公开(公告)号：FR2882443A1

公开(公告)日：2006-08-25

申请号：FR0550479

申请日：2005-02-21

Applicant: ESSILOR INT

Inventor： CAMELIO SOPHIE ,  GIRARDEAU THIERRY ,  MAITRE NICOLAS ,  NOUVELOT LUC

IPC: G02B1/10

Abstract: La présente invention concerne le substrat comportant deux faces principales dont au moins une comprend un revêtement antireflet, caractérisé en ce que, sur ledit revêtement antireflet, est déposée une couche extérieure en contact avec l'air, d'épaisseur inférieure ou égale à 10 nm, dont l'énergie de surface est inférieure à 60 mJ/m et la surface présente un angle de contact avec l'acide oléique inférieur à 70 degree .

公开(公告)号：ES2135737T3

公开(公告)日：1999-11-01

申请号：ES95920138

申请日：1995-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：BRPI0812708A2

公开(公告)日：2014-12-23

申请号：BRPI0812708

申请日：2008-06-12

Applicant: ESSILOR INT

Inventor： NOUVELOT LUC ,  ROTTE JOHANN ,  SCHERER KARIN ,  VALLET DANIEL

IPC: G02B1/11 ,  C03C17/00 ,  C23C14/32 ,  G02C7/02

Abstract: The invention relates to an optical article provided with antireflection properties, comprising a substrate having at least one main surface coated with an antireflection coating comprising, starting from the substrate: a sub-layer comprising two adjacent layers formed from the same material, the sum of the thicknesses of the two adjacent layers being greater than or equal to 75 nm; and a multilayered antireflection stack comprising at least one high refractive index layer and at least one low refractive index layer, the deposition of the first of said two adjacent layers of the sub-layer having been carried out without ion assistance and the deposition of the second of said two adjacent layers of the sub-layer having been carried out under ion assistance. The invention also relates to a process for manufacturing such an optical article.

公开(公告)号：AT507319T

公开(公告)日：2011-05-15

申请号：AT08701597

申请日：2008-01-18

Applicant: ESSILOR INT

Inventor： RYCHEL DOMINIQUE ,  WILLEMIN GERARD ,  NOUVELOT LUC ,  DE AYGUAVIVES FRANCISCO

IPC: C23C14/50 ,  G02B7/02

公开(公告)号：FR2917510A1

公开(公告)日：2008-12-19

申请号：FR0755749

申请日：2007-06-13

Applicant: ESSILOR INT

Inventor： NOUVELOT LUC ,  ROTTE JOHANN ,  SCHERER KARIN ,  VALLET DANIEL

IPC: G02B1/11

Abstract: L'invention concerne un article d'optique à propriétés antireflet, comprenant un substrat ayant au moins une surface principale revêtue d'un revêtement antireflet comprenant, en partant du substrat :- une sous-couche comprenant deux couches adjacentes formées du même matériau, la somme des épaisseurs de ces deux couches adjacentes étant supérieure ou égale à 75 nm ; et- un empilement antireflet multicouche comprenant au moins une couche de haut indice de réfraction et au moins une couche de bas indice de réfraction,le dépôt de la première desdites deux couches adjacentes de la sous-couche ayant été réalisé sans assistance ionique et le dépôt de la deuxième desdites deux couches adjacentes de la sous-couche ayant été réalisé sous assistance ionique.L'invention concerne également un procédé de fabrication d'un tel article d'optique.

公开(公告)号：FR2719900B1

公开(公告)日：1996-09-20

申请号：FR9405793

申请日：1994-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00 ,  G01L1/00 ,  G01B5/30 ,  G01B7/16 ,  G01B11/16

Abstract: PCT No. PCT/FR95/00619 Sec. 371 Date Jun. 3, 1996 Sec. 102(e) Date Jun. 3, 1996 PCT Filed May 11, 1995 PCT Pub. No. WO95/31706 PCT Pub. Date Nov. 23, 1995In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.

公开(公告)号：FR2719900A1

公开(公告)日：1995-11-17

申请号：FR9405793

申请日：1994-05-11

Applicant: ESSILOR INT

Inventor： FRAKSO FATIMA ,  BOSMANS RICHARD ,  NOUVELOT LUC

IPC: C23C14/54 ,  G01L1/24 ,  G01L5/00 ,  G01L1/00 ,  G01B5/30 ,  G01B7/16 ,  G01B11/16

Abstract: A device for use in a processing chamber (11) containing a collective holder (12) with a plurality of sites (14) for receiving substrates to be processed. The device comprises a test sample (16), a light source (35) transmitting a light beam towards the test sample (16), and a sensor (18) for sensing the beam reflected therefrom. Said test sample (16) is arranged on an individual holder (20) which can be fitted in one of the sites (14) on the collective holder (12) and further jointly supports at least the insertable portion (21) of the sensor (18). The device is particularly suitable for providing anti-reflection coatings on lenses for spectacles.