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    RADIATION-SENSITIVE MIXTURE
    11.
    发明专利
    RADIATION-SENSITIVE MIXTURE 失效

    公开(公告)号：JPH03102356A

    公开(公告)日：1991-04-26

    申请号：JP21729290

    申请日：1990-08-20

    Applicant: BASF AG

    Inventor： FURIIDORITSUHI ZAITSU ,  EERITSUHI BETSUKU ,  YOOAHIMU ROOZAA ,  EREONOORE BIYUSHIYUGESU ,  GIYUNTAA SHIYURUTSU ,  TOOMASU TSUBUETSUTSU

    IPC: C08G18/28 ,  C08G18/32 ,  C08K5/09 ,  C08L33/02 ,  C08L35/00 ,  C08L75/02 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039

    Abstract: PURPOSE: To enhance the photosensitivity and the development processability of a photosensitive layer and to render additional posttreatment unnecessary by using the mixture including a specified ureido-containing reaction product. CONSTITUTION: This mixture comprises the ureido-containing reaction product (A), and an ethylenically mono- or poly-unsaturated organic compound and a photopolymerization initiator or its composition to be selectively added, and the like. The compound (A) to be used is prepared by mixing a di- or poly- isocyanate compound and an organic compound having a primary or secondary amino group (a), and a hydroxy-group-having compound to be selectively added in a specified proportion and allowing each to react with each other, and as the compound (a), the compounds of the formula as shown on the right and the like are preferably, used and in the formula, R is an alkylene or arylene group and the like; R' is an H atom or an alkyl group or the like; and X is an O or S atom or the like.

    PHOTOSENSITIVE NEGATIVE TREATMENT OFFSET PRINTING PLATE
    12.
    发明专利
    PHOTOSENSITIVE NEGATIVE TREATMENT OFFSET PRINTING PLATE 失效

    公开(公告)号：JPH0229649A

    公开(公告)日：1990-01-31

    申请号：JP14129989

    申请日：1989-06-05

    Applicant: BASF AG

    Inventor： KASUPARU BOTSUTO ,  BERUNHARUTO NITSUKU ,  GIYUNTAA SHIYURUTSU

    IPC: G03F7/021

    Abstract: PURPOSE: To eliminate dependency on a variation of an aq. developing soln. and a pH change by forming a specified photosensitive negative processable recording layer developable with water or an aq. alkali soln. CONSTITUTION: This plate has a photosensitive recording layer contg. a (meth) acrylic acid-(meth)acrylate copolymer contg. 4-[(meth) acrylamidomethyl]pyrazole and/ or 4-[(meth)acrylamidomethyl]isooxazole represented by formula I as a polymer binder. In the formula, R is H or methyl, R is H, methyl or ethyl, each of R and R is 1-6C alkyl or 6-20C aryl, X is O or NR and R is H. Printing characteristics almost independent of a variation of an aq. developing soln. and a pH change are ensured.

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