公开(公告)号：GB2124397A

公开(公告)日：1984-02-15

申请号：GB8236420

申请日：1982-12-22

Applicant: CANON KK

Inventor： YOMODA MINORU ,  TSUKAMOTO IZUMI

IPC: G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/30 ,  G03B27/68

公开(公告)号：DE3247560C2

公开(公告)日：1996-06-27

申请号：DE3247560

申请日：1982-12-22

Applicant: CANON KK

Inventor： YOMODA MINORU ,  TSUKAMOTO IZUMI

IPC: G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

公开(公告)号：GB2153109B

公开(公告)日：1988-03-16

申请号：GB8430806

申请日：1984-12-06

Applicant: CANON KK

Inventor： YOMODA MINORU ,  YAMAMURA MITSUGU

IPC: G02B7/00 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00

公开(公告)号：GB2151372A

公开(公告)日：1985-07-17

申请号：GB8428372

申请日：1984-11-09

Applicant: CANON KK

Inventor： YAMAMURA MITSUGA ,  YOMODA MINORU

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G05D3/20

Abstract: A shutter device with a servo system for controlling the movement of a rotary shutter blade 30. The shutter device includes a detecting system 37, 38 for detecting the stop position or state of the shutter blade. On the basis of an output from the detecting system and of an output from the servo system, the stop position of the shutter blade is precisely controlled whereby the light interception and the light transmission or exposure by the shutter device are made positive and stable. The device is used in the manufacture of semiconductor integrated circuits.

公开(公告)号：DE3441621A1

公开(公告)日：1985-05-23

申请号：DE3441621

申请日：1984-11-14

Applicant: CANON KK

Inventor： YAMAMURA MITSUGU ,  YOMODA MINORU

IPC: G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G03B27/52 ,  H01L21/68

公开(公告)号：JPS61202432A

公开(公告)日：1986-09-08

申请号：JP4271985

申请日：1985-03-06

Applicant: CANON KK

Inventor： YOMODA MINORU

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To automatically regulate an optical system for the thickness of reticles and the alteration of the material in a short time by providing means for regulating the optical distance with respect to the reticles of an alignment optical system and means for detecting the thickness of the reticles. CONSTITUTION:The thickness of reticles 12 is detected by reflecting the light of light emitting elements 10 and receiving by photoreceptors 11. A calculation controller 30 moves an illumination system 6 and an alignment optical system 26 in response to the detected thickness and the refractive index of the reticles 12 input from a refractive index setter 31. The light from an alignment light source 21 is emitted through a half mirror 22, a lens 23 and a mirror 24 to the alignment mark of the pattern surface 12a of the reticles 12, and further emitted through a projecting lens 14 to the alignment mark on a wafer 15. The controller 30 calculates the error amount from the reflected light received by photoreceptors 25, moves a wafer stage 16 and positions the reticles 12 to the wafer 15.

公开(公告)号：JPS60122951A

公开(公告)日：1985-07-01

申请号：JP23057783

申请日：1983-12-08

Applicant: CANON KK

Inventor： YOMODA MINORU ,  YAMAMURA MITSUGI

IPC: G03B27/34 ,  G02B7/00 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To stabilize an optical performance by detecting a temperature in a projection lens, and controlling a fluid temperature by the difference between its detected temperature and a temperature set to an input means. CONSTITUTION:When projecting a pattern of a mask 3 to a wafer 7 through a projection lens 4, a temperature in the projection lens 4 is detected by a temperature detector 6. A temperature controlling circuit 9 compares a temperature in this projection lens 4, and a desired temperature inputted in advance to a temperature set value input device 10, controls a fluid temperature controller 8 in accordance with its temperature difference, and the fluid temperature controller 8 controls a temperature of a fluid. The fluid whose temperature has been controlled passes through the inside of a duct 5, and the inside of the projection lens 4 is controlled to a temperature inputted in advance to a temperature set value. In this way, the optical performance is held in the best state and stabilized.

公开(公告)号：JPS61202431A

公开(公告)日：1986-09-08

申请号：JP4271885

申请日：1985-03-06

Applicant: CANON KK

Inventor： YOMODA MINORU

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To alter the position of an illumination system with respect to the alteration of the thickness and the material of reticles in a short time by movably providing the system with respect to the incident optical axis direction of a projection optical system and providing means for regulating the position in response to the optical path length. CONSTITUTION:The light of an LED 10 is reflected on reticles 12, and the reflected light is received by photoreceptors 11 to detect the distance from a reticle holder 13 to the upper surface of the reticles 12, i.e., the thickness of the reticles 12. A calculation controller 30 calculates the moving distances of an illumination system 6 and an alignment optical system 26 by the value of the thickness of the reticles 12 as the output of a thickness detector made of the LED 10 and the photoreceptors 11 and the refractive index in response to the quality of the reticle 12 input from a refractive index setter 31. Further, the controller 30 applies a command of the moving distance of the calculated result to an illumination system moving mechanism 7 and an alignment optical system moving mechanism 27 to move them.

公开(公告)号：JPS60149129A

公开(公告)日：1985-08-06

申请号：JP474784

申请日：1984-01-17

Applicant: CANON KK

Inventor： HIRAGA RIYOUZOU ,  YOMODA MINORU

IPC: H01L21/30 ,  G01S7/481 ,  G01S7/491 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To obtain the detection signal having the optimum SN ratio without dividing the detection luminous flux by dividing a light accepting plane of a photoelectric detector into a part for detecting pattern signals of a detected substance and a part for deteting a detected region surface in the photoelectric detector used for relative alignment of masks and wafers. CONSTITUTION:A laser light from a laser light source 1 enters in a rotating polyhedral mirror 3 through a condenser lens 2 and the reflected light from the mirror 3 is projected on a mask 12 prevent on a wafer 13 through an objective 11 comprising a relay lens 4, a beam splitter 5, a field lens 6, a beam splitter 7, a relay lens 8, a beam splitter 9 and an incident aperture 10. In this constitution the reflected light from the splitter 7 is detected by a photodetector 18 through an image forming lens 14 and a filter 15. At this time, the reflector 18 is provided with a pattern detection light accepting plane and a scattered light accepting plane which are arranged separately and the mask alignment is performed effectively by using the pattern detection light accepting plane.

公开(公告)号：JPS60122952A

公开(公告)日：1985-07-01

申请号：JP23057883

申请日：1983-12-08

Applicant: CANON KK

Inventor： YOMODA MINORU ,  KAMIMURA MITSUGI

IPC: G03B27/34 ,  G02B7/00 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To prevent an optical performance from dropping due to movement of a focus generated by a temperature variation, by correcting a focal position basing on a focal position read out of a storage means in accordance with a detected temperature in a projecting optical system. CONSTITUTION:A focus moving extent corresponding to a temperature variation of a projecting optical system 4 measured and determined in advance through an input device 12 is inputted in advance to a storage device 11. When a pattern of a mask 3 is projected onto a wafer 6 and printed, a temperature distribution or an average temperature which has detected a temperature of the projection lens 4 by a temperature detector 5 is inputted to a controlling circuit 10. The controlling circuit 10 reads out a focus moving extent of a device in this detected temperature from the storage device 11, and a voltage corresponding to this focus moving extent is applied to a voltage element 9. The piezoelectric element 9 expands and contracts in accordance with the applied voltage, moves a wafer chuck 7 in the upper and lower directions, and the wafer 3 is maintained at the best image forming position. In this way, lowering of an optical performance by a temperature variation is prevented.