Formulation for seed treatment comprising polymeric stickers

    公开(公告)号:NZ548948A

    公开(公告)日:2009-09-25

    申请号:NZ54894805

    申请日:2005-02-12

    Applicant: BASF AG

    Abstract: Disclosed is a seed treatment formulation comprising (a) at least one pesticidal agent; and (b) acrylate copolymers, wherein the acrylate copolymers consist of (a') acrylic acid, methacrylic acid or itaconic acid or a combination of at least two monomers selected from the group consisting of acrylic acid, methacrylic acid or itaconic acid; and (b') monomers selected from the group consisting of alkyl (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, n-butyl meth)acrylate, tbutyl (meth)acrylate, lauryl (meth)acrylate, cyclohexyl (meth)acrylate 2-ethylhexyl (meth)acrylate, stearyl (meth)acrylate, dodecyl(meth)acrylate and (meth)acrylamides such as dimethy/(meth)acrylamide, diethyl(meth)acry/amide, isopropyl (meth)acrylamide, (meth)acryloyl morpholine, dimethylaminomethyl(meth)acrylamide, dimethylaminoethyl(meth)acrylamide, dimethylaminopropyl(meth)acrylamide, diethylaminomethyl(meth)acrylamide, diethylaminoethyl(meth)acrylamide, diethylaminopropyl(meth)acrylamide; and (c') monomers selected from the group consisting of 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, glycidyl (meth)acrylate; and (d') monomers selected from the group consisting of styrene and styrene derivatives such as styrene, a-methyl styrene, o-methyl styrene, m-methyl styrene p-methyl styrene, p-t-butyl styrene, pchloromethyl styrene, p-styrenesulfonic acid and its sodium or potassium salt, o-methoxystyrene, m-methoxystyrene, pmethoxystyrene; and have either a glass transition temperature of -40°C to 5°C; or, if the acrylate copolymers have a core/shell structure a glass transition temperature of the inner core of -60°C to 5°C and of the outer shell of 20°C to 150°C, and wherein the amount of the acrylate copolymer is between 0.5 and 15% (w/w) on a solid content base.

    METHOD OF INDUCING RESISTANCE TO HARMFUL FUNGI

    公开(公告)号:CA2625863A1

    公开(公告)日:2007-05-03

    申请号:CA2625863

    申请日:2006-10-17

    Applicant: BASF AG

    Abstract: The present invention relates to a method of inducing plant tolerance to harmful fungi comprising the application to the plants, the soil, in which the plant grows or is to be grown and/or the seeds of the plant, of an effective amount of an active compound that inhibits the mitochondrial breathing chain at the level of the b/c 1 complex.

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