公开(公告)号：HU9600334A2

公开(公告)日：1996-12-30

申请号：HU9600334

申请日：1996-02-14

Applicant: BASF AG

Inventor： GYOPAR RAU MARIA ,  SCHLARB BERNHARD ,  SCHULZ GUENTHER ,  SCHUPP EBERHARD ,  WIESE HARM

IPC: C08F2/22 ,  C08F2/30 ,  C08F220/06 ,  C08F220/12 ,  C08F222/02 ,  C09D109/00 ,  C09D123/00 ,  C09D125/02 ,  C09D127/00 ,  C09D131/02 ,  C09D133/06 ,  C09D133/18 ,  C09D157/00 ,  C09J157/00 ,  D06M15/00

Abstract: Aq. polymer dispersions, obtd. by radical polymerisation of monomers in aq. emulsion in presence of a polymeric protective colloid (A) with an average mol. wt. (Mw) of >20,000. Colloid (A) is a copolymer of 5-50 wt. % unsatd. monomer(s) with acid or acid anhydride gp(s). (monomers I), 0.1-80 wt.% (meth)acrylate ester(s) of at least 10C aliphatic alcohols (monomers II), 0-94.9 wt.% "principal monomers", comprising 1-9C alkyl (meth)acrylates, vinyl esters of 1-20C carboxylic acids, up to 20C vinylaromatics, unsatd. nitriles, vinyl halides and/or 2-8C aliphatic hydrocarbons with 1 or 2 double bonds (monomers III) and 0-60 wt.% other monomers (IV). Also claimed is the above process for the prodn. of aq. polymer dispersions.

公开(公告)号：CA2169129A1

公开(公告)日：1996-08-16

申请号：CA2169129

申请日：1996-02-08

Applicant: SCHLARB BERNHARD ,  SCHUPP EBERHARD ,  RAU MARIA GYOPAR ,  SCHULZ GUENTHER ,  WIESE HARM ,  BASF AG

Inventor： SCHLARB BERNHARD ,  SCHUPP EBERHARD ,  RAU MARIA GYOPAR ,  SCHULZ GUENTHER ,  WIESE HARM

IPC: C08F2/22 ,  C08F2/30 ,  C08F220/06 ,  C08F220/12 ,  C08F222/02 ,  C09D109/00 ,  C09D123/00 ,  C09D125/02 ,  C09D127/00 ,  C09D131/02 ,  C09D133/06 ,  C09D133/18 ,  C09D157/00 ,  C09J157/00 ,  D06M15/00 ,  C09J9/00 ,  C09D5/02

Abstract: An aqueous polymer emulsion obtainable by free radical polymerization of monomers in aqueous emulsion in the presence of a polymeric protective colloid contains, as components, - from 5 to 50% by weight of at least one ethylenically unsaturated monomer having at least one acid or acid anhydride group (monomers I), - from 0.1 to 80% by weight of at least one (meth)acrylate of an aliphatic alcohol of at least 10 carbon atoms (monomers II), - from 0 to 94.9% by weight of main monomers selected from the group consisting of C1-C8-alkyl (meth)acrylates, vinyl esters of carboxylic acids of up to 20 carbon atoms, vinyl aromatics of up to 20 carbon atoms, ethylenically unsaturated nitrites, vinyl halides and aliphatic hydrocarbons having 2 to 8 carbon atoms and 1 or 2 double bonds (monomers III) and - from 0 to 60% by weight of further monomers (monomers IV), the stated weights being based on the polymeric protective colloid.

公开(公告)号：DK160907C

公开(公告)日：1991-10-14

申请号：DK555086

申请日：1986-11-20

Applicant: BASF AG

Inventor： HOFFMANN GERHARD ,  KOCH HORST ,  SCHULZ GUENTHER

IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033

Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

公开(公告)号：ZA885329B

公开(公告)日：1990-03-28

申请号：ZA885329

申请日：1988-07-22

Applicant: BASF AG

Inventor： SCHULZ GUENTHER ,  GUENTHER SCHULZ ,  SAUTER HUBERT ,  HUBERT SAUTER ,  AMMERMANN EBERHARD ,  EBERHARD AMMERMANN ,  POMMER ERNST-HEINRICH ,  ERNST-HEINRICH POMMER

