/28 ,  B01J23/30 ,  B01J23/88 ,  B01J23/887 ,  B01J23/888 ,  B01J35/00 ,  C01G31/00 ,  C01G39/00 ,  C01G41/00 ,  C07B61/00 ,  C07C45/33 ,  C07C45/34 ,  C07C45/35 ,  C07C45/38 ,  C07C51/235 ,  C07C51/25 ,  C07C57/05 ,  C07C57/055

    Abstract: A multimetal oxide of formula (I) Mo12-a-b-cVaM bM cOx is new, where: M = tungsten (W) and/or niobium (Nb); M = titanium (Ti), zirconium (Zr), hafnium (Hf), tantalum (Ta), chromium (Cr), silicon (Si) and/or germanium (Ge); a = 0.1-6; b = 0-6; c = 0-6; a+b+c = 0.1-6; and x = number determined by the valency and frequency of the element in (I) except oxygen. Its atomic space arrangement is determined by powder X-ray diffraction (the intensity A of the diffracted X-ray beam as a function of two-fold diffraction angle (2&thetas; )) using Cu-K alpha -radiation ( lambda = 1.54178 Angstrom ), so that in the 2&thetas; region of 5-50 degrees the following diffraction lines are produced: Al(X-ray diffraction line) = 8.3 plus or minus 0.7 (2&thetas; degrees ); A2=14.4 plus or minus 0.7; A3=22.3 plus or minus 0.2; A4=23.5 plus or minus 0.7; A5=27.2 plus or minus 0.4; A6=32.0 plus or minus 0.8; A7=34.8 plus or minus 0.6; A8=38.7 plus or minus 0.5; A9=45.4 plus or minus 0.4; and A10=48.8 plus or minus 0.4. Also claimed are: (i) a process for catalytic gas phase oxidation of organic compounds using the above multimetal oxide; and (ii) a finely divided mixture containing the above multimetal oxide (I) and a multimetal oxide (II) of formula: M 12CudHeOy, where: M = molybdenum (Mo), W, vanadium (V), Nb and/or Ta; d = 4-30; e = 0-20; and y = a number determined by the valency and frequency of the elements in (II) except oxygen.

    19.
    发明专利
    未知

    公开(公告)号：ES2178755T3

    公开(公告)日：2003-01-01

    申请号：ES97906172

    申请日：1997-03-05

    Applicant: BASF AG

    Inventor： MULLER ULRICH ,  SCHULZ MICHAEL ,  MAROSI LASZLO ,  HARDER WOLFGANG

    IPC: C07D301/08 ,  B01J27/18 ,  B01J27/185 ,  B01J27/24 ,  B01J37/02 ,  C01B15/029 ,  C07D301/12

    Abstract: PCT No. PCT/EP97/01113 Sec. 371 Date Sep. 4, 1998 Sec. 102(e) Date Sep. 4, 1998 PCT Filed Mar. 5, 1997 PCT Pub. No. WO97/32866 PCT Pub. Date Sep. 12, 1997A noble metal-free catalyst composition is obtainable by a) preparing an aqueous mixture comprising i) a salt of at least one base metal selected from among the elements having atomic numbers 21-32, 39-42, 48-51, 57-75 and 81-83; ii) phosphate ions; and iii) at least one nitrogen source; and b) evaporating the aqueous mixture obtained and drying the catalyst composition thus formed. The catalyst composition prepared can be used for producing hydrogen peroxide and for the epoxidation of olefins.

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