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    Polyurea silicate resin for wellbore application
    14.
    发明专利
    Polyurea silicate resin for wellbore application 未知

    公开(公告)号：AU2013366539A1

    公开(公告)日：2015-07-09

    申请号：AU2013366539

    申请日：2013-12-20

    Applicant: BASF SE

    Inventor： MCDONNELL SHANE ,  LAFUENTE CERDA OSCAR ,  WALTHER BURKHARD ,  KIERAT RADOSLAW

    IPC: C09K8/508 ,  C08G18/38

    Abstract: Described herein is a novel method of strengthening a wellbore wherein the method uses a polyurea silicate composition. In the method of strengthening an oil well, a gas well or a water well, a mixture comprising at least one isocyanate component having at least two isocyanate groups per molecule; at least one alkali metal silicate; and water is pumped through the oil well, the gas well or the water well into the annulus of the well; subsequently, the mixture is allowed to form a polyurea silicate composition; before the polyurea silicate composition sets to thereby give a polyurea matrix comprising domains of silicate.

    MASAS DE RECUBRIMENTO DE BAJA INTENSIDAD.
    15.
    发明专利
    MASAS DE RECUBRIMENTO DE BAJA INTENSIDAD. 未知

    公开(公告)号：ES2344671T3

    公开(公告)日：2010-09-02

    申请号：ES07822351

    申请日：2007-11-08

    Applicant: BASF SE

    Inventor： LAFUENTE CERDA OSCAR ,  HEISCHKEL YVONNE ,  VETTER MICHAEL ,  SCHWALM REINHOLD ,  GRUBER NICK

    IPC: C09D201/02 ,  C09D4/00

    Abstract: Masas de recubrimiento, que pueden ser endurecidas por medio de irradiación, que contienen (A)al menos un compuesto con, al menos, dos grupos (met)acrilato, que se eligen entre el grupo constituido por el poliéster(met)acrilato, el poliéter(met)acrilato, el policarbonato(met)acrilato, el epóxido(met)acrilato y el uretano(met)acrilato, (B)en caso dado, al menos, un compuesto con, al menos, un grupo etilénicamente insaturado, que sea distinto de (A), (C)el éster de divinilo del ácido adípico, (D)en caso dado, al menos, un disolvente, (E)al menos un fotoiniciador y (F)en caso dado, otros componentes típicos de los esmaltes, caracterizadas porque la proporción del éster de divinilo del ácido adípico (C) con respecto a la suma de los componentes (A) + (B) + (C), que pueden ser endurecidos por medio de irradiación, supone, al menos, un 20% en peso, estando constituido el epóxido(met)acrilato por el producto de reacción del ácido (met)acrílico con diglicidiléter de bisfenol-A, con diglicidiléter de bisfenol-F, con diglicidiléter de 1,4-butanodiol, con diglicidiléter de 1,6-hexanodiol, con triglicidiléter de trimetilolpropano, con tetraglicidiléter de pentaeritrita, con 1,1,2,2-tetraquis[4-(2,3-epoxipropoxi)fenil]etano (CAS-Nr. [27043-37-4]), con diglicidiléter de polipropilenglicol (α,ω-bis(2,3-epoxipropoxi)poli(oxipropileno) (CAS-Nr. [16096-30-3]) o de bisfenol A hidrogenado (2,2-bis[4-(2,3-epoxipropoxi)ciclohexil]propano, CAS-Nr. [13410-58-7]).

    POLYMER NETWORKS COMPRISING ACTIVE INGREDIENTS, PROCESS FOR THEIR PRODUCTION, AND THEIR USE
    20.
    发明专利
    POLYMER NETWORKS COMPRISING ACTIVE INGREDIENTS, PROCESS FOR THEIR PRODUCTION, AND THEIR USE 未知

    公开(公告)号：NZ582948A

    公开(公告)日：2012-04-27

    申请号：NZ58294808

    申请日：2008-07-25

    Applicant: BASF SE

    Inventor： TERRENOIRE ALEXANDRE ,  LEININGER HARTMUT ,  BULLOCK JAMES ,  QURESHI MOHAMMED SHOAIB ,  SCHMIDT HANS-WERNER ,  GIESA REINER ,  RANFT MEIK ,  LAFUENTE CERDA OSCAR

    IPC: A01N25/10 ,  A01N25/18 ,  A61L9/04

    Abstract: Disclosed is a process for producing an actives-comprising polymeric network by mixing polymerizable oligomers and actives and also, optionally, further monomers and/or auxiliaries, followed by thermal or photochemical polymerization of the mixture, wherein the polymerizable mixture comprises the following components: (A) 19.9 to 99.8 percent by weight of at least one oligomer containing mono(meth)acrylate groups and having an average molar mass of 350 to 5000 grams per molecule, selected from the group of epoxy (meth)acrylates, polyester (meth)acrylates, urethane (meth)acrylates or polyether (meth)acrylates, the arithmetic average of the number of (meth)acrylate groups per oligomer molecule being 2.1 to 5; (B) 0 to 49.8 percent by weight of at least one monomer containing olefinic groups and having a molar mass of less than 350 grams per molecule; (C) 0.1 to 8 percent by weight of at least one polymerization initiator which is soluble in the photopolymerizable mixture; (D) 0.1 to 80 percent by weight of at least one active which is dispersible or soluble in the photopolymerizable mixture; and (E) 0 to 20 percent by weight of further auxiliaries and/or additives. Further disclosed is an actives-comprising polymeric network obtainable by said process, and the use of said actives-comprising polymeric network for protecting industrial materials, films, paints and dispersions, crops, and for controlling plant growth.

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