MICROSTRUCTURED EMBOSSING DRUM AND ARTICLES MADE THEREFROM
    3.
    发明申请
    MICROSTRUCTURED EMBOSSING DRUM AND ARTICLES MADE THEREFROM 审中-公开
    微结构压花鼓及由此制造的制品

    公开(公告)号:WO2007064803A2

    公开(公告)日:2007-06-07

    申请号:PCT/US2006045860

    申请日:2006-12-01

    Abstract: In one embodiment, an embossing drum system comprise: a mandrel (4) having outer surface with an external taper, a primary journal (10) extending from a first end of the mandrel (4), a secondary journal (12) extending from a second end of the mandrel (4), a sleeve (6) having an inner sleeve surface with an internal taper, wherein the sleeve (6) is disposed around the mandrel (4) to form a drum having a substantially constant outer diameter, and a releasable journal support (30,50) engaging the secondary journal (12), wherein a sleeve first end having a smallest inner diameter of the sleeve (6) is disposed adjacent the releasable journal support (30,50). hi one embodiment, a method of drum system maintenance comprises: releasing a journal support (30,50) on the embossing drum system and sliding the sleeve (6) off of the mandrel (4) and over the secondary journal (12).

    Abstract translation: 在一个实施例中,压花鼓系统包括:心轴(4),该心轴具有带外圆锥的外表面,从心轴(4)的第一端延伸的主轴颈(10),从轴颈 所述心轴(4)的第二端,具有内部锥面的内部套筒表面的套筒(6),其中所述套筒(6)围绕所述心轴(4)设置以形成具有基本恒定的外径的鼓;以及 与所述辅助轴颈(12)接合的可释放轴颈支撑件(30,50),其中所述轴套(6)的具有最小内径的轴套第一端设置在所述可释放轴颈支撑件(30,50)附近。 在一个实施例中,鼓系统维护的方法包括:在压花鼓系统上释放轴颈支撑件(30,50)并且将套管(6)滑离心轴(4)并且在第二轴颈(12)上滑动。

    PRODUCTION METHOD AND DEVICE OF SUBSTRATE OF X-RAY GRID FOR SCATTERING PREVENTION

    公开(公告)号:JP2000065995A

    公开(公告)日:2000-03-03

    申请号:JP17048399

    申请日:1999-06-17

    Applicant: GEN ELECTRIC

    Abstract: PROBLEM TO BE SOLVED: To provide a production method of practically transparent polymer substrate of X-ray grid for scattering prevention for using in radiation photographing technique for medical diagnosis. SOLUTION: The production method includes a process arranging a phase mask 320 in between a substrate 114 and a high power laser 310, a process radiating laser beam from a laser generator 310, a process adjusting the state of laser beam, a process removing the first part of the substrate 114 by the abrasion using state-controlled laser beam through the phase mask 320 and a process removing the second part of the substrate 114 by the abrasion using state-controlled laser beam through a phase mask 320.

Patent Agency Ranking