公开(公告)号：AU6117590A

公开(公告)日：1991-02-28

申请号：AU6117590

申请日：1990-08-21

Applicant: BASF AG

Inventor： SEITZ FRIEDRICH ,  BECK ERICH ,  ROSER JOACHIM ,  BUESCHGES ELEONORE ,  SCHULZ GUENTHER ,  ZWEZ THOMAS

IPC: C08G18/28 ,  C08G18/32 ,  C08K5/09 ,  C08L33/02 ,  C08L35/00 ,  C08L75/02 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039

Abstract: The invention relates to a photosensitive mixture consisting of (a) a reaction product containing urea groups, (b) at least one organic compound containing one or more carboxyl groups, (c) at least one ethylenically monounsaturated or polyunsaturated organic compound, (d) optionally, a photoinitiator or photoinitiator system, and (e) optionally, further auxiliaries and additives, a reaction product consisting of i) at least one di- or polyisocyanate, ii) at least one organic compound containing at least one primary or secondary amino group, and iii) at least one or more compounds containing a hydroxyl group being used as component (a).

公开(公告)号：FI892822A

公开(公告)日：1989-12-09

申请号：FI892822

申请日：1989-06-08

Applicant: BASF AG

Inventor： BOTT KASPAR ,  NICK BERNHARD ,  SCHULZ GUENTHER

IPC: G03F7/021 ,  G03F

公开(公告)号：AU587085B2

公开(公告)日：1989-08-03

申请号：AU6553586

申请日：1986-11-20

Applicant: BASF AG

Inventor： HOFFMANN GERHARD ,  KOCH HORTS ,  SCHULZ GUENTHER

IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033 ,  G03C1/68 ,  G03C1/71 ,  G03F7/02

Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

公开(公告)号：SI9600048A

公开(公告)日：1996-08-31

申请号：SI9600048

申请日：1996-02-15

Applicant: BASF AG

Inventor： SCHLARB BERNHARD ,  SCHUPP EBERHARD ,  RAU GYOPAR MARIA ,  SCHULZ GUENTHER ,  WIESE HARM

IPC: C08F2/22 ,  C08F2/30 ,  C08F220/06 ,  C08F220/12 ,  C08F222/02 ,  C09D109/00 ,  C09D123/00 ,  C09D125/02 ,  C09D127/00 ,  C09D131/02 ,  C09D133/06 ,  C09D133/18 ,  C09D157/00 ,  C09J157/00 ,  D06M15/00 ,  C09D127/02 ,  C09D123/02 ,  D06M15/263 ,  D06M15/327

Abstract: Aq. polymer dispersions, obtd. by radical polymerisation of monomers in aq. emulsion in presence of a polymeric protective colloid (A) with an average mol. wt. (Mw) of >20,000. Colloid (A) is a copolymer of 5-50 wt. % unsatd. monomer(s) with acid or acid anhydride gp(s). (monomers I), 0.1-80 wt.% (meth)acrylate ester(s) of at least 10C aliphatic alcohols (monomers II), 0-94.9 wt.% "principal monomers", comprising 1-9C alkyl (meth)acrylates, vinyl esters of 1-20C carboxylic acids, up to 20C vinylaromatics, unsatd. nitriles, vinyl halides and/or 2-8C aliphatic hydrocarbons with 1 or 2 double bonds (monomers III) and 0-60 wt.% other monomers (IV). Also claimed is the above process for the prodn. of aq. polymer dispersions.

公开(公告)号：HU9600334D0

公开(公告)日：1996-04-29

申请号：HU9600334

申请日：1996-02-14

Applicant: BASF AG

Inventor： GYOPAR RAU MARIA ,  SCHLARB BERNHARD ,  SCHULZ GUENTHER ,  SCHUPP EBERHARD ,  WIESE HARM

IPC: C08F2/22 ,  C08F2/30 ,  C08F220/06 ,  C08F220/12 ,  C08F222/02 ,  C09D109/00 ,  C09D123/00 ,  C09D125/02 ,  C09D127/00 ,  C09D131/02 ,  C09D133/06 ,  C09D133/18 ,  C09D157/00 ,  C09J157/00 ,  D06M15/00

Abstract: Aq. polymer dispersions, obtd. by radical polymerisation of monomers in aq. emulsion in presence of a polymeric protective colloid (A) with an average mol. wt. (Mw) of >20,000. Colloid (A) is a copolymer of 5-50 wt. % unsatd. monomer(s) with acid or acid anhydride gp(s). (monomers I), 0.1-80 wt.% (meth)acrylate ester(s) of at least 10C aliphatic alcohols (monomers II), 0-94.9 wt.% "principal monomers", comprising 1-9C alkyl (meth)acrylates, vinyl esters of 1-20C carboxylic acids, up to 20C vinylaromatics, unsatd. nitriles, vinyl halides and/or 2-8C aliphatic hydrocarbons with 1 or 2 double bonds (monomers III) and 0-60 wt.% other monomers (IV). Also claimed is the above process for the prodn. of aq. polymer dispersions.

