12.
    发明专利
    未知

    公开(公告)号:DE69410548T2

    公开(公告)日:1998-12-17

    申请号:DE69410548

    申请日:1994-07-22

    Applicant: GEN ELECTRIC

    Abstract: Improving adhesion of metal coatings on diamond surfaces comprising depositing an initial uniform thin coating of a refractory metal on a diamond surface where the initial coating of the refractory metal is about 10-10,000 Angstroms; heat treating the initial coating to form a refractory metal-carbon bonding layer with the diamond; and then continuing deposition of the refractory metal. The refractory metal is selected from tungsten, niobium, molybdenum, chromium, titanium, vanadium, tantalum, zirconium, hafnium, aluminium and mixtures of the metals. Heat treatment is pref. conducted at a temp. of about 700-1200 deg.C in a non-oxidising environment and carried out for about 5-60 minutes. Deposition of the refractory metal takes place by low pressure chemical vapour deposition in a non-oxidising environment.

    13.
    发明专利
    未知

    公开(公告)号:ES2116535T3

    公开(公告)日:1998-07-16

    申请号:ES94305445

    申请日:1994-07-22

    Applicant: GEN ELECTRIC

    Abstract: Improving adhesion of metal coatings on diamond surfaces comprising depositing an initial uniform thin coating of a refractory metal on a diamond surface where the initial coating of the refractory metal is about 10-10,000 Angstroms; heat treating the initial coating to form a refractory metal-carbon bonding layer with the diamond; and then continuing deposition of the refractory metal. The refractory metal is selected from tungsten, niobium, molybdenum, chromium, titanium, vanadium, tantalum, zirconium, hafnium, aluminium and mixtures of the metals. Heat treatment is pref. conducted at a temp. of about 700-1200 deg.C in a non-oxidising environment and carried out for about 5-60 minutes. Deposition of the refractory metal takes place by low pressure chemical vapour deposition in a non-oxidising environment.

    17.
    发明专利
    未知

    公开(公告)号:DE69410548D1

    公开(公告)日:1998-07-02

    申请号:DE69410548

    申请日:1994-07-22

    Applicant: GEN ELECTRIC

    Abstract: Improving adhesion of metal coatings on diamond surfaces comprising depositing an initial uniform thin coating of a refractory metal on a diamond surface where the initial coating of the refractory metal is about 10-10,000 Angstroms; heat treating the initial coating to form a refractory metal-carbon bonding layer with the diamond; and then continuing deposition of the refractory metal. The refractory metal is selected from tungsten, niobium, molybdenum, chromium, titanium, vanadium, tantalum, zirconium, hafnium, aluminium and mixtures of the metals. Heat treatment is pref. conducted at a temp. of about 700-1200 deg.C in a non-oxidising environment and carried out for about 5-60 minutes. Deposition of the refractory metal takes place by low pressure chemical vapour deposition in a non-oxidising environment.

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