IPC: C07D233/60 ,  A01N43/50 ,  A01N43/653 ,  C07D233/61 ,  C07D233/64 ,  C07D249/08 ,  C07D521/00 ,  C07D ,  A01N

Abstract: Hydroxyethylazol derivatives of the formula (I) in which Z represents CH or N, W represents CH2-CH2 or CH=CH, R represents hydrogen, fluorine, chlorine, bromine, phenyl or phenoxy, benzyl or benzyloxy, alkyl, haloalkyl, thiomethyl, methoxy, cyano, nitro or alkoxycarbonyl, n represents the integers 1, 2 or 3, and their acid addition salts and metal salt complexes, and fungicides containing them.

公开(公告)号：FI892821A

公开(公告)日：1989-12-09

申请号：FI892821

申请日：1989-06-08

Applicant: BASF AG

Inventor： BOTT KASPAR ,  NICK BERNHARD ,  SCHULZ GUENTHER

IPC: C07D231/12 ,  C07D261/08 ,  C08F20/60 ,  C07D

Abstract: The invention relates to novel 4-[(meth)acrylamidomethyl]pyrazoles and isoxazoles of the general formula (I) in which R denotes a hydrogen atom or a methyl group; R denotes a hydrogen atom, a methyl group or an ethyl group; R and R denotes an alkyl group having 1 to 6 C atoms or an unsubstituted or substituted aryl group having 6 to 20 C atoms, where R and R can be identical to or different from one another; X denotes an oxygen atom or an NR group in which R stands for a hydrogen atom or a radical having the meaning of R or R . The invention in addition relates to a process for the preparation of the 4-[(meth)acrylamidomethyl]pyrazoles and -isoxazoles of the general formula (I) and the use of these compounds, in particular for polymerisation and preparation of homo- and copolymers.

公开(公告)号：FI892010A0

公开(公告)日：1989-04-27

申请号：FI892010

申请日：1989-04-27

Applicant: BASF AG

Inventor： NICK BERNHARD ,  SCHULZ GUENTHER

IPC: G03F7/00 ,  G03F7/021 ,  B41C

公开(公告)号：ZA8805329B

公开(公告)日：1990-03-28

申请号：ZA8805329

申请日：1988-07-22

Applicant: BASF AG

Inventor： SCHULZ GUENTHER ,  GUENTHER SCHULZ ,  SAUTER HUBERT ,  HUBERT SAUTER ,  AMMERMANN EBERHARD ,  EBERHARD AMMERMANN ,  POMMER ERNST-HEINRICH ,  ERNST-HEINRICH POMMER

IPC: C07D233/60 ,  A01N43/50 ,  A01N43/653 ,  C07D233/61 ,  C07D233/64 ,  C07D249/08 ,  C07D521/00 ,  C07D ,  A01N

CPC classification number: C07D231/12 ,  A01N43/50 ,  A01N43/653 ,  C07D233/56 ,  C07D249/08

公开(公告)号：FI892760A

公开(公告)日：1989-12-09

申请号：FI892760

申请日：1989-06-06

Applicant: BASF AG

Inventor： NICK BERNHARD ,  BOTT KASPAR ,  SCHULZ GUENTHER

IPC: C07C233/31 ,  C07D231/12 ,  C08F20/58 ,  G03F7/027 ,  C07C

公开(公告)号：FI873805A

公开(公告)日：1988-03-07

申请号：FI873805

申请日：1987-09-02

Applicant: BASF AG

Inventor： KURTZ KARL-RUDOLF ,  KOCH HORST ,  SCHULZ GUENTHER

IPC: C08F291/02 ,  C08F291/00 ,  C08K5/00 ,  C08K5/01 ,  C08L21/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F

公开(公告)号：DK461387A

公开(公告)日：1988-03-07

申请号：DK461387

申请日：1987-09-04

Applicant: BASF AG

Inventor： KURTZ KARL-RUDOLF ,  KOCH HORST ,  SCHULZ GUENTHER

IPC: C08F291/02 ,  C08F291/00 ,  C08K5/00 ,  C08K5/01 ,  C08L21/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03C1/68