IMPROVED WAYS TO GENERATE PLASMA IN CONTINUOUS POWER MODE FOR LOW PRESSURE PLASMA PROCESSES
    11.
    发明申请
    IMPROVED WAYS TO GENERATE PLASMA IN CONTINUOUS POWER MODE FOR LOW PRESSURE PLASMA PROCESSES 审中-公开
    用于低压等离子体处理的连续功率模式生成等离子体的改进方法

    公开(公告)号:WO2015052199A1

    公开(公告)日:2015-04-16

    申请号:PCT/EP2014/071466

    申请日:2014-10-07

    Applicant: EUROPLASMA NV

    Abstract: The present invention concerns a method comprising the steps of: introducing a substrate comprising a surface to be coated in a low-pressure reaction chamber; exposing said surface to a plasma during a treatment period within said reaction chamber; ensuring a stable plasma ignition by applying a power input, characterized in that the power input is continuously strictly higher than zero Watt (W) during said treatment period and comprises at least a lower limit power and at least an upper limit power strictly larger than said lower limit power, thereby obtaining a substrate with a coated surface. The present invention further concerns an apparatus for treating a substrate with a low-pressure plasma process and a substrate treated as such.

    Abstract translation: 本发明涉及一种包括以下步骤的方法:将包含待涂覆表面的基底引入低压反应室中; 在所述反应室内的处理期间将所述表面暴露于等离子体; 通过施加电力输入来确保稳定的等离子体点火,其特征在于,在所述处理期间,功率输入连续严格地高于零瓦特(W),并且至少包括下限功率和至少严格大于所述 下限功率,从而获得具有涂覆表面的基板。 本发明还涉及一种用低压等离子体工艺处理衬底的设备和这样处理的衬底。

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