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公开(公告)号:DE69942886D1
公开(公告)日:2010-12-09
申请号:DE69942886
申请日:1999-06-25
Applicant: GEN ELECTRIC
Inventor: GUIDA RENATO , ROSE JAMES WILSON , ZARNOCH KENNETH PAUL , THUMANN GARY JOHN
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公开(公告)号:DE69410548T2
公开(公告)日:1998-12-17
申请号:DE69410548
申请日:1994-07-22
Applicant: GEN ELECTRIC
Inventor: ZARNOCH KENNETH PAUL , IACOVANGELO CHARLES DOMINIC
IPC: B24D3/00 , B01J19/00 , C09K3/14 , C23C16/02 , C23C16/08 , C23C16/14 , C30B29/04 , H05K1/03 , H05K3/38 , H01L21/48
Abstract: Improving adhesion of metal coatings on diamond surfaces comprising depositing an initial uniform thin coating of a refractory metal on a diamond surface where the initial coating of the refractory metal is about 10-10,000 Angstroms; heat treating the initial coating to form a refractory metal-carbon bonding layer with the diamond; and then continuing deposition of the refractory metal. The refractory metal is selected from tungsten, niobium, molybdenum, chromium, titanium, vanadium, tantalum, zirconium, hafnium, aluminium and mixtures of the metals. Heat treatment is pref. conducted at a temp. of about 700-1200 deg.C in a non-oxidising environment and carried out for about 5-60 minutes. Deposition of the refractory metal takes place by low pressure chemical vapour deposition in a non-oxidising environment.
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公开(公告)号:ES2116535T3
公开(公告)日:1998-07-16
申请号:ES94305445
申请日:1994-07-22
Applicant: GEN ELECTRIC
Inventor: ZARNOCH KENNETH PAUL , IACOVANGELO CHARLES DOMINIC
IPC: B24D3/00 , B01J19/00 , C09K3/14 , C23C16/02 , C23C16/08 , C23C16/14 , C30B29/04 , H05K1/03 , H05K3/38 , H01L21/48
Abstract: Improving adhesion of metal coatings on diamond surfaces comprising depositing an initial uniform thin coating of a refractory metal on a diamond surface where the initial coating of the refractory metal is about 10-10,000 Angstroms; heat treating the initial coating to form a refractory metal-carbon bonding layer with the diamond; and then continuing deposition of the refractory metal. The refractory metal is selected from tungsten, niobium, molybdenum, chromium, titanium, vanadium, tantalum, zirconium, hafnium, aluminium and mixtures of the metals. Heat treatment is pref. conducted at a temp. of about 700-1200 deg.C in a non-oxidising environment and carried out for about 5-60 minutes. Deposition of the refractory metal takes place by low pressure chemical vapour deposition in a non-oxidising environment.
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公开(公告)号:IT1139981B
公开(公告)日:1986-09-24
申请号:IT2423281
申请日:1981-09-30
Applicant: GEN ELECTRIC
Inventor: IACOVANGELO CHARLES DOMINIC , ZARNOCH KENNETH PAUL
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公开(公告)号:AU2002303352A1
公开(公告)日:2003-10-27
申请号:AU2002303352
申请日:2002-04-11
Applicant: GEN ELECTRIC
Inventor: GUO HUA , ZARNOCH KENNETH PAUL
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16.
公开(公告)号:AU8512601A
公开(公告)日:2002-03-04
申请号:AU8512601
申请日:2001-08-21
Applicant: GEN ELECTRIC
Inventor: BRAAT ADRIANUS J F M , DAVID BENNY , GUO HUA , LISKA JURAJ , CHAO HERBERT SHIN-I , ZARNOCH KENNETH PAUL
Abstract: An elastomer-thermoplastic composition comprising styrene butadiene random copolymer and poly(arylene ether) resin and methods of making the composition are disclosed.
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公开(公告)号:DE69410548D1
公开(公告)日:1998-07-02
申请号:DE69410548
申请日:1994-07-22
Applicant: GEN ELECTRIC
Inventor: ZARNOCH KENNETH PAUL , IACOVANGELO CHARLES DOMINIC
IPC: B24D3/00 , B01J19/00 , C09K3/14 , C23C16/02 , C23C16/08 , C23C16/14 , C30B29/04 , H05K1/03 , H05K3/38 , H01L21/48
Abstract: Improving adhesion of metal coatings on diamond surfaces comprising depositing an initial uniform thin coating of a refractory metal on a diamond surface where the initial coating of the refractory metal is about 10-10,000 Angstroms; heat treating the initial coating to form a refractory metal-carbon bonding layer with the diamond; and then continuing deposition of the refractory metal. The refractory metal is selected from tungsten, niobium, molybdenum, chromium, titanium, vanadium, tantalum, zirconium, hafnium, aluminium and mixtures of the metals. Heat treatment is pref. conducted at a temp. of about 700-1200 deg.C in a non-oxidising environment and carried out for about 5-60 minutes. Deposition of the refractory metal takes place by low pressure chemical vapour deposition in a non-oxidising environment.
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公开(公告)号:ES2077756T3
公开(公告)日:1995-12-01
申请号:ES91116317
申请日:1991-09-25
Applicant: GEN ELECTRIC
Inventor: ZARNOCH KENNETH PAUL
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公开(公告)号:DE69112579D1
公开(公告)日:1995-10-05
申请号:DE69112579
申请日:1991-09-25
Applicant: GEN ELECTRIC
Inventor: ZARNOCH KENNETH PAUL
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公开(公告)号:FR2491681A1
公开(公告)日:1982-04-09
申请号:FR8118771
申请日:1981-10-06
Applicant: GEN ELECTRIC
Inventor: IACOVANGELO CHARLES DOMINIC , ZARNOCH KENNETH PAUL
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