公开(公告)号：AU6117890A

公开(公告)日：1991-02-28

申请号：AU6117890

申请日：1990-08-21

Applicant: BASF AG

Inventor： SEITZ FRIEDRICH ,  BECK ERICH ,  ROSER JOACHIM ,  SCHULZ GUENTHER ,  BUESCHGES ELEONORE ,  ZWEZ THOMAS

IPC: G03F7/027 ,  C08F20/36 ,  C08F299/06 ,  C08G18/32 ,  C08G18/34 ,  C08G18/67 ,  C08G18/83 ,  C07C275/26 ,  C07C273/18 ,  G03F7/039 ,  G03F7/029 ,  G03F7/031

Abstract: The invention relates to a reaction product containing urea and urethane groups and carboxyl groups and obtained by reacting …… i) a mono- or polyethylenically unsaturated mono- or polyalcohol with … ii) a diisocyanate or polyisocyanate, … iii) at least one amino compound and … iv) at least one acid anhydride of an at least dibasic carboxylic acid, where the total number of NCO and anhydride groups in ii) and iv) is less than or equal to the number of groups reactive therewith in i) and iii). …… This reaction product is suitable for the production of radiation-sensitive materials, in particular materials whose solubility in water or aqueous-alkaline solutions is increased by irradiation.

公开(公告)号：AU6117790A

公开(公告)日：1991-02-28

申请号：AU6117790

申请日：1990-08-21

Applicant: BASF AG

Inventor： SEITZ FRIEDRICH ,  BECK ERICH ,  ROSER JOACHIM ,  SCHULZ GUENTHER ,  BUESCHGES ELEONORE ,  ZWEZ THOMAS

IPC: G03F7/039 ,  C08F2/46 ,  C08F2/54 ,  C08G18/28 ,  C08G18/32 ,  C08G18/34 ,  C08G18/83 ,  C08L75/00 ,  C07C275/26 ,  C07C273/18 ,  G03F7/029 ,  G03F7/031 ,  G03F7/027

Abstract: The invention relates to novel reaction products containing urea and carboxyl groups and obtained by reacting i) a diisocyanate or polyisocyanate with ii) at least one amino compound and iii) at least one acid anhydride of an at least dibasic carboxylic acid, and optionally iv) a hydroxyl- or amino-containing compound which is different from component ii), where the total number of NCO and anhydride groups in i) and iii) is less than or equal to the number of groups reactive therewith in ii) and iv). This reaction product is suitable for the preparation of radiation-sensitive compositions, in particular compositions whose solubility in water or aqueous-alkaline solution is increased by irradiation.

公开(公告)号：CA1269013A

公开(公告)日：1990-05-15

申请号：CA519813

申请日：1986-10-03

Applicant: BASF AG

Inventor： KUD ALEXANDER ,  SCHULZ GUENTHER ,  TRIESELT WOLFGANG ,  HARTMANN HEINRICH

IPC: D06L1/12 ,  C11D3/00 ,  C11D3/37 ,  D06M13/02 ,  D06M13/224 ,  D06M15/53 ,  D06M101/00 ,  D06M101/16

Abstract: O.Z. 0050/38044 Detergents contain added graft copolymers which have an antiredeposition action and are obtainable by grafting polyalkylene oxides having a number average molecular weight of from 2000 to 100,000 with vinyl acetate in a weight ratio of from 1:0.2 to 1:10, and up to 15% of whose acetate groups may be hydrolyzed.

公开(公告)号：FI892822A0

公开(公告)日：1989-06-08

申请号：FI892822

申请日：1989-06-08

Applicant: BASF AG

Inventor： BOTT KASPAR ,  NICK BERNHARD ,  SCHULZ GUENTHER

IPC: G03F7/021 ,  G03F

公开(公告)号：AU6553586A

公开(公告)日：1987-05-28

申请号：AU6553586

申请日：1986-11-20

Applicant: BASF AG

Inventor： HOFFMANN GERHARD ,  KOCH HORTS ,  SCHULZ GUENTHER

IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033 ,  G03C1/68 ,  G03C1/71 ,  G03F7/02

Